Patents by Inventor Satoko Niitsuma

Satoko Niitsuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for forming a periodic pattern using a self-assembled block copolymer
    Patent number: 9234083
    Abstract: A method for causing a first polymer and a second polymer of a block copolymer to be self-assembled on an underlayer film and forming a periodic pattern in a guide layer is provided. The method includes a first etching process of etching the second polymer by plasma generated from a first gas, a first film deposition process of depositing a first protective film on surfaces of the first polymer and the guide layer except for an etched portion of the second polymer by plasma generated from a second gas after the first etching process, and a second etching process of further etching the second polymer by the plasma generated from the first gas after the first film deposition process.
    Type: Grant
    Filed: March 21, 2013
    Date of Patent: January 12, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Eiichi Nishimura, Fumiko Yamashita, Satoko Niitsuma
  • METHOD AND APPARATUS FOR FORMING A PERIODIC PATTERN USING A SELF-ASSEMBLED BLOCK COPOLYMER
    Publication number: 20150048049
    Abstract: A method for causing a first polymer and a second polymer of a block copolymer to be self-assembled on an underlayer film and forming a periodic pattern in a guide layer is provided. The method includes a first etching process of etching the second polymer by plasma generated from a first gas, a first film deposition process of depositing a first protective film on surfaces of the first polymer and the guide layer except for an etched portion of the second polymer by plasma generated from a second gas after the first etching process, and a second etching process of further etching the second polymer by the plasma generated from the first gas after the first film deposition process.
    Type: Application
    Filed: March 21, 2013
    Publication date: February 19, 2015
    Inventors: Eiichi Nishimura, Fumiko Yamashita, Satoko Niitsuma