Abstract: A motor control device which is an example of the present disclosure includes a hardware processor configured to: calculate damper torque on a basis of a difference between a crank angle and a motor angle; calculate, on a basis of the damper torque, reversed phase torque in reverse phase to the damper torque; calculate a correction amount for a phase of the reversed phase torque on a basis of a difference between a first value corresponding to a torsion angle between an input inertial member and an output inertial member and a second value corresponding to a torsion angle between an intermediate inertial member and the output inertial member; and output a motor torque command to be provided to a motor generator on a basis of the reversed phase torque a phase of which has been corrected in accordance with the correction amount.

Abstract: A motor control device according to an embodiment includes a hardware processor configured to: calculate a first torsion torque generated by a motor shaft according to fluctuation of an engine torque based on a difference between a motor angle as a rotation angle of the motor shaft and a shaft angle as a rotation angle of a transmission shaft of a transmission on the downstream side of a damper; calculate a first vibration damping torque to be output by a motor generator to damp vibration of the motor shaft based on the first torsion torque and a drive state value indicating a drive state of an engine; and output a motor torque command value to be provided to the motor generator based on the first vibration damping torque.

Abstract: A wafer support member that can move in the same chamber after a film has been formed on a wafer and enable processing of the film-formed wafer and a semiconductor manufacturing apparatus including the wafer support member are provided. The wafer support plate 10 includes a flat portion 1 configured to support a wafer W and an outer circumferential protruding portion 2, being disposed in a surrounding shape on an outer circumference of the flat portion 1 and being formed with a larger thickness than the wafer W. The flat portion 1 includes a perforated support portion 1A and an annular support portion 1B. The annular support portion 1B is disposed outside of the perforated support portion 1A and supports an outer circumferential end portion Wo of the wafer W.

Abstract: A robot mechanism is provided with a parallel link including a first output base, a first parallel link mechanism disposed on a first side of the first output base, and a second parallel link mechanism and an end effector disposed on a second side of the first output base. The first parallel link mechanism includes a first driver that generates a linear motion output and a second driver that generates a linear motion output. A tilting link mechanism including a mass body that generates a second moment load in a direction to reduce a first moment load exerted on the first parallel link mechanism by the weight of the second parallel link mechanism and the end effector is connected to the first driver and the second driver.

Abstract: Provided is a robot control device capable of reducing a robot vibration amount using machine learning based on a small number of operations.

Abstract: A driving device includes a corrector, an actuator, and a position sensor. The actuator includes a nut connected to a movable part, a ball screw shaft onto which the nut is screwed, and a pulse motor that drives to rotate the ball screw shaft. The corrector includes a correction amount map in which a position correction amount for calibrating a predictable error is mapped for each position of the movable part. The corrector estimates an ideal movement position to which the movable part moves based on a command signal and refers to the correction amount map to calculate the position correction amount corresponding to a present position detected by the position sensor. The corrector generates a correction signal by correcting the command signal so as to reduce the difference between a corrected present position obtained by correcting the present position by the position correction amount and the ideal movement position.

Abstract: The method for manufacturing a modified aluminosilicate includes a first step of treating an aluminosilicate with an acid, a second step of primarily calcining the treated material obtained in the first step at 550° C. to 850° C., and a third step of contacting the calcined material obtained in the second step with a liquid containing one or more Group 4 elements and/or Group 5 elements, and then drying and secondarily calcining the resultant. The modified aluminosilicate includes one or more Group 4 elements and/or Group 5 elements, and exhibits an absorbance at 300 nm in an ultraviolet visible spectrum of 1.0 or higher. The method for manufacturing aromatic dihydroxy compounds includes reacting a phenol with hydrogen peroxide in the presence of a specific modified aluminosilicate.

Abstract: A robot mechanism is provided with a parallel link including a first output base, a first parallel link mechanism disposed on a first side of the first output base, and a second parallel link mechanism and an end effector disposed on a second side of the first output base. The first parallel link mechanism includes a first driver that generates a linear motion output and a second driver that generates a linear motion output. A tilting link mechanism including a mass body that generates a second moment load in a direction to reduce a first moment load exerted on the first parallel link mechanism by the weight of the second parallel link mechanism and the end effector is connected to the first driver and the second driver.

