Abstract: In a preliminary deposition for producing an optical film in which multilayered optical thin-film is formed on a film substrate, a plurality of sputtering chambers are simultaneously energized to deposit a stacked body of thin-films made of two or more different materials on the film substrate, and the thicknesses of the plurality of thin-films are calculated from the optical properties obtained by the optical measuring unit (80) equipped in a sputtering apparatus. Measurement of the thicknesses and adjusting the deposition conditions for thin-films are repeated until the optical properties obtained by the optical measurement unit or the thickness of the respective thin-films calculated from the optical properties falls within a prescribed range.

Abstract: A method is disclosed to accurately estimate the thickness of each layer of a multilayer film. A first optical value difference between an actually measured optical value and a first theoretical optical value is obtained, and the first optical value difference is compared with a preset convergence condition. In a case where the first optical value difference does not satisfy the convergence condition, a second estimated thickness value of each layer expected to have an optical value difference smaller than the first optical value difference is set. A second optical value difference between an actually measured optical value and a second theoretical optical value is obtained, and the second optical value difference is compared with the convergence condition. Each step is repeated to obtain the estimated thickness value of each layer in which the difference between the actually measured optical value and the theoretical optical value satisfies the convergence condition.

Abstract: To realize film thickness correction of each layer without waste of material and time in the film formation method for a multilayer film in which each layer constituting the multilayer film is laminated one by one with a time interval. The film formation method for a multilayer film includes the steps of setting a target value (target thickness value) of a thickness of each layer, obtaining an estimated thickness (estimated thickness value) of each layer of a formed multilayer film 6, obtaining a film formation parameter change amount of each layer for minimizing a difference between the target thickness value and the estimated thickness value of each layer, and sequentially changing film formation parameters of each layer by the film formation parameter change amount of each layer with a time interval.

Abstract: A method is disclosed to accurately estimate the thickness of each layer of a multilayer film. A first optical value difference between an actually measured optical value and a first theoretical optical value is obtained, and the first optical value difference is compared with a preset convergence condition. In a case where the first optical value difference does not satisfy the convergence condition, a second estimated thickness value of each layer expected to have an optical value difference smaller than the first optical value difference is set. A second optical value difference between an actually measured optical value and a second theoretical optical value is obtained, and the second optical value difference is compared with the convergence condition. Each step is repeated to obtain the estimated thickness value of each layer in which the difference between the actually measured optical value and the theoretical optical value satisfies the convergence condition.

Abstract: In a preliminary deposition for producing an optical film in which multilayered optical thin-film is formed on a film substrate, a plurality of sputtering chambers are simultaneously energized to deposit a stacked body of thin-films made of two or more different materials on the film substrate, and the thicknesses of the plurality of thin-films are calculated from the optical properties obtained by the optical measuring unit (80) equipped in a sputtering apparatus. Measurement of the thicknesses and adjusting the deposition conditions for thin-films are repeated until the optical properties obtained by the optical measurement unit or the thickness of the respective thin-films calculated from the optical properties falls within a prescribed range.

Abstract: A die-type coating device includes a supply roll, a die, a rewinding roll, web widthwise end position detection devices, and layer widthwise end position detection devices. The die includes a pair of inner deckles which adjust a coating width. The inner deckle is arranged at one of two end portions of the die and configured to be easily moved in the die in a longitudinal direction of the die. The die includes a drive device which drives and moves the inner deckles. The drive device is driven on a basis of information on both widthwise end positions of the web detected by the web widthwise end position detection devices and information on both widthwise end positions of the layer of the coating liquid or the coating layer detected by the layer widthwise end position detection devices so that respective positions of the inner deckles relative to the die are changed.