Patents by Inventor Sathees Kuppurao

Sathees Kuppurao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of oxidizing a substrate in the presence of nitride and oxynitride films
    Patent number: 6114258
    Abstract: A system and method of forming an oxide in the presence of a nitrogen-containing material. A substrate having a nitrogen-containing material on a surface is placed in a reaction chamber. An oxygen-containing gas, or an oxygen-containing gas and a hydrogen-containing gas are provided to the chamber and reacted in the chamber. The reactive gases are used to oxidize the surface of the substrate and displace the nitrogen-containing material from the interface.
    Type: Grant
    Filed: October 19, 1998
    Date of Patent: September 5, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Gary E. Miner, Guangcai Xing, David R. Lopes, Sathees Kuppurao