Patents by Inventor Satoru Miyoshi

Satoru Miyoshi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10850269
    Abstract: The exemplary embodiments relate to an exhaust gas purification catalyst, in which exhaust gas purification performance is secured and an increase in pressure loss is suppressed, which is an exhaust gas purification catalyst, in which a porous filter wall of a substrate having a wall-flow structure is coated with a catalyst material containing an OSC material having oxygen storage capacity and a catalyst metal, wherein the density of percolation paths having percolation path diameters of 4 ?m or more per unit area inside of the filter wall coated with the catalyst material is 100 paths/mm2 to 1000 paths/mm2.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: December 1, 2020
    Assignees: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Atsushi Tanaka, Takeru Yoshida, Naoto Miyoshi, Akemi Sato, Yasutaka Nomura, Satoru Inoda
  • Patent number: 10821558
    Abstract: There is provided an inexpensive bonding material, which can be easily printed on articles to be bonded to each other and which can suppress the generation of voids in the bonded portions of the articles to be bonded to each other, and a bonding method using the same. In a bonding material of a copper paste which contains a copper powder containing 0.3% by weight or less of carbon and having an average particle diameter of 0.1 to 1 ?m, and an alcohol solvent, such as a monoalcohol, a diol, a triol or a terpene alcohol, the content of the copper powder is in the range of from 80% by weight to 95% by weight, and the content of the alcohol solvent is in the range of from 5% by weight to 20% by weight.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 3, 2020
    Assignee: DOWA ELECTRONICS MATERIALS CO., LTD.
    Inventors: Keiichi Endoh, Hiromasa Miyoshi, Kimikazu Motomura, Satoru Kurita
  • Publication number: 20200276568
    Abstract: An exhaust gas purifying catalyst includes: a wall-flow structure substrate including an inlet cell, an outlet cell, and a porous partition; a first catalyst layer formed inside the partition such that a thickness of the first catalyst layer is between 40% and 60%, inclusive, of an overall thickness Tw of the partition; and a second catalyst layer formed inside the partition such that the second catalyst layer extends across an entire region of the partition in a thickness direction thereof.
    Type: Application
    Filed: October 12, 2018
    Publication date: September 3, 2020
    Applicants: CATALER CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Haruka MAKINO, Yasutaka NOMURA, Satoru INODA, Kenji NAKAJIMA, Naoto MIYOSHI, Takeru YOSHIDA, Akemi SATO
  • Publication number: 20200263587
    Abstract: An exhaust gas purification including: a base of wall flow structure having inlet side cells wherein an end on the exhaust gas inflow side is open and outlet side cells wherein an end on the exhaust gas outflow side is open, and a porous partition wall that partitions the side cells; and first and second catalyst layers disposed in the interior of the porous partition wall so as to be in contact with the side cells, wherein either of the catalyst layers contains an oxidation catalyst but does not contain a reduction catalyst, and the other contains the reduction catalyst but does not contain the oxidation catalyst; and a ratio of the lengths of the catalyst layers differs between a surface of the porous partition wall on the side in contact with the inlet side cells and a surface on the side in contact with the outlet side cells.
    Type: Application
    Filed: September 11, 2018
    Publication date: August 20, 2020
    Applicants: CATALER CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yasutaka NOMURA, Satoru INODA, Naoto MIYOSHI, Akemi SATO
  • Patent number: 10626765
    Abstract: An exhaust gas purification device includes: a substrate of wall-flow structure having an inlet cell, an outlet cell and a porous partition wall; an upstream catalyst layer provided inside the partition wall and disposed in an upstream portion, including an exhaust gas inflow end section, of the substrate; and a downstream catalyst layer provided inside the partition wall and disposed in a downstream portion, including an exhaust gas outflow end section, of the substrate. The downstream catalyst layer contains a carrier, and Rh supported on the carrier. The upstream catalyst layer contains a carrier, and Pd and/or Pt supported on the carrier.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: April 21, 2020
    Assignee: CATALER CORPORATION
    Inventors: Satoru Inoda, Yasutaka Nomura, Junji Kuriyama, Naoto Miyoshi, Masahiko Takeuchi, Akemi Sato
  • Patent number: 10543569
    Abstract: A bonding material of a silver paste contains: fine silver particles having an average primary particle diameter of 1 to 200 nm, each of the fine silver particles being coated with an organic compound having a carbon number of not greater than 8, such as sorbic acid; and a solvent mixed with the fine silver particles, wherein a diol, such as an octanediol, is used as the solvent and wherein a triol having a boiling point of 200 to 300° C., a viscosity of 2,000 to 10,000 mPa·s at 20° C. and at least one methyl group, such as 3-methylbutane-1,2,3-triol or 2-methylbutane-1,2,4-triol, is mixed with the solvent as an addition agent.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: January 28, 2020
    Assignee: Dowa Electronics Materials Co., Ltd.
