Patents by Inventor Satoshi Hitomi

Satoshi Hitomi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8601978
    Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.
    Type: Grant
    Filed: July 14, 2009
    Date of Patent: December 10, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
  • Patent number: 8281740
    Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.
    Type: Grant
    Filed: July 14, 2009
    Date of Patent: October 9, 2012
    Assignee: Canon Anelva Corporation
    Inventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
  • Patent number: 7770714
    Abstract: A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pushes up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: August 10, 2010
    Assignee: Canon Anelva Corporation
    Inventors: Naoyuki Nozawa, Hiroshi Sone, Satoshi Hitomi, Yoshiro Hasegawa
  • Publication number: 20100025363
    Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate W, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate W, and an area of a first grid in the first ion beam generator, and an area of a second grid in the second ion beam generator, each area corresponding to an opening of the substrate W, are occluded.
    Type: Application
    Filed: July 14, 2009
    Publication date: February 4, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
  • Publication number: 20100028529
    Abstract: The present invention provides a substrate processing apparatus capable of suppressing mutual contamination and/or damage of the insides of ion beam generators arranged opposite each other via a substrate, and a magnetic recording medium manufacturing method. A substrate processing apparatus according to an embodiment of the present invention includes a first ion beam generator that applies an ion beam to one surface to be processed of a substrate, and a second ion beam generator that applies an ion beam to another surface to be processed, which are arranged opposite each other via the substrate, and a first grid in the first ion beam generator, and a second grid in the second ion beam generator are configured so as to be asymmetrical to each other.
    Type: Application
    Filed: July 14, 2009
    Publication date: February 4, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Kazuto Yamanaka, Masahiro Shibamoto, Ayumu Miyoshi, Satoshi Hitomi, David Djulianto Djayaprawira
  • Publication number: 20090056878
    Abstract: A transfer apparatus includes a first magnetic member placed in a carrier, and a second magnetic member placed in a carrier supporting unit to oppose the first magnetic member from a position below the first magnetic member in the vertical direction, and having the same polarity as that of the first magnetic member. The repulsive force generated between the first and second magnetic members vertically pulls up the carrier, thereby reducing the weight of the carrier supported by the carrier supporting unit.
    Type: Application
    Filed: August 20, 2008
    Publication date: March 5, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Naoyuki Nozawa, Hiroshi Sone, Satoshi Hitomi, Yoshiro Hasegawa
  • Patent number: 5253626
    Abstract: A rotational speed control system for an internal combustion engine capable of preventing a dead time or dead section from occurring in controlling of a rotational speed of the engine. An integrating circuit is controlled by means of an output of a comparator for comparing a rotational speed detection signal with a target rotational speed setting signal, to thereby obtain an integral voltage which falls and rises when the rotational speed detection signal is above and below the target rotational speed setting signal, respectively. Comparison of the integral voltage with a sawtooth signal voltage leads to a pulse signal subjected to pulse width modulation. The pulse signal is fed to an actuator driving circuit to carry out on-off controlling of a drive current for the actuator. Connection of voltage limiting circuits to the integrating circuit causes a variation of the integral voltage to be limited within a range of amplitude of the integral voltage, to thereby eliminate the dead time or dead section.
    Type: Grant
    Filed: October 6, 1992
    Date of Patent: October 19, 1993
    Assignee: Kokusan Denki Co., Ltd.
    Inventors: Yasukazu Hatano, Hidetoshi Suzuki, Satoshi Hitomi