Patents by Inventor Satoru Narizuka
Satoru Narizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110112306Abstract: A fluorine-containing sulfonic acid salt or a compound having a fluorine-containing sulfonic acid group, either of which having a structure represented by the following general formula (1), is provided. Such a salt or compound can act as a suitable photo-acid generator, and can form a resist pattern having excellent sensitivity, resolution and mask-dependence. [In general formula (1), R represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent hydrocarbon group having 3 to 30 carbon atoms and a cyclic or a partially cyclic structure, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted monovalent heterocyclic organic group having 4 to 30 carbon atoms.Type: ApplicationFiled: July 6, 2009Publication date: May 12, 2011Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Masashi Nagamori, Masaki Fujiwara, Kazunori Mori, Satoru Narizuka
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Publication number: 20110098500Abstract: A polymerizable fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.Type: ApplicationFiled: January 4, 2011Publication date: April 28, 2011Applicant: Central Glass Company, LimitedInventors: Yoshimi ISONO, Jonathan Joachim Jodry, Satoru Narizuka
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Patent number: 7932348Abstract: Polymers made by polymerization or cyclization condensation of a fluorine-containing polymerizable monomer represented by the formula [1] wherein “a” represents an integer from 1 to 4. The monomer contains a plurality of polymerizable amines in the molecule and at the same time one or more hexafluoroisopropyl group(s). With this structure it can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and it can be used for advanced polymer material fields.Type: GrantFiled: May 26, 2010Date of Patent: April 26, 2011Assignee: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20110070544Abstract: There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.Type: ApplicationFiled: March 10, 2009Publication date: March 24, 2011Applicant: Central Glass Company,Ltd.Inventors: Masashi Nagamori, Satoru Narizuka, Susumu Inoue, Takashi Kume
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Patent number: 7906269Abstract: Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.Type: GrantFiled: August 28, 2008Date of Patent: March 15, 2011Assignee: Central Glass Company, LimitedInventors: Yoshimi Isono, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka
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Patent number: 7887990Abstract: Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.Type: GrantFiled: June 11, 2008Date of Patent: February 15, 2011Assignee: Central Glass Company, LimitedInventors: Yoshimi Isono, Jonathan Joachim Jodry, Satoru Narizuka
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Publication number: 20110034721Abstract: By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt.Type: ApplicationFiled: September 5, 2008Publication date: February 10, 2011Applicant: Central Glass Company, LimitedInventors: Yuji Hagiwara, Masashi Nagamori, Masaki Fujiwara, Jonathan Joachim Jodry, Satoru Narizuka
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Publication number: 20110015431Abstract: Disclosed is a process for producing 2-bromo-2,2-difluoroethanol, which comprises reducing a bromodifluoroacetic acid derivative represented by the formula [1] by using an ate hydride complex as a reducing agent. 2-Bromo-2,2-difluoroethanol thus produced can be used as the starting material to carry out the esterification step, the sulfination step and the oxidation step in this order, thereby producing a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid salt, wherein A represents a substituted or unsubstituted linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, a substituted or unsubstituted aryloxy group having 6 to 15 carbon atoms, a heteroaryloxy group having 4 to 15 carbon atoms, or a halogen atom.Type: ApplicationFiled: September 5, 2008Publication date: January 20, 2011Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Jonathan Joachim Jodry, Masashi Nagamori, Yuji Hagiwara, Masaki Fujiwara, Satoru Narizuka
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Publication number: 20100304303Abstract: Disclosed is a fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound having a structure represented by the following general formula (A). In the formula, n indicates an integer of 1 to 10; R indicates a substituted or unsubstituted C1-C20 linear, branched or cyclic alkyl group, a substituted or unsubstituted C1-C20 linear, branched or cyclic alkenyl group, a substituted or unsubstituted C6-C15 aryl group, or a C4-C15 heteroaryl group; and a indicates 1 or 0. A photoacid generator containing the above fluorinated sulfonic acid salt or fluorinated sulfonic acid group-containing compound shows high sensitivity to an ArF excimer laser or the like, presents no concerns about human body accumulation, can generate an acid (photoacid) of sufficiently high acidity, and exhibits high solubility in a resist solvent and good compatibility with a resist resin.Type: ApplicationFiled: October 31, 2008Publication date: December 2, 2010Applicant: Central Glass Company, LimitedInventors: Kazuhiko Maeda, Yoshimi Isono, Satoru Narizuka