    Inventors: Satoru Kurita, Takashi Hinotsu, Keiichi Endoh, Hiromasa Miyoshi
  • Publication number: 20190212176
    Abstract: A substrate processing system includes a gas supply unit having a first gas flow channel. A second gas flow channel of a flow rate measurement system is connected to the first gas flow channel. The flow rate measurement system further includes a third gas flow channel connected to the second gas flow channel, and a pressure sensor and a temperature sensor that measure a pressure and a temperature, respectively, in the third gas flow channel. In a method of an embodiment, a flow rate of a gas output from a flow rate controller of the gas supply unit is calculated using a build-up method. The flow rate of a gas is calculated without using the total volume of the first gas flow channel and the second gas flow channel and temperatures in the first gas flow channel and the second gas flow channel.
    Type: Application
    Filed: January 3, 2019
    Publication date: July 11, 2019
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Risako MIYOSHI, Norihiko AMIKURA, Kazuyuki MIURA, Masaaki NAGASE, Satoru YAMASHITA, Yohei SAWADA, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20190201884
    Abstract: The exemplary embodiments relate to an exhaust gas purification catalyst, in which exhaust gas purification performance is secured and an increase in pressure loss is suppressed, which is an exhaust gas purification catalyst, in which a porous filter wall of a substrate having a wall-flow structure is coated with a catalyst material containing an OSC material having oxygen storage capacity and a catalyst metal, wherein the density of percolation paths having percolation path diameters of 4 ?m or more per unit area inside of the filter wall coated with the catalyst material is 100 paths/mm2 to 1000 paths/mm2.
    Type: Application
    Filed: December 7, 2018
    Publication date: July 4, 2019
    Applicants: TOYOTA JIDOSHA KABUSHIKI KAISHA, CATALER CORPORATION
    Inventors: Atsushi TANAKA, Takeru YOSHIDA, Naoto MIYOSHI, Akemi SATO, Yasutaka NOMURA, Satoru INODA
  • Patent number: 10328534
    Abstract: A bonding material of a silver paste includes: fine silver particles having an average primary particle diameter of 1 to 50 nanometers, each of the fine silver particles being coated with an organic compound having a carbon number of not greater than 8, such as hexanoic acid; silver particles having an average primary particle diameter of 0.5 to 4 micrometers, each of the silver particles being coated with an organic compound, such as oleic acid; a solvent containing 3 to 7% by weight of an alcohol and 0.3 to 1% by weight of a triol; a dispersant containing 0.5 to 2% by weight of an acid dispersant and 0.01 to 0.1% by weight of phosphate ester dispersant; and 0.01 to 0.
    Type: Grant
    Filed: June 19, 2014
    Date of Patent: June 25, 2019
    Assignee: Dowa Electronics Materials Co., Ltd.
    Inventors: Keiichi Endoh, Minami Nagaoka, Satoru Kurita, Hiromasa Miyoshi, Yoshiko Kohno, Akihiro Miyazawa
  • Patent number: 8270902
    Abstract: A communication system is provided comprising an environment-side electrode and a living body-side electrode sandwiching an insulating layer and electrically insulated from each other, a grounding electrode which is electrically connected to the environment-side electrode, and a reception amplifier which amplifies a potential difference between the environment-side electrode and the living body-side electrode, wherein the grounding electrode has a side surface section which extends along a vertical direction.