Abstract: A driving device includes a corrector, an actuator, and a position sensor. The actuator includes a nut connected to a movable part, a ball screw shaft onto which the nut is screwed, and a pulse motor that drives to rotate the ball screw shaft. The corrector includes a correction amount map in which a position correction amount for calibrating a predictable error is mapped for each position of the movable part. The corrector estimates an ideal movement position to which the movable part moves based on a command signal and refers to the correction amount map to calculate the position correction amount corresponding to a present position detected by the position sensor. The corrector generates a correction signal by correcting the command signal so as to reduce the difference between a corrected present position obtained by correcting the present position by the position correction amount and the ideal movement position.

Abstract: Provided are the following: an MWW type zeolite which has many Brønsted acid sites when in the form of a proton type and which is highly suitable as a cracking catalyst for cumene; a method for producing same; and an application of same. The present invention provides an MWW type zeolite in which the ratio (B/A) of the peak intensity (B) attributable to tetracoordinate aluminum relative to the peak intensity (A) attributable to hexacoordinate aluminum is 2 or more in 27Al MAS NMR, when measured as an ammonium type. The present invention also provides a method for producing an MWW type zeolite, the method having a step for carrying out a hydrothermal synthesis reaction in the presence of: a seed crystal of an MWW type zeolite containing no organic structure-directing agent; and a reaction mixture containing a silica source, an alumina source, an alkali source, an organic structure-directing agent, and water. The reaction mixture satisfies the following molar ratio: X/SiO2<0.

Abstract: Provided are the following: an MWW type zeolite which has many Brønsted acid sites when in the form of a proton type and which is highly suitable as a cracking catalyst for cumene; a method for producing same; and an application of same. The present invention provides an MWW type zeolite in which the ratio (B/A) of the peak intensity (B) attributable to tetracoordinate aluminum relative to the peak intensity (A) attributable to hexacoordinate aluminum is 2 or more in 27Al MAS NMR, when measured as an ammonium type. The present invention also provides a method for producing an MWW type zeolite, the method having a step for carrying out a hydrothermal synthesis reaction in the presence of: a seed crystal of an MWW type zeolite containing no organic structure-directing agent; and a reaction mixture containing a silica source, an alumina source, an alkali source, an organic structure-directing agent, and water. The reaction mixture satisfies the following molar ratio: X/SiO2<0.

Abstract: A control device controls a mechanical device having a movable member driven by a motor. The control device includes a radio signal exchange unit that receives a sensor signal indicating a position, a velocity or an acceleration of a tip part of the movable member, a data acquisition unit that acquires first time-series data of acceleration based on the received sensor signal, a data calculation unit that calculates second time-series data of acceleration at the tip part based on a drive command to the motor, a delay time calculation unit that calculates, when the mechanical device performs a predetermined basic operation, a delay time of the first time-series data to the second time-series data, based on a degree of correlation between the first and second time-series data, and a time synchronization unit that synchronizes time of the sensor part and control device based on the delay time.

Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.

Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.

Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.

Abstract: A robot system includes: a learning control unit configured to perform learning for calculating a learning correction amount for bringing a position of a control target portion toward a target position; a robot control unit configured to control the operation of the robot mechanism unit; a power spectrum calculating unit configured to calculate a power spectrum of a vibration data of the control target portion; a comparison unit configured to compare each power spectrum between at the time of the current learning and at the time of the immediately preceding learning; and a learning correction amount updating unit configured to adjust at least one of a phase and a gain of the learning correction amount used at the time of the current learning to set the adjusted learning correction amount as a new learning correction amount used at the time of next learning.

Abstract: Provided is a beta zeolite also having exceptional catalytic activity as a catalyst other than an olefin epoxidation catalyst. This beta zeolite is synthesized without using an organic structure-