Patents by Inventor Satoru Kiyama

Satoru Kiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9713242
    Abstract: A plasma treatment equipment includes: a plasma starting and stabilizing unit (A) having an insulating material such as a dielectric material having an elongated hole connecting to a plasma ejection portion, a triggering and discharge-stabilizing electrode, and an intense electric field electrode mounted thereon; and a plasma generating unit (B) including the insulating material having the elongated hole and a plasma generating electrode configured to perform main plasma generation at the time of operation, wherein the triggering and discharge-stabilizing electrode, the intense electric field electrode, and the plasma generating electrode are provided in such a manner that all the electrodes are not exposed and covered with the dielectric material for the entire space of one or more of the elongated hole which allows passage of gas from the upstream, starting of the plasma and generation of the plasma, and ejection of the plasma jet.
    Type: Grant
    Filed: June 27, 2011
    Date of Patent: July 18, 2017
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hajime Sakakita, Yuzuru Ikehara, Satoru Kiyama
  • Patent number: 9254397
    Abstract: The present invention provides a plasma evaluation system and method for evaluating plasma, including: a treatment target material and a weak current measurement unit including a resistor unit and a differential amplifier, wherein the treatment target material is connected to the weak current measurement unit via a treatment target side measurement terminal, the resistor unit of the weak current measurement unit is connected to a ground side of a plasma generation current source, and the system and method evaluate plasma by receiving plasma generated by a plasma treatment equipment with the treatment target material, measuring a current by measuring a voltage across resistors of the resistor unit through the differential amplifier, and measuring an output voltage of the plasma generation power source.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: February 9, 2016
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Hajime Sakakita, Yuzuru Ikehara, Satoru Kiyama
  • Publication number: 20140312241
    Abstract: [Problem] To provide a system and a method for objectively evaluating plasma by easily measuring a current generated by a plasma treatment equipment for medical purposes, etc., and a current flowing through a living body, etc. [Solution] A plasma evaluation system and method for evaluating plasma, including: a treatment target material; and a weak current measurement unit including a resistor unit and a differential amplifier, wherein the treatment target material is connected to the weak current measurement unit via a treatment target side measurement terminal, the resistor unit of the weak current measurement unit is connected to a ground side of a plasma generation current source, and the system and method evaluate plasma by receiving plasma generated by a plasma treatment equipment with the treatment target material, measuring a current by measuring a voltage across resistors of the resistor unit through the differential amplifier, and measuring an output voltage of the plasma generation power source.
    Type: Application
    Filed: October 22, 2012
    Publication date: October 23, 2014
    Inventors: Hajime Sakakita, Yuzuru Ikehara, Satoru Kiyama
  • Publication number: 20130204244
    Abstract: A plasma treatment equipment includes: a plasma starting and stabilizing unit (A) having an insulating material such as a dielectric material having an elongated hole connecting to a plasma ejection portion, a triggering and discharge-stabilizing electrode, and an intense electric field electrode mounted thereon; and a plasma generating unit (B) including the insulating material having the elongated hole and a plasma generating electrode configured to perform main plasma generation at the time of operation, wherein the triggering and discharge-stabilizing electrode, the intense electric field electrode, and the plasma generating electrode are provided in such a manner that all the electrodes are not exposed and covered with the dielectric material for the entire space of one or more of the elongated hole which allows passage of gas from the upstream, starting of the plasma and generation of the plasma, and ejection of the plasma jet.
    Type: Application
    Filed: June 27, 2011
    Publication date: August 8, 2013
    Inventors: Hajime Sakakita, Yuzuru Ikehara, Satoru Kiyama