Abstract: An ECR plasma apparatus is formed of a vacuum chamber, a cavity disposed at a side surface of the vacuum chamber to which microwave is introduced, an electromagnetic coil disposed around the cavity, and a case member made of a conductive material having the same electric potential as that of the cavity. The case member is disposed in the vacuum chamber adjacent the cavity to supplement resonance operation in the cavity. Thus, the cavity and the electromagnetic coil disposed therearound can be miniaturized and lightened in weight.

Abstract: An ECR plasma CVD apparatus includes a cavity for producing an ECR plasma, a vacuum chamber connected to the cavity, a base plate holder for holding a base plate or substrate, an electrode plate, and a high frequency applying device for applying a high frequency current to the electrode plate. The electrode plate is disposed on a side opposite to the cavity with the base plate therebetween. The base plate is arranged parallel to the electrode plate with a predetermined space therebetween to generate an electrostatic coupling in the vacuum chamber. A high frequency current is applied to the electrode plate, so that the RF bias can be uniformly applied to the surface of a non-conductive base plate without contacting to thereby uniformly form a CVD membrane thereon.