Abstract: A specification unit (15b) specifies a path of traffic on the basis of past flow information. A determination unit (15c) determines a network device on the specified path for traffic related to a designated event.

Abstract: Provided are a network information visualization device, a network information visualization method, a network information visualization program, and a network information visualization system that visualizes useful information in network monitoring and improve reliability of a network. An information acquisition unit (11) acquires network information regarding a VPN network (2) including at least flow information having statistical information regarding communication in the VPN network (2). An association unit (12) associates the flow information with another network information included in the network information and generates associated flow information. A visualization unit (14) generates visualization information in which the flow information is associated with the other network information based on the associated flow information.

Abstract: An analysis device (40) receives an xFlow packet that is generated based on a sampled encapsulation packet and includes information regarding an outer header of the encapsulation packet and statistical information of a flow including the encapsulation packet. The analysis device (40) collates information regarding the outer header associated with information for identifying a user of VPN with information regarding the outer header included in the xFlow packet received by a reception unit (431), and specifies the user of the VPN from which the xFlow packet is transferred.

Abstract: A division unit divides communication traffic in a communication network into a plurality of streams. A calculation unit calculates a first abnormality degree based on a result of autoregressive analysis of a first stream among the plurality of streams, and a second abnormality degree based on a comparison result between the first stream and a second stream similar to the first stream. A determination unit determines whether the cause of the abnormality is the first stream, a stream different from the first stream, or a communication network based on the first abnormality degree and the second abnormality degree.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: when packets are received via any one of the plurality of inflow VRFs provided for respective route patterns, a chaining edge router (10) redirects the packets to a chain VRF corresponding to the inflow VRF. The chaining edge router (10) transfers the packets redirected to the chain VRF to respective functions via a communication path constructed using a VLAN in advance according to a route pattern corresponding to the chain VRF.

Abstract: A control system (10) includes, for each type of Virtual Network Function (VNF), a VNF compatibility condition indicating a condition of allocation of resources by which the VNF corresponding to the type is allowed to coexist with other VNFs in an identical computer, and resource usage information indicating resources in use by the VNF in the computer and unused resources. The control system (10) includes a VNF deploy control unit (14) referencing, in a case of receiving an instruction to additionally install a VNF, the type of the VNF to be additionally installed, the VNF compatibility condition, and the resource usage information to determine, from among the unused resources, resources allocated to the VNF to be additionally installed, and a resource allocation processing unit allocating the determined resources to the VNF to be additionally installed.

Abstract: According to an embodiment of the present invention, a plasma processing apparatus includes: a processing chamber in which plasma processing is performed to a sample; a radio frequency power source that supplies radio frequency power for generating plasma in the processing chamber; and a data processing apparatus that performs processing to light emission data of the plasma. The data processing apparatus performs the processing to the light emission by using an adaptive double exponential smoothing method for varying a smoothing parameter based on an error between input data and a predicted value of smoothed data. A response coefficient of the smoothing parameter is derived by a probability density function including the error as a parameter.

Abstract: A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.

Abstract: An object of the present invention is to provide a plasma processing method capable of removing complex depositions of metal and non-metal deposited in a processing chamber by etching processing of a wafer to reduce generation of particle due to the depositions, in a plasma processing method for plasma-etching the wafer such as a semiconductor substrate. According to the present invention, there is provided a plasma processing method for plasma-etching a sample in a processing chamber and plasma-cleaning the inside of the processing chamber, the method comprising: an etching step for plasma-etching a predetermined number of the samples; a metal removing step of removing a deposited film containing a metal element by using a plasma after the etching step; and a non-metal removing step of removing the deposited film containing the non-metal element by using a plasma different from the plasma in the metal removing step, in which the metal removing step and the non-metal removing step are repeated twice or more.

Abstract: According to the present invention, a plasma processing apparatus includes an analysis unit that obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value, and predicts the plasma processing result using the selected wavelength, or an analysis unit that obtains values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result, selects, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value, and predicts the plasma processing result using the selected value.

