Patents by Inventor Satish ACHANTA

Satish ACHANTA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220342315
    Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
    Type: Application
    Filed: June 5, 2020
    Publication date: October 27, 2022
    Inventors: Marcus Adrianus Van De Kerkhof, Satish Achanta, Johannes Hubertus Josephina Moors, Vadim Yevgenyevich Banine, Stef Marten Johan Janssens, Andrey Nikipelov
  • Publication number: 20220082953
    Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.
    Type: Application
    Filed: May 5, 2020
    Publication date: March 17, 2022
    Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.
    Inventors: Matthew LIPSON, Satish ACHANTA, Benjamin David DAWSON, Matthew Anthony SORNA, IIiya SIGAL, Tammo UITTERDIJK
  • Patent number: 11086234
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Jeroen Bouwknegt, Abraham Alexander Soethoudt
  • Publication number: 20210223696
    Abstract: A substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating. A monomolecular layer is applied to the backside of the substrate or a clamp surface of the substrate holder. The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force. After loading the substrate on the substrate holder full clamping force is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer, resulting in an increase of the friction force between the substrate and the substrate holder.
    Type: Application
    Filed: August 23, 2017
    Publication date: July 22, 2021
    Inventors: Satish ACHANTA, Wilhelmus Jacobus Johannes WELTERS, Abraham Alexander SOETHOUDT, Jelmer MattheĆ¼s KAMMINGA, Christian LIEDECKE
  • Publication number: 20210053177
    Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.
    Type: Application
    Filed: January 24, 2019
    Publication date: February 25, 2021
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
  • Publication number: 20200292947
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Application
    Filed: October 11, 2018
    Publication date: September 17, 2020
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thomas POIESZ, Satish ACHANTA, Jeroen BOUWKNEGT, Abraham Alexander SOETHOUDT
  • Patent number: 10719019
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: July 21, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
  • Publication number: 20190332015
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Application
    Filed: July 6, 2017
    Publication date: October 31, 2019
    Inventors: Thomas POIESZ, Satish ACHANTA, Mehmet Ali AKBAS, Pavlo ANTONOV, Jeroen BOUWKNEGT, Joost Wilhelmus Maria FRENKEN, Evelyn Wallis PACITTI, Nicolaas TEN KATE, Bruce TIRRI, Jan VERHOEVEN
  • Patent number: 10192772
    Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.
    Type: Grant
    Filed: September 8, 2016
    Date of Patent: January 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Satish Achanta, Tiannan Guan, Raymond Wilhelmus Louis LaFarre, Ilya Malakhovsky, Bas Johannes Petrus Roset, Siegfried Alexander Tromp, Johannes Petrus Martinus Bernardus Vermeulen
  • Publication number: 20180308740
    Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.
    Type: Application
    Filed: September 8, 2016
    Publication date: October 25, 2018
    Applicant: ASML NETHERLANDS B.V
    Inventors: Satish ACHANTA, Tiannan GUAN, Raymond Wilhelmus Louis LAFARRE, Ilya MALAKHOVSKY, Bas Johannes Petrus ROSET, Siegfried Alexander TROMP, Johannes Petrus Martinus Bernardus VERMEULEN
  • Patent number: 9798251
    Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: October 24, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LaFarre, Satish Achanta, Matteo Filippi, Yogesh Karade, Antonius Johannes Maria Nellissen, Ronald Van Der Wilk, Hendrikus Christoffel Maria Van Doremalen, Wilhelmus Jacobus Johannes Welters
  • Publication number: 20160018744
    Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
    Type: Application
    Filed: February 26, 2014
    Publication date: January 21, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Satish ACHANTA, Matteo FILIPPI, Yogesh KARADE, Antonius Johannes Maria NELLISSEN, Ronal VAN DER WILK, Hendrikus Christoffel Maria VAN DOREMALEN, Wilhelmus Jacobus Johannes WELTERS