Patents by Inventor Satoru HAMAKAWA

Satoru HAMAKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning method, method for producing silicon single crystal, and cleaning device
    Patent number: 11426775
    Abstract: A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: August 30, 2022
    Assignee: SUMCO CORPORATION
    Inventors: Koichi Maegawa, Takuya Yotsui, Satoru Hamakawa
  • CLEANING METHOD, METHOD FOR PRODUCING SILICON SINGLE CRYSTAL, AND CLEANING DEVICE
    Publication number: 20200346258
    Abstract: A cleaning method includes a first removal step of causing an inert gas to which a pulsation is applied to flow into an exhaust pipe after a silicon single crystal doped with an n-type dopant is produced, to peel and remove a deposit; and a second removal step of causing an atmospheric air to which no pulsation is applied to flow into the exhaust pipe through a chamber to burn a part of the deposit with the atmospheric air, the part being not removable in the first removal step, and peel and remove a burned substance of the deposit.
    Type: Application
    Filed: November 16, 2018
    Publication date: November 5, 2020
    Applicant: SUMCO CORPORATION
    Inventors: Koichi MAEGAWA, Takuya YOTSUI, Satoru HAMAKAWA