    Type: Grant
    Filed: June 15, 2009
    Date of Patent: September 18, 2012
    Assignee: Semiconductor Components Industries, LLC
    Inventors: Kazuo Hasegawa, Hirohisa Suzuki, Satoru Miyoshi, Kazuya Kogure
  • Patent number: 7796495
    Abstract: An optical disk comprising two layers including a signal recording layer and an image recording layer further comprises a metal reflective layer formed on a surface of the image recording layer on the incidence side of laser light. The image recording layer is capable of forming a visible image in response to an increase in temperature caused by application of laser light to the metal reflective layer. The visible image is capable of being visually observed from a side opposite to the incidence side.
    Type: Grant
    Filed: August 5, 2005
    Date of Patent: September 14, 2010
    Assignee: Sanyo Electric Co., Ltd.
    Inventors: Akira Tsukihashi, Tsuyoshi Yamamoto, Satoru Miyoshi, Shinichi Nakahashi
  • Publication number: 20090325485
    Abstract: A communication system is provided comprising an environment-side electrode and a living body-side electrode sandwiching an insulating layer and electrically insulated from each other, a grounding electrode which is electrically connected to the environment-side electrode, and a reception amplifier which amplifies a potential difference between the environment-side electrode and the living body-side electrode, wherein the grounding electrode has a side surface section which extends along a vertical direction.
    Type: Application
    Filed: June 15, 2009
    Publication date: December 31, 2009
    Applicants: SANYO ELECTRIC CO., LTD., SANYO SEMICONDUCTOR CO., LTD.
    Inventors: Kazuo HASEGAWA, Hirohisa SUZUKI, Satoru MIYOSHI, Kazuya KOGURE
  • Publication number: 20060151605
    Abstract: One of a first laser driver and a second laser driver for respectively driving a first laser light source and a second laser light source is selected according to a type of storage media constituting an object of processing, drive pulses are generated from that laser driver based on label information, and label information is written to a label layer of the storage media, constituting an object of processing, using laser light output by driving a laser light source with these drive pulses.
    Type: Application
    Filed: January 3, 2006
    Publication date: July 13, 2006
    Applicant: SANYO ELECTRIC CO., LTD.
    Inventors: Satoru Miyoshi, Akira Tsukihashi
  • Publication number: 20060028967
    Abstract: An optical disk comprising two layers including a signal recording layer and an image recording layer further comprises a metal reflective layer formed on a surface of the image recording layer on the incidence side of laser light. The image recording layer is capable of forming a visible image in response to an increase in temperature caused by application of laser light to the metal reflective layer. The visible image is capable of being visually observed from a side opposite to the incidence side.
    Type: Application
    Filed: August 5, 2005
    Publication date: February 9, 2006
    Applicant: Sanyo Electric Co., Ltd.
    Inventors: Akira Tsukihashi, Tsuyoshi Yamamoto, Satoru Miyoshi, Shinichi Nakahashi
  • Patent number: 6326254
    Abstract: Wells of n- and p-type are formed in a p-type substrate. Wells of p-type are also formed in the n-type well. Both the p-type wells are formed by the same process at the same time to make MOS transistors have different threshold voltages. MOS transistors having a long gate length and a low threshold voltage are formed in the p-well in the n-well, and MOS transistors having a short gate length and a high threshold voltage are formed in the p-well at the outside of the n-well. Fuses are formed over the p-type wells in the n-type well at a high density.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: December 4, 2001
    Assignees: Fujitsu Limited, Fujitsu VLSI Limited
    Inventors: Taiji Ema, Satoru Miyoshi, Tatsumi Tsutsui, Masaya Katayama, Masayoshi Asano, Kenichi Kanazawa
  • Patent number: 6320240
    Abstract: There are provided a semiconductor device which can prevent short-circuit of the contact plugs and prevent exposure of wirings to ensure sufficient reliability even if level difference is caused in device isolation regions, and a method of manufacturing the same. Device isolation regions 13 are formed on a semiconductor substrate 11 to partition the semiconductor substrate 11 into a plurality of device regions 12. Then, word lines 14 are formed on the semiconductor substrate 11, and then peripheral regions of the word lines 14 are covered with a protection film. Then, impurity diffusion regions formed in the device regions 12, and then a plug insulating film is formed on an overall upper surface of the substrate 11. Then, opening portions 18a for connecting end portions of the device regions 12 are formed in the plug insulating film.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: November 20, 2001
    Assignee: Fujitsu Limited
    Inventor: Satoru Miyoshi
  • Patent number: 5803951
    Abstract: A gas chromatograph has a control unit which normally carries out a pressure control so as to keep the pressure inside the vaporization chamber at a specified target level while the flow rate of a carrier gas into the vaporization chamber is kept constant. When a liquid sample is injected to cause a sudden rise in the pressure, the normal pressure control is temporarily stopped, say, for keeping the split ratio unchanged. In order to keep unchanged the retention time for components being analyzed although the pressure inside the vaporization chamber rises, the target value for the pressure control is reduced for an appropriate length of time after the temporary stopping of pressure control is discontinued.