Abstract: An object of the present invention is to provide a plasma processing method capable of removing complex depositions of metal and non-metal deposited in a processing chamber by etching processing of a wafer to reduce generation of particle due to the depositions, in a plasma processing method for plasma-etching the wafer such as a semiconductor substrate. According to the present invention, there is provided a plasma processing method for plasma-etching a sample in a processing chamber and plasma-cleaning the inside of the processing chamber, the method comprising: an etching step for plasma-etching a predetermined number of the samples; a metal removing step of removing a deposited film containing a metal element by using a plasma after the etching step; and a non-metal removing step of removing the deposited film containing the non-metal element by using a plasma different from the plasma in the metal removing step, in which the metal removing step and the non-metal removing step are repeated twice or more.

Abstract: A communication system includes a flow collector that collects traffic of an NW edge accommodating CPE, an NFVO that provides an instruction to add or remove a resource of a VNF, a resource management device that notifies the NFVO of an increased or decreased resource amount and an addition or removal instruction of the VNF based on an increase or decrease of the traffic of the NW edge collected by the flow collector, and that decides on the VNF which becomes a redirection destination of the traffic of the NW edge in response to execution of addition or removal of the VNF by the NFVO, a VIM that adds or removes the VNF in accordance with an instruction from the NFVO, and a flow controller that instructs the NW edge to set the VNF decided by the resource management device as the redirection destination of the traffic.

Abstract: when packets are received via any one of the plurality of inflow VRFs provided for respective route patterns, a chaining edge router (10) redirects the packets to a chain VRF corresponding to the inflow VRF. The chaining edge router (10) transfers the packets redirected to the chain VRF to respective functions via a communication path constructed using a VLAN in advance according to a route pattern corresponding to the chain VRF.

Abstract: The present invention is a data processing apparatus including a data input/output device for receiving data, a storage for storing the data received by the data input/output device, a data processing program storage for storing a data processing program that includes the steps of calculating, using a double exponential smoothing method, a first predicted value that is a predicted value of smoothed data and a second predicted value that is a predicted value of the gradient of the smoothed data, and calculating, using a double exponential smoothing method in which the second predicted value is set as input data, a third predicted value that is a predicted value of smoothed data and a fourth predicted value that is a predicted value of the gradient of the smoothed data, and a data calculation processing apparatus for performing the data processing under the data processing program.

Abstract: A control system 10 may include a packet size analysis unit (14) that analyzes a distribution of packet sizes of traffic input to VNFs, a capacity calculation unit (123) that calculates a traffic volume per unit time processible by one VNF based on VNF capacity information indicating a traffic volume (bps, pps) per unit time processible by one VNF for a packet size and the distribution of the packet sizes input to the VNFs, and an installation number calculation unit (124) that calculates the number of VNFs to be increased or decreased based on the traffic volume per unit time processible by one VNF and the resource amount necessary for forwarding of the traffic.

Abstract: A control system 10 may include a packet size analysis unit (14) that analyzes a distribution of packet sizes of traffic input to VNFs, a capacity calculation unit (123) that calculates a traffic volume per unit time processible by one VNF based on VNF capacity information indicating a traffic volume (bps, pps) per unit time processible by one VNF for a packet size and the distribution of the packet sizes input to the VNFs, and an installation number calculation unit (124) that calculates the number of VNFs to be increased or decreased based on the traffic volume per unit time processible by one VNF and the resource amount necessary for forwarding of the traffic.

Abstract: A control system (10) includes, for each type of VNF, a VNF compatibility condition indicating a condition of allocation of resources by which the VNF corresponding to the type is allowed to coexist with other VNFs in an identical computer, and resource usage information indicating resources in use by the VNF in the computer and unused resources. The control system (10) includes a VNF deploy control unit (14) referencing, in a case of receiving an instruction to additionally install a VNF, the type of the VNF to be additionally installed, the VNF compatibility condition, and the resource usage information to determine, from among the unused resources, resources allocated to the VNF to be additionally installed, and a resource allocation processing unit allocating the determined resources to the VNF to be additionally installed.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.

Abstract: The plasma processing apparatus includes a plasma processing unit that performs plasma processing of a sample and a control unit that controls the plasma processing. The control unit selects one of a plurality of the prediction models for predicting a result of the plasma processing based on a state of the plasma processing unit, and predicts the result of the plasma processing by using a selected prediction model.