Patents by Inventor Satoru Morita

Satoru Morita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220133813
    Abstract: Provided herein are compositions and methods for the induction and/or proliferation of CD8+ T-cells. The disclosure also provides methods of treatment of diseases that can be treated by the induction and/or proliferation of CD8+ T-cells.
    Type: Application
    Filed: February 8, 2019
    Publication date: May 5, 2022
    Applicant: Keio University
    Inventors: Kenya Honda, Takeshi Tanoue, Yutaka Kawakami, Koji Atarashi, Satoru Morita, Ashwin Nicholas Skelly
  • Patent number: 8564082
    Abstract: A radiation detector of this invention has a curable synthetic resin film covering exposed surfaces of a radiation sensitive semiconductor layer, a carrier selective high resistance film and a common electrode, in which a material allowing no chloride to mix in is used in a manufacturing process of the curable synthetic resin film. This prevents pinholes and voids from being formed by chlorine ions in the carrier selective high resistance film and semiconductor layer. Also a protective film which does not transmit ionic materials may be provided between the exposed surface of the common electrode and the curable synthetic resin film, thereby to prevent the carrier selective high resistance film from being corroded by chlorine ions included in the curable synthetic resin film, and to prevent an increase of dark current flowing through the semiconductor layer.
    Type: Grant
    Filed: September 10, 2008
    Date of Patent: October 22, 2013
    Assignee: Shimadzu Corporation
    Inventors: Shingo Furui, Toshinori Yoshimuta, Junichi Suzuki, Koji Watadani, Satoru Morita
  • Patent number: 8466534
    Abstract: The construction of this invention includes an active matrix substrate, an amorphous selenium layer, a high resistance layer, a gold electrode layer, an insulating layer and an auxiliary plate laminated in this order. In one aspect of the present invention, the insulating layer has an inorganic anion exchanger added thereto in order to provide a radiation detector which prevents void formation and pinhole formation in the amorphous semiconductor layer and carrier selective high resistance film, without accumulating electric charges on the auxiliary plate. The inorganic anion exchanger adsorbs chloride ions in the insulating layer, thereby preventing destruction of X-ray detector due to the chloride ions drawn to the gold electrode layer.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: June 18, 2013
    Assignee: Shimadzu Corporation
    Inventors: Shingo Furui, Toshinori Yoshimuta, Junichi Suzuki, Koji Watadani, Satoru Morita
  • Publication number: 20110315978
    Abstract: The construction of this invention includes an active matrix substrate, an amorphous selenium layer, a high resistance layer, a gold electrode layer, an insulating layer and an auxiliary plate laminated in this order. In one aspect of the present invention, the insulating layer has an inorganic anion exchanger added thereto in order to provide a radiation detector which prevents void formation and pinhole formation in the amorphous semiconductor layer and carrier selective high resistance film, without accumulating electric charges on the auxiliary plate. The inorganic anion exchanger adsorbs chloride ions in the insulating layer, thereby preventing destruction of X-ray detector due to the chloride ions drawn to the gold electrode layer.
    Type: Application
    Filed: March 26, 2010
    Publication date: December 29, 2011
    Inventors: Shingo Furui, Toshinori Yoshimuta, Junichi Suzuki, Koji Watadani, Satoru Morita
  • Publication number: 20110163306
    Abstract: A radiation detector of this invention has a curable synthetic resin film covering exposed surfaces of a radiation sensitive semiconductor layer, a carrier selective high resistance film and a common electrode, in which a material allowing no chloride to mix in is used in a manufacturing process of the curable synthetic resin film. This prevents pinholes and voids from being formed by chlorine ions in the carrier selective high resistance film and semiconductor layer. Also a protective film which does not transmit ionic materials may be provided between the exposed surface of the common electrode and the curable synthetic resin film, thereby to prevent the carrier selective high resistance film from being corroded by chlorine ions included in the curable synthetic resin film, and to prevent an increase of dark current flowing through the semiconductor layer.