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Patent number: 7825280Abstract: The present invention relates to a fluorine-containing polymerizable monomer represented by the formula [1], [Chem. 31] wherein “a” represents an integer of 1-4. This monomer has a plurality of polymerizable amines in the molecule and at the same time a hexafluoroisopropyl group(s). With this, it can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.Type: GrantFiled: October 17, 2005Date of Patent: November 2, 2010Assignee: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20100234556Abstract: Polymers made by polymerization or cyclization condensation of a fluorine-containing polymerizable monomer represented by the formula [1] wherein “a” represents an integer from 1 to 4. The monomer contains a plurality of polymerizable amines in the molecule and at the same time one or more hexafluoroisopropyl group(s). With this structure it can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and it can be used for advanced polymer material fields.Type: ApplicationFiled: May 26, 2010Publication date: September 16, 2010Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Hiroshi SAEGUSA, Satoru Narizuka, Kazuhiko Maeda
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Patent number: 7728103Abstract: Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1?a+b?4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.Type: GrantFiled: July 31, 2009Date of Patent: June 1, 2010Assignee: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20100063232Abstract: A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n is an integer from 1 to 5.Type: ApplicationFiled: November 9, 2007Publication date: March 11, 2010Applicants: JSR CORPORATION, CENTRAL GLASS CO., LTD.Inventors: Tomoki Nagai, Takuma Ebata, Makoto Shimizu, Jonathan Joachim Jodry, Satoru Narizuka, Masaki Fujiwara
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Publication number: 20100035185Abstract: A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.Type: ApplicationFiled: February 14, 2008Publication date: February 11, 2010Applicant: CENTRAL GLASS COMPANY, LTD.Inventors: Yuji Hagiwara, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20100029895Abstract: There is provided a fluorine-containing diamine represented by formula (1). In this formula, R1 represents a condensed polycyclic type aromatic hydrocarbon group, and at least one —C(CF3)2OH group and at least one —NH2 group are in a relation such that they are attached to adjacent carbons of carbon atoms constituting the condensed polycyclic type aromatic hydrocarbon group. Polymer compounds derived from this fluorine-containing diamine have superior low dielectric property and low water-absorbing property, and, in addition to that, shows low thermal expansion property and high glass transition temperature.Type: ApplicationFiled: November 13, 2007Publication date: February 4, 2010Applicant: Central Glass Company, LimitedInventors: Satoru Narizuka, Yuji Hagiwara, Kazuhiro Yamanaka
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Patent number: 7629434Abstract: Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula, A represents a single bond, an oxygen atom, a sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, a phenyl or an alicyclic ring; a and b independently represent an integer of 0-2; and 1?a+b?4.) Such a fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer exhibiting water repellency, oil repellency, low water absorbency, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index, low dielectric properties and the like. Consequently, the fluorine-containing polymerizable monomer can be applied to the field of advanced polymer materials.Type: GrantFiled: October 13, 2005Date of Patent: December 8, 2009Assignee: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20090292104Abstract: Polymer compounds obtained by polymerization of a fluorine-containing polymerizable monomer represented by the formula [1] in which A represents a single bond, oxygen atom, sulfur atom, CO, CH2, SO, SO2, C(CH3)2, NHCO, C(CF3)2, phenyl, or aliphatic ring; “a” and “b” each independently represent an integer of 0-2, and 1?a+b?4. This fluorine-containing polymerizable monomer can be used as an effective polymerizable monomer, which can exhibit water repellency, oil repellency, low water absorptive property, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index property, low dielectric property, etc., and can be used for advanced polymer material fields.Type: ApplicationFiled: July 31, 2009Publication date: November 26, 2009Applicant: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20090061353Abstract: Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W1 independently represents a bivalent linking group, R2 represents an acid-labile protecting group, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R4, R5, R6 and W or W1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.Type: ApplicationFiled: August 28, 2008Publication date: March 5, 2009Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Yoshimi ISONO, Jonathan Joachim JODRY, Satoru NARIZUKA, Kazuhiro YAMANAKA
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Publication number: 20090030173Abstract: Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.Type: ApplicationFiled: July 16, 2008Publication date: January 29, 2009Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Satoru Narizuka, Yuji Hagiwara, Masashi Nagamori, Kazuhiro Yamanaka
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Publication number: 20090023886Abstract: Disclosed is a fluorine-containing polymerizable monomer represented by the formula [1] below. (In the formula [1], a represents an integer of 1-4.) By having a plurality of polymerizable amines in a molecule while containing a hexafluoroisopropyl group, this fluorine-containing polymerizable monomer exhibiting water repellancy, oil repellency, low water absorbency, heat resistance, weather resistance, corrosion resistance, transparency, photosensitivity, low refractive index, low dielectric properties, and the like, and thus can be applied to the field of advanced polymer materials.Type: ApplicationFiled: October 17, 2005Publication date: January 22, 2009Applicant: Central Glass Company, LimitedInventors: Hiroshi Saegusa, Satoru Narizuka, Kazuhiko Maeda