Abstract: To provide an artificial bone having a porous structure with an improved affinity to osteogenic cells, an artificial bone (1) includes: a base material (2) containing porous ceramics provided with mutually interconnected multiple pores (6); a carbonaceous thin film (10) formed on an outer surface of the base material and wall surfaces (7) of the pores; and functional groups (13) including amino groups (12) provided on a surface and in an interior of the carbonaceous thin film.

Abstract: In an etching method for an oxide semiconductor film according to an embodiment of the present disclosure, a modified layer is formed in the oxide semiconductor film by using a first rare gas and the modified layer is sputtered by using a second rare gas different from the first rare gas.

Abstract: In an etching method for an oxide semiconductor film according to an embodiment of the present disclosure, a modified layer is formed in the oxide semiconductor film by using a first rare gas and the modified layer is sputtered by using a second rare gas different from the first rare gas.

Abstract: To provide an artificial bone having a porous structure with an improved affinity to osteogenic cells, an artificial bone (1) includes: a base material (2) containing porous ceramics provided with mutually interconnected multiple pores (6); a carbonaceous thin film (10) formed on an outer surface of the base material and wall surfaces (7) of the pores; and functional groups (13) including amino groups (12) provided on a surface and in an interior of the carbonaceous thin film.

Abstract: A heat exchanger (1) is provided with header pipes (2, 3), a plurality of flat tubes (4) disposed between the header pipes, and corrugated fins (6) disposed between the flat tubes (4). The end of the corrugated fin at the surface on the side, on which condensed water gathers, of the heat exchanger protrudes from an end of the flat tube (4), and a linear water-conducting member (10) is inserted between a gap (G) formed between the protruding portions of the corrugated fins. The interval between the water-conducting member and the protruding end of the corrugated fin located thereon is a distance at which the surface tension of water can act therebetween. A V-shaped cut (6a or 6b) is formed at the edge of the protruding end of the corrugated fin.

Abstract: An object of the present invention is to efficiently sterilize microorganisms present in or on a surface of a liquid. Plasma is generated in a vicinity of or in a manner to make contact with a liquid whose pH value is adjusted to become 4.8 or lower, more preferably 4.5 or lower. The plasma is generated in an atmospheric gas containing nitrogen, e.g., in the air. Superoxide anion radicals (O2?.) that are generated by the plasma react with protons (H+) in the liquid to form hydroperoxy radicals (HOO.). Further, nitrogen and oxygen included in the air are combined together by the action of plasma to form nitrogen oxide such as nitric oxide (NO.). The nitric oxide (NO.) combines with the hydroperoxy radicals (HOO.) to become peroxynitrite (ONOOH(ONOO?)) having a high microbiocidal activity.

Abstract: An object is to provide a Tol1 element transposase and a use thereof. Provided is a Tol1 element transposase containing (a) a protein having the amino acid sequence of SEQ ID No: 1 or (b) a protein having an amino acid sequence homologous to the amino acid sequence of SEQ ID NO: 1 and having an enzymatic activity for transferring Tol1 element. Further, provided is a polynucleotide encoding the transposase and an expression construct containing the polynucleotide therein. The present invention also provides a DNA introduction system including (a) a donor factor having such a structure that a desired DNA is inserted in a transposase gene-defected Tol1 element and (b) a helper factor containing the transposase or the polynucleotide.

Abstract: An object is to provide a Tol1 element transposase and a use thereof. Provided is a Tol1 element transposase containing (a) a protein having the amino acid sequence of SEQ ID No: 1 or (b) a protein having an amino acid sequence homologous to the amino acid sequence of SEQ ID NO: 1 and having an enzymatic activity for transferring Tol1 element. Further, provided are a polynucleotide encoding the transposase and an expression construct containing the polynucleotide therein. The present invention also provides a DNA introduction system including (a) a donor factor having such a structure that a desired DNA is inserted in a transposase gene-defected Tol1 element and (b) a helper factor containing the transposase or the polynucleotide.

Abstract: The heat exchanger (1) comprises: two header pipes (2),(3) arranged in parallel with an interval therebetween; a plurality of flat tubes (4) which are arranged between the header pipes and which place coolant paths (5) provided therein in communication with the interior of the header pipes; a plurality of fins (6) attached to the flat surface of each flat tube; and side sheets (10U), (10D) attached to an outside of the fins (6aU), (6aD), which are positioned farthest outward among the plurality of fins. The side sheet (10D) positioned in the bottom part of the heat exchanger (1) has a plurality of notches (11) formed at intervals from each other on the edge of the side where condensed water collects in the heat exchanger (1). The notches are each provided with a width sufficient for covering the interval pitch (P) of the fin by several pitch lengths.

Abstract: A low-frequency high AC voltage from an excitation voltage power source (14) is applied between one electrode (8) and two other electrodes (9A and 9B) to generate a low-frequency AC-excited dielectric barrier discharge within a gas passage (3), thereby creating atmospheric pressure non-equilibrium micro-plasma. A sample gas is mixed with hydrogen inside the passage of a nozzle (51), and further mixed with air outside an exit port (53) to burn, forming a hydrogen flame (57). Then, the sample gas reaches an ionization area (56), where the sample components are ionized due to the effect of light emitted from the plasma. Meanwhile, water molecules generated in the hydrogen flame (57) are supplied into the ionization area (56), whereby some of the sample-molecule ions are hydrated while the others undergo a reaction to form a hydroxonium ion.