    Type: Application
    Filed: September 10, 2008
    Publication date: July 7, 2011
    Inventors: Shingo Furui, Toshinori Yoshimuta, Junichi Suzuki, Koji Watadani, Satoru Morita
  • Patent number: 7815094
    Abstract: A method of manufacturing a cylindrical body, comprising the step of forming the cylindrical body by bending a plate-like work having first projected finger to fourth projected finger at four corned parts and allowing the end faces thereof to abut on each other, wherein the main surface of the cylindrical body on the side where sags are present is formed in an outer peripheral wall surface and the rear surface thereof on the side where the burrs are present is formed in an inner peripheral wall surface, and a first projected part is formed of the first projected finger and the third projected finger and a second projected part is formed of the second projected finger and the fourth projected finger. After the cylindrical body is held by friction stir welding devices, the probe of a friction stir welding tool is buried from the direction of either of the first projected part and the second projected part, and scanned in the direction of the other of the second projected part and the first projected part.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: October 19, 2010
    Assignee: Honda Motor Co., Ltd.
    Inventors: Shunsuke Sunahara, Haruo Machida, Yuu Igarashi, Tadashi Goto, Toshimasa Koshimizu, Hideo Nakamura, Satoru Morita, Taisei Wakisaka, Kei Kuriyama
  • Patent number: 7556187
    Abstract: A friction stir welding apparatus (120) brings end faces (1, 2) of a plate material (W1), having fingers (7a through 7d) at corners thereof, into abutment against each other to form a hollow cylindrical body (W2), and friction-stir-welds the end faces (1, 2) to each other. The apparatus includes a base (122), a first support device and second support device which are mounted on the base (122), a support core (32) spaced from the base (122) by the first support device and the second support device, for insertion into the hollow cylindrical body (W2) and for supporting the hollow cylindrical body (W2), and a first gripping member (238) and a second gripping member (268) disposed on the support core (32) for gripping respective protrusions (8, 9), which are formed when the fingers (7a through 7d) are held in abutment against opposite ends of abutting regions of the hollow cylindrical body (W2), and which extend along a joining direction.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: July 7, 2009
    Assignee: Honda Motor Co., Ltd.
    Inventors: Shunsuke Sunahara, Haruo Machida, Yuu Igarashi, Tadashi Goto, Toshimasa Koshimizu, Hideo Nakamura, Satoru Morita, Taisei Wakisaka, Kei Kuriyama
  • Publication number: 20090001131
    Abstract: A friction stir welding apparatus (120) brings end faces (1, 2) of a plate material (W1), having fingers (7a through 7d) at corners thereof, into abutment against each other to form a hollow cylindrical body (W2), and friction-stir-welds the end faces (1, 2) to each other. The apparatus includes a base (122), a first support device and second support device which are mounted on the base (122), a support core (32) spaced from the base (122) by the first support device and the second support device, for insertion into the hollow cylindrical body (W2) and for supporting the hollow cylindrical body (W2), and a first gripping member (238) and a second gripping member (268) disposed on the support core (32) for gripping respective protrusions (8, 9), which are formed when the fingers (7a through 7d) are held in abutment against opposite ends of abutting regions of the hollow cylindrical body (W2), and which extend along a joining direction.
    Type: Application
    Filed: August 29, 2008
    Publication date: January 1, 2009
    Applicant: Honda Motor Co., Ltd.
    Inventors: Shunsuke Sunahara, Haruo Machida, Yuu Igarashi, Tadashi Goto, Toshimasa Koshimizu, Hideo Nakamura, Satoru Morita, Taisei Wakisaka, Kei Kuriyama
  • Publication number: 20070200829
    Abstract: An operation panel capable of being effectively reduced in size while the operability and the visibility are maintained at the conventional level. The operation panel includes a flexible display, a plurality of operation keys and a storing part for storing the flexible display in a wound state. In a second operation mode of the operation panel, the flexible display may be withdrawn to a second position at which the flexible display covers a second operation key, in order to enlarge a display area of the operation panel.
    Type: Application
    Filed: February 27, 2007
    Publication date: August 30, 2007
    Inventors: Yoshiki Hashimoto, Tomoki Ohya, Satoru Morita, Tetsuro Matsudaira
  • Publication number: 20060279245
    Abstract: A robot controller for avoiding an emergency stop of a robot due to shortage of the amount of charge of a secondary battery of a portable operating part during automatic operation of the robot. The robot controller includes a portable operating part having a secondary battery, a robot control part capable of communicating with the portable operating part and having a means for bringing the robot to an emergency stop when communication between the robot control part and the portable operating part is interrupted, a charging circuit for charging the secondary battery, and a cable for electrically connecting the charging circuit to the control part during automatic operation of the robot.