    Type: Grant
    Filed: April 3, 1997
    Date of Patent: September 8, 1998
    Assignee: Shimadzu Corporation
    Inventors: Toyohito Wada, Kazuya Nakagawa, Satoru Miyoshi, Hiroyuki Tsujiide
  • Patent number: 5789788
    Abstract: Wells of n- and p-type are formed in a p-type substrate. Wells of p-type are also formed in the n-type well. Both the p-type wells are formed by the same process at the same time to make MOS transistors have different threshold voltages. MOS transistors having a long gate length and a low threshold voltage are formed in the p-well in the n-well, and MOS transistors having a short gate length and a high threshold voltage are formed in the p-well at the outside of the n-well. Fuses are formed over the p-type wells in the n-type well at a high density.
    Type: Grant
    Filed: November 20, 1996
    Date of Patent: August 4, 1998
    Assignees: Fujitsu Limited, Fujitsu VLSI Limited
    Inventors: Taiji Ema, Satoru Miyoshi, Tatsumi Tsutsui, Masaya Katayama, Masayoshi Asano, Kenichi Kanazawa
  • Patent number: 5391221
    Abstract: A gas chromatograph for operation selectably in both split mode and splitless wide bore injection mode includes a capillary column, a sample injection chamber at the inlet of the column, a three-way valve, a first piping line connected between one of the two outlets of the three-way valve and the sample injection chamber, a split line connected to the sample injection chamber immediately upstream of the inlet of the column for discharging therethrough a portion of a gas being sent out from the sample injection chamber, a second piping line connected between the other of the outlets of the three-way valve and the split line, and a third piping line connected between the first and second piping lines. By properly controlling the total carrier gas flow rate and the column inlet pressure, the split ratio can be controlled easily. By varying the split ratio appropriately during an analysis, the amount of the carrier gas to be wasted in the case of a split mode of operation can be significantly reduced.
    Type: Grant
    Filed: March 19, 1993
    Date of Patent: February 21, 1995
    Assignee: Shimadzu Corporation
    Inventors: Toyoaki Fukushima, Kazuya Nakagawa, Masahito Ueda, Satoru Miyoshi
  • Patent number: 5339673
    Abstract: A gas chromatograph for operation in split mode is controlled by calculating the column flow rate and the total carrier gas flow rate from the length and inner diameter of the column and specified values for temperature and column inlet pressure, adjusting the split flow rate such that the pressure value measured by a pressure sensor becomes equal to the specified pressure value and control the total carrier flow rate to be equal to the calculated value therefor. In this manner, the split ratio of the gas chromatograph can be maintained easily at a specified value. The amount of carrier gas to be wasted can be significantly reduced by appropriately varying the split ratio with time during the course of an analysis.
    Type: Grant
    Filed: March 19, 1993
    Date of Patent: August 23, 1994
    Assignee: Shimadzu Corporation
    Inventors: Kazuya Nakagawa, Satoru Miyoshi, Toyoaki Fukushima