Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.

Abstract: As an aspect for realizing accurate observation, inspection, or measurement of the contact hole with large aspect ratio, a method and a device to scan a second electron beam after scanning a first electron beam to a sample to charge the sample are proposed wherein the beam diameter of the first electron beam is made larger than the beam diameter of the second electron beam.

Abstract: For the purpose of repeatedly observing the bottom of a contact hole with a high aspect ratio, the potential of an electrostatic charge in each of a pattern to be observed and a vicinity of a range to be observed is stabilized by pre-charging a range on which to irradiate a beam of electrons while changing the range on a step-by-step basis.

Abstract: In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary electrons. A primary electron beam is scanned on a sample, a histogram is created, and the histogram is second-order differentiated to calculate a level of halftone at which a sample image changes in contrast, and to calculate the probe current amount. By adjusting the frame count suitable for the calculated probe current amount, and the contrast suitable for the sample image, the slimming of the sample is limited, and a highly visible sample image is generated for length measurement.

Abstract: In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary electrons. A primary electron beam is scanned on a sample, a histogram is created, and the histogram is second-order differentiated to calculate a level of halftone at which a sample image changes in contrast, and to calculate the probe current amount. By adjusting the frame count suitable for the calculated probe current amount, and the contrast suitable for the sample image, the slimming of the sample is limited, and a highly visible sample image is generated for length measurement.

Abstract: In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary electrons. A primary electron beam is scanned on a sample, a histogram is created, and the histogram is second-order differentiated to calculate a level of halftone at which a sample image changes in contrast, and to calculate the probe current amount. By adjusting the frame count suitable for the calculated probe current amount, and the contrast suitable for the sample image, the slimming of the sample is limited, and a highly visible sample image is generated for length measurement.

Abstract: In a scanning electron microscope, slimming is reduced by reducing a frame count. As the frame count is reduced, the amount of detected secondary electrons decreases, so that a probe current amount is increased to emit an increased amount of detected secondary electrons. A primary electron beam is scanned on a sample, a histogram is created, and the histogram is second-order differentiated to calculate a level of halftone at which a sample image changes in contrast, and to calculate the probe current amount. By adjusting the frame count suitable for the calculated probe current amount, and the contrast suitable for the sample image, the slimming of the sample is limited, and a highly visible sample image is generated for length measurement.