    Type: Application
    Filed: June 6, 2006
    Publication date: December 14, 2006
    Inventors: Yoshiki Hashimoto, Tomoki Ohya, Satoru Morita
  • Patent number: 7109037
    Abstract: The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
    Type: Grant
    Filed: June 25, 2002
    Date of Patent: September 19, 2006
    Assignees: Nagase & Co., Ltd., Hirama Laboratories Co., Ltd., Nagase CMS Technology Co., Ltd.
    Inventors: Toshimoto Nakagawa, Yuko Katagiri, Shu Ogawa, Satoru Morita, Makoto Kikukawa
  • Publication number: 20060163327
    Abstract: A method of manufacturing a cylindrical body, comprising the step of forming the cylindrical body by bending a plate-like work having first projected finger to fourth projected finger at four corned parts and allowing the end faces thereof to abut on each other, wherein the main surface of the cylindrical body on the side where sags are present is formed in an outer peripheral wall surface and the rear surface thereof on the side where the burrs are present is formed in an inner peripheral wall surface, and a first projected part is formed of the first projected finger and the third projected finger and a second projected part is formed of the second projected finger and the fourth projected finger. After the cylindrical body is held by friction stir welding devices, the probe of a friction stir welding tool is buried from the direction of either of the first projected part and the second projected part, and scanned in the direction of the other of the second projected part and the first projected part.
    Type: Application
    Filed: December 5, 2003
    Publication date: July 27, 2006
    Inventors: Shusuke Sunahara, Haruo Machida, Yuu Igarashi, Tadashi Goto, Toshimasa Koshimizu, Hideo Nakamura, Satoru Morita, Taisei Wakisaka, Kei Kuriyama
  • Patent number: 6752545
    Abstract: A treating liquid adjusting equipment for adjusting an alkali-based treating liquid for use in treating an organic film applied onto a substrate, which includes an adjusting portion. The adjusting portion for adjusting an alkalinity of the alkali-based treating liquid is such that a concentration of a first component contained in the alkali-based treating liquid and constituting an organic film of a same type as or different type from the organic film is in a range of 0.0001 to 2.0 mass %, and a concentration of an alkali component contained in the alkali-based treating liquid is in a range of 0.05 to 2.5 mass %.
    Type: Grant
    Filed: August 9, 2002
    Date of Patent: June 22, 2004
    Assignees: Nagase & Co., Ltd., Hirama Laboratories Co., Ltd., Nagase CMS Technology Co., Ltd.
    Inventors: Toshimoto Nakagawa, Yuko Katagiri, Shu Ogawa, Satoru Morita, Makoto Kikukawa, Takahiro Hozan
  • Publication number: 20040011463
    Abstract: Resist stripping equipment includes a resist stripping system which includes a plurality of resist stripping chambers provided in a connected row arrangement and a rinse system which includes a rinse chamber. Insides of the resist stripping chambers are purged with nitrogen gas from a nitrogen gas supply system. Mixed gas which is generated in each chamber and contains a water-based resist stripping solution component is sent to a solution recovery/supply system for gas/liquid separation. Recovered resist stripping solution is returned into a stripping solution tank, while separated gas is supplied to a gas knife in each chamber and used for draining solution from a substrate.
    Type: Application
    Filed: July 7, 2003
    Publication date: January 22, 2004
    Inventors: Toshimoto Nakagawa, Shu Ogawa, Satoru Morita, Yasuyuki Kobayakawa, Makoto Kikukawa
  • Patent number: 6623183
    Abstract: The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment. This developer producing equipment comprises a preparation tank to which a developer stock solution and pure water are supplied, and in which these are agitated, first liquid amount measuring means for measuring the amount of the alkali type developer inside the preparation tank, first alkali concentration measuring means for measuring the alkali concentration of the abovementioned alkali type developer, first liquid amount control means for adjusting the amount of the alkali type developer inside the preparation tank on the basis of the measured value obtained by the abovementioned first liquid amount measuring means the abovementioned first alkali concentration measuring means, and liquid supply control means.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: September 23, 2003
    Assignee: Nagase & Co., Ltd.
    Inventors: Toshimoto Nakagawa, Shu Ogawa, Satoru Morita, Makoto Kikukawa, Takahiro Hozan
  • Patent number: 6588927
    Abstract: The developer producing equipment of the present invention is equipped with a preparation tank to which a developer stock solution and pure water are supplied, and in which these ingredients are agitated, and a leveling tank which is connected to this preparation tank. The leveling tank is connected via piping to working equipment in which electronic circuits are formed. Furthermore, the preparation tank and leveling tank have first and second alkali concentration measuring means for measuring the alkali concentrations of the alkali type developer inside the respective tanks. In the preparation tank, either the amount of developer stock solution that is supplied to the tank or the amount of pure water that is supplied to the tank, or both, are adjusted on the basis of the measured value obtained by the first alkali concentration measuring means, so that an alkali type developer is prepared.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: July 8, 2003
    Assignee: Nagase & Co., Ltd.
    Inventors: Toshimoto Nakagawa, Shu Ogawa, Satoru Morita, Makoto Kikukawa, Takahiro Hozan
  • Publication number: 20030096199
    Abstract: The present invention has the object of supplying an alkali-based treating liquid capable of reducing the amount used for treatment and the amount of liquid wastes produced, having an excellent solubility with respect to an exposed organic film such as a photoresist, and an equipment for supplying the same. In a developing liquid supplying equipment of the present invention, a receiving bath is connected to a development treating equipment via a line, and a pre-treating portion such as a filter, an adjusting bath and a leveling bath are sequentially provided in the following stages of the receiving bath. A liquid supplying system and a control device are connected to the adjusting bath, and the concentrations of the dissolved photoresist component and the alkali component in a used liquid can be adjusted to certain values, based on actually measured values obtained with a densitometer. The obtained regenerated liquid is supplied to the development treating equipment through a line.
    Type: Application
    Filed: August 9, 2002
    Publication date: May 22, 2003
    Inventors: Toshimoto Nakagawa, Yuko Katagiri, Shu Ogawa, Satoru Morita, Makoto Kikukawa, Takahiro Hozan
  • Publication number: 20020197869
    Abstract: The water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the water concentration in the water-based resist stripping liquid and an electrical conductivity meter that measures the degraded component concentration in the water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, a resist stripping reclaimed liquid, pure water, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
    Type: Application
    Filed: June 25, 2002
    Publication date: December 26, 2002
    Inventors: Toshimoto Nakagawa, Yuko Katagiri, Shu Ogawa, Satoru Morita, Makoto Kikukawa
  • Publication number: 20020197079
    Abstract: The non-water-based resist stripping liquid management apparatus according to the present invention manages in an adjusting bath a non-water-based resist stripping liquid that is used in resist stripping equipment. In this apparatus, an absorptiometer that measures the MEA concentration in the non-water-based resist stripping liquid and an analyzer that measures the degraded component concentration in the non-water-based resist stripping liquid are connected to a resist stripping treatment bath (adjusting bath) via pipelines, and at least one of a resist stripping stock liquid, an MEA stock liquid, a resist stripping reclaimed liquid, and a premixed resist stripping new liquid are fed into the resist stripping treatment bath in accordance with the measurement values obtained. As a result, the resist stripping performance of the non-water-based resist stripping liquid can be stably maintained, the amount of liquid used can be reduced, and the time for which operation is shut down can be reduced.
    Type: Application
    Filed: June 21, 2002
    Publication date: December 26, 2002
    Inventors: Toshimoto Nakagawa, Yuko Katagiri, Sho Ogawa, Satoru Morita, Makoto Kikukawa
  • Publication number: 20020146251
    Abstract: The developer producing equipment of the present invention is connected via piping to working equipment in which electronic circuits, on which fine working is performed, are formed, and produces an alkali type developer used in the abovementioned working equipment.
    Type: Application
    Filed: February 6, 2002
    Publication date: October 10, 2002
    Inventors: Toshimoto Nakagawa, Shu Ogawa, Satoru Morita, Makoto Kikukawa, Takahiro Hozan