Abstract: A semiconductor device with a large storage capacity per unit area is provided. The semiconductor device includes a first insulator including a first opening, a first conductor that is over the first insulator and includes a second opening, a second insulator that is over the first insulator and includes a third opening, and an oxide penetrating the first opening, the second opening, and the third opening. The oxide includes a first region at least in the first opening, a second region at least in the second opening, and a third region at least in the third opening. The resistances of the first region and the third region are lower than the resistance of the second region.

Abstract: An illuminator includes: a light emitter including a light-emitting diode; a temperature sensor configured to detect a current temperature of the light emitter; and an illumination controller configured to adjust a drive voltage being supplied to the light emitter in accordance with the current temperature. The illumination controller includes a reference temperature storage in which a reference temperature is stored in advance and is configured to adjust the drive voltage by detecting the current temperature from the temperature sensor on a constant time cycle and comparing the current temperature with the reference temperature.

Abstract: A gas atomization nozzle includes a through-hole formed along a center line; a nozzle portion configured of a Laval nozzle which is disposed around the center line and provided to be inclined at a predetermined angle toward the center line; and swirling motion imparting means for imparting a swirling flow around the center line to gas which is injected from the nozzle portion. The nozzle portion is formed in a ring shape which is continuous around the center line, and the swirling motion imparting means is configured as a fin provided in the nozzle portion to impart a swirling flow.

Abstract: A gas atomization nozzle includes a through-hole formed along a center line; a nozzle portion configured of a Laval nozzle which is disposed around the center line and provided to be inclined at a predetermined angle toward the center line; and swirling motion imparting means for imparting a swirling flow around the center line to gas which is injected from the nozzle portion. The nozzle portion is formed in a ring shape which is continuous around the center line, and the swirling motion imparting means is configured as a fin provided in the nozzle portion to impart a swirling flow.

Abstract: [Problem] To provide a photovoltaic device capable of generating power whether day or night, without affecting the appearance of a structure or reducing lighting or other functions, and able to inhibit rises in room temperature by converting thermal radiation into electrical energy. [Means to Solve Problems] Provide a photoelectric conversion element 3 with a photovoltaic device 1 on structural members 2a-2d facing the outside of a house or other structure. Power generated by the photoelectric conversion element 3 is extracted via a power extraction unit 4. The power conversion element 3 includes a semiconductor layer 11, conductive layer 20, a metal nanostructure 30 having multiple periodic structures 33, a first electrode 41 and a second electrode 42. The first and second electrodes 41, 42 are separated in the direction of the surface of the photoelectric conversion element 1 with the terminals 71, 81 of the power extraction unit 4 respectively connected.

Abstract: A process for producing a cyclic silane compound, in which a chained polysilane is subjected to pyrolysis in the presence of an oxide of a transition metal belonging to Group 8 or Group 11 of the periodic table; and a process for producing a cyclic carbosilane compound, that includes subjecting a chained polysilane to pyrolysis in the presence of a simple substance of a metal selected from the group consisting of transition metal elements and elements belonging to Groups 12 to 15 of the periodic table, or a compound thereof.

Abstract: A method for easily producing high-purity polydimethylsilane or polydiphenylsilane, where by-products such as alkali metal salt and alkaline earth metal salt can be efficiently removed, is provided. Dimethyldichlorosilane or diphenyldichlorosilane is reacted with an alkali metal such as metal sodium and metal magnesium and/or an alkaline earth metal in an organic solvent such as toluene to obtain crude polydimethylsilane or crude polydiphenylsilane, methanol having dissolved therein an ether ester-type nonionic surfactant or a surfactant such as alkylbenzenesulfonate is added to the crude polydimethylsilane or the crude polydiphenylsilane to deactivate the remaining alkali metal and alkaline earth metal, and the crude polydimethylsilane or the crude polydiphenylsilane is washed with water in the presence of a surfactant to efficiently remove an alkali metal salt, an alkaline earth metal salt and the like, whereby high-purity polydimethylsilane or polydiphenylsilane is obtained.

Abstract: A process for producing a cyclic silane compound, in which a chained polysilane is subjected to pyrolysis in the presence of an oxide of a transition metal belonging to Group 8 or Group 11 of the periodic table; and a process for producing a cyclic carbosilane compound, that includes subjecting a chained polysilane to pyrolysis in the presence of a simple substance of a metal selected from the group consisting of transition metal elements and elements belonging to Groups 12 to 15 of the periodic table, or a compound thereof.

Abstract: The present invention relates to: a process for producing a cyclic silane compound, which comprises subjecting a chained polysilane to pyrolysis in the presence of an oxide of a transition metal belonging to Group 8 or Group 11 of the periodic table; and a process for producing a cyclic carbosilane compound, which comprises subjecting a chained polysilane to pyrolysis in the presence of a simple substance of a metal selected from the group consisting of transition metal elements and elements belonging to Groups 12 to 15 of the periodic table or a compound thereof.

Abstract: [Problem] To provide a photovoltaic device capable of generating power whether day or night, without affecting the appearance of a structure or reducing lighting or other functions, and able to inhibit rises in room temperature by converting thermal radiation into electrical energy. [Means to Solve Problems] Provide a photoelectric conversion element 3 with a photovoltaic device 1 on structural members 2a-2d facing the outside of a house or other structure. Power generated by the photoelectric conversion element 3 is extracted via a power extraction unit 4. The power conversion element 3 includes a semiconductor layer 11, conductive layer 20, a metal nanostructure 30 having multiple periodic structures 33, a first electrode 41 and a second electrode 42. The first and second electrodes 41, 42 are separated in the direction of the surface of the photoelectric conversion element 1 with the terminals 71, 81 of the power extraction unit 4 respectively connected.

Abstract: The present invention relates to: a process for producing a cyclic silane compound, which comprises subjecting a chained polysilane to pyrolysis in the presence of an oxide of a transition metal belonging to Group 8 or Group 11 of the periodic table; and a process for producing a cyclic carbosilane compound, which comprises subjecting a chained polysilane to pyrolysis in the presence of a simple substance of a metal selected from the group consisting of transition metal elements and elements belonging to Groups 12 to 15 of the periodic table or a compound thereof.

Abstract: A method for easily producing high-purity polydimethylsilane or polydiphenylsilane, where by-products such as alkali metal salt and alkaline earth metal salt can be efficiently removed, is provided. Dimethyldichlorosilane or diphenyldichlorosilane is reacted with an alkali metal such as metal sodium and metal magnesium and/or an alkaline earth metal in an organic solvent such as toluene to obtain crude polydimethylsilane or crude polydiphenylsilane, methanol having dissolved therein an ether ester-type nonionic surfactant or a surfactant such as alkylbenzenesulfonate is added to the crude polydimethylsilane or the crude polydiphenylsilane to deactivate the remaining alkali metal and alkaline earth metal, and the crude polydimethylsilane or the crude polydiphenylsilane is washed with water in the presence of a surfactant to efficiently remove an alkali metal salt, an alkaline earth metal salt and the like, whereby high-purity polydimethylsilane or polydiphenylsilane is obtained.

Abstract: Processes for producing a compound represented by the formula (1), which includes an acrylic acid derivative and is useful as an agricultural chemical or medicine. One of the processes comprises the step of formulating a compound (3) and converting the OH of the resultant compound (2) into OR?. The first step comprises reacting a formic or orthoformic ester in the presence of a Lewis acid and a base. The second step comprises reacting the compound with R?OH or with R?OH and CH(OR?)3 under acidic conditions or using a phase-transfer catalyst in a two-phase system and regulating the base and the concentration thereof to stereoselectively synthesize the target compound. In another, process, the compound is efficiently produced without isolating the compound. The compound can also be produced without the compound (2).

Abstract: The invention provides novel processes for preparing efficiently compounds of general formula (1) (wherein R1 and R2 are each independently hydrogen, optionally substituted C1-C10 alkyl, C3-C14 hydrocarbyl bearing alicyclic skeleton, or the like) and initermediates thereof. Compounds of general formula (I) can be prepared by subjecting compounds of general formula (II) and/or salts thereof to cyclization hydrolysis in an aqueous basic solution. Further, compounds of general formula (II) can be prepared from industrially easily available diaminomaleonitrile in a high yield.

Abstract: Processes for producing a compound represented by the formula (1), which includes an acrylic acid derivative and is useful as an agricultural chemical or medicine. One of the processes comprises the step of formulating a compound (3) and converting the OH of the resultant compound (2) into OR″. The first step comprises reacting a formic or orthoformic ester in the presence of a Lewis acid and a base. The second step comprises reacting the compound with R″OH or with R″OH and CH(OR″)3 under acidic conditions or using a phase-transfer catalyst in a two-phase system and regulating the base and the concentration thereof to stereoselectively synthesize the target compound. In another, process, the compound is efficiently produced without isolating the compound. The compound can also be produced without the compound (2).

Abstract: A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle beam before exposing the charged-particle beam onto an object. The method includes the steps of mounting masks having the same aperture to the at least two exposure columns; scanning, in each of the at least two exposure columns, the charged-particle beam over an area containing a mark on a surface substantially at the same height as the object after passing the charged-particle beam through the same aperture; obtaining, in each of the at least two exposure columns, a signal waveform corresponding to the scan by detecting charged particles scattered by the mark; and comparing the signal waveform between the at least two exposure columns.

Abstract: A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle beam before exposing the charged-particle beam onto an object. The method includes the steps of mounting masks having the same aperture to the at least two exposure columns; scanning, in each of the at least two exposure columns, the charged-particle beam over an area containing a mark on a surface substantially at the same height as the object after passing the charged-particle beam through the same aperture; obtaining, in each of the at least two exposure columns, a signal waveform corresponding to the scan by detecting charged particles scattered by the mark; and comparing the signal waveform between the at least two exposure columns.

Abstract: In an exposure mask of the present invention, a plurality of opening regions are disposed via crossbeams, each having a size not to be resolved, along peripheral edges of island-like patterns and peninsula-like patterns for shielding transmission of charged particles.

Abstract: A device exposing an object to an electron beam employs a mask formed of a plate of material which blocks the electron beam and which has plural pattern exposure blocks defined therein, each having one or more aperture defining regions therein and, when selected, determining the shaping of the electron beam passing therethrough so as to expose a respective pattern on an object. Each aperture-defining region has a respective single aperture or respective plural, spaced apertures formed therein and having a total area size selected to be smaller than the area size of the aperture defining region, in accordance with controlling the current level of an electron beam passing therethrough, while reducing Coulomb interaction of the electron beam passing through the aperture or apertures of each aperture defining portion of the pattern exposure block.