Patents by Inventor Satoru Iwaida

Satoru Iwaida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6824858
    Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: November 30, 2004
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto
  • Publication number: 20040198861
    Abstract: A photocurable and thermosetting resin composition comprises a photocurable component, a thermosetting component, and a solvent component, wherein the solvent component contains a compound which exhibits a critical value of the water solubility at 25° C. of 3.0 to 0.1% by weight, preferably 2.5 to 0.
    Type: Application
    Filed: April 21, 2004
    Publication date: October 7, 2004
    Inventors: Yoshihiro Ohno, Masami Matsumura, Satoru Iwaida, Masayuki Isono
  • Publication number: 20030082355
    Abstract: A photocurable and thermosetting composition which is useful in forming a matte film and can be developed with an aqueous alkaline solution is provided. The composition comprises (A) a photosensitive prepolymer obtained by causing a saturated or unsaturated polybasic acid anhydride to react with a hydroxyl group of an esterification product of a novolak type epoxy compound and an unsaturated monocarboxylic acid, (B) a carboxyl group-containing copolymer resin, (C) a photopolymerization initiator, (D) a diluent, (E) a polyfunctional epoxy compound having at least two epoxy groups in its molecule, and, when necessary, (F) an inorganic filler. The composition may further comprise (G) an epoxy resin curing agent. This composition can be advantageously used for the formation of a solder resist on a printed circuit board.
    Type: Application
    Filed: August 13, 2002
    Publication date: May 1, 2003
    Inventors: Satoru Iwaida, Yoshihiro Ohno, Masayuki Isono, Akio Sekimoto