Patents by Inventor Satoshi Furubeppu

Satoshi Furubeppu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7485696
    Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight Mn, a specific molecular weight distribution Mw/Mn, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.
    Type: Grant
    Filed: April 2, 2007
    Date of Patent: February 3, 2009
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
  • Publication number: 20070173631
    Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight. Mn, a specific molecular weight distribution Mn/Mw, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.
    Type: Application
    Filed: April 2, 2007
    Publication date: July 26, 2007
    Inventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
  • Patent number: 7217783
    Abstract: An oxytetramethylene glycol copolymer obtained by copolymerizing tetrahydrofuran and neopentyl glycol which has a specific number average molecular weight Mn, a specific molecular weight distribution Mw/Mn, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh; a method for producing the same; and a method for purifying an oxytetramethylene glycol copolymer using fresh tetrahydrofuran.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: May 15, 2007
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Tamotsu Kodama, Toshihiko Fukuzono, Satoshi Furubeppu
  • Publication number: 20040049007
    Abstract: Disclosed is an oxytetramethylene glycol copolymer, which is obtained by copolymerizing tetrahydrofuran and neopentyl glycol and which has a specific number average molecular weight Mn, a specific molecular weight distribution Mn/Mw, a specific neopentyl glycol copolymerization whole ratio Nw and a specific neopentyl glycol copolymerization partial ratio Nh, and a method for producing the same. Also disclosed is a method for purifying an oxytetramethylene glycol copolymer, which comprises adding a fresh tetrahydrofuran to a reaction mixture comprising an oxytetramethylene glycol copolymer and an unreacted diol, wherein the amount of added tetrahydrofuran is not less than the weight of the unreacted diol contained in the reaction mixture, and distilling off the unreacted diol together with the added tetrahydrofuran.
    Type: Application
    Filed: July 9, 2003
    Publication date: March 11, 2004
    Inventors: Tamotsu Kodama, Haruyuki Minoura, Yoshiyuki Tsunematsu, Toshihiko Fukuzono, Satoshi Furubeppu
  • Patent number: 5576410
    Abstract: A diaminourea compound having the formula (I); ##STR1## wherein R.sub.1 and R.sub.2 are independently a straight or branched alkylene group having 2 to 8 carbon atoms, an alicyclic alkylene group having 6 to 15 carbon atoms, a phenylene group, a C.sub.1 -C.sub.4 alkyl-substituted phenylene group, a C.sub.1 -C.sub.4 mono- or di-alkylene substituted phenylene group, or a methanediphenylene group, and a production process thereof as well as a high heat resistant polyurethaneurea derived therefrom and a production process thereof.
    Type: Grant
    Filed: January 25, 1995
    Date of Patent: November 19, 1996
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Akihiko Yosizato, Satoshi Furubeppu
  • Patent number: 5414118
    Abstract: A diaminourea compound having the formula (I); ##STR1## wherein R.sub.1 and R.sub.2 are independently a straight or branched alkylene group having 2 to 8 carbon atoms, an alicyclic alkylene group having 6 to 15 carbon atoms, a phenylene group, a C.sub.1-C.sub.4 alkyl-substituted phenylene group, a C.sub.1-C.sub.4 mono- or di-alkylene substituted phenylene group, or a methanediphenylene group, and a production process thereof as well as a high heat resistant polyurethaneurea derived therefrom and a production process thereof.
    Type: Grant
    Filed: December 30, 1993
    Date of Patent: May 9, 1995
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Akihiko Yosizato, Satoshi Furubeppu