Abstract: A heat exchanger (1) is provided with header pipes (2, 3), a plurality of flat tubes (4) disposed between the header pipes, and corrugated fins (6) disposed between the flat tubes (4). The end of the corrugated fin at the surface on the side, on which condensed water gathers, of the heat exchanger protrudes from an end of the flat tube (4), and a linear water-conducting member (10) is inserted between a gap (G) formed between the protruding portions of the corrugated fins. The interval between the water-conducting member and the protruding end of the corrugated fin located thereon is a distance at which the surface tension of water can act therebetween. A V-shaped cut (6a or 6b) is formed at the edge of the protruding end of the corrugated fin.

Abstract: For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 3, 4 that form an electric field in the medium gas mass are provided. The electric field forming elements form an electric field so that partial discharge occurs from the electric field forming elements toward both sides in the longitudinal direction of the medium gas mass. Accordingly, plasma 5 is produced from the medium gas mass. The medium gas mass is formed by, for example, gas supply members 1,2 that guide medium gas, through an internal hollow, to the electric field forming elements. An electric field forming area includes, for example, at least one high-potential electrode 3 and a voltage applying unit 4 that applies a voltage to the high-potential electrode. Plasma limited in medium gas can be produced with high energy efficiency stably over a wide range of parameters through a simple configuration.

Abstract: A low-frequency high AC voltage from an excitation voltage power source (14) is applied between one electrode (8) and two other electrodes (9A and 9B) to generate a low-frequency AC-excited dielectric barrier discharge within a gas passage (3), thereby creating atmospheric pressure non-equilibrium micro-plasma. A sample gas is mixed with hydrogen inside the passage of a nozzle (51), and further mixed with air outside an exit port (53) to burn, forming a hydrogen flame (57). Then, the sample gas reaches an ionization area (56), where the sample components are ionized due to the effect of light emitted from the plasma. Meanwhile, water molecules generated in the hydrogen flame (57) are supplied into the ionization area (56), whereby some of the sample-molecule ions are hydrated while the others undergo a reaction to form a hydroxonium ion.

Abstract: An object of the present invention is to efficiently sterilize microorganisms present in or on a surface of a liquid. Plasma is generated in a vicinity of or in a manner to make contact with a liquid whose pH value is adjusted to become 4.8 or lower, more preferably 4.5 or lower. The plasma is generated in an atmospheric gas containing nitrogen, e.g., in the air. Superoxide anion radicals (O2?.) that are generated by the plasma react with protons (H+) in the liquid to form hydroperoxy radicals (HOO.). Further, nitrogen and oxygen included in the air are combined together by the action of plasma to form nitrogen oxide such as nitric oxide (NO.). The nitric oxide (NO.) combines with the hydroperoxy radicals (HOO.) to become peroxynitrite (ONOOH(ONOO?)) having a high microbiocidal activity.

Abstract: An object is to provide a Tol1 element transposase and a use thereof. Provided is a Tol1 element transposase containing (a) a protein having the amino acid sequence of SEQ ID No: 1 or (b) a protein having an amino acid sequence homologous to the amino acid sequence of SEQ ID NO: 1 and having an enzymatic activity for transferring Tol1 element. Further, provided are a polynucleotide encoding the transposase and an expression construct containing the polynucleotide therein. The present invention also provides a DNA introduction system including (a) a donor factor having such a structure that a desired DNA is inserted in a transposase gene-defected Tol1 element and (b) a helper factor containing the transposase or the polynucleotide.

Abstract: For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 3, 4 that form an electric field in the medium gas mass are provided. The electric field forming elements form an electric field so that partial discharge occurs from the electric field forming elements toward both sides in the longitudinal direction of the medium gas mass. Accordingly, plasma 5 is produced from the medium gas mass. The medium gas mass is formed by, for example, gas supply members 1,2 that guide medium gas, through an internal hollow, to the electric field forming elements. An electric field forming area includes, for example, at least one high-potential electrode 3 and a voltage applying unit 4 that applies a voltage to the high-potential electrode. Plasma limited in medium gas can be produced with high energy efficiency stably over a wide range of parameters through a simple configuration.

Abstract: The present invention provides a method for manufacturing a hard carbon film having a high sp3 bond ratio and excellent film quality. In one embodiment of the present invention, CH3 ions and CH3 radicals in plasma are irradiated to a substrate at an energy of 10 to 50 eV, thereby forming a carbon film having a ratio of sp3 bonds of 40% or higher.

Abstract: A high-density plasma-processing reactor with a processing chamber configuration which closes upon itself. The reactor applies a toroidal magnetic field to the plasma discharge which creates magnetic field lines which close upon themselves thereby preventing the magnetized plasma electrons traveling along these magnetic field lines from diffusing to the chamber wall or adjacent magnetic field lines. This electron confinement scheme is expected to result in a plasma density in the 10.sup.12 to 10.sup.13 cm.sup.-3 range. The high density plasma processing reactor includes a plasma processing chamber which forms an enclosed configuration mounted within a plurality of toroidal solenoid coils and containing a plurality of plasma source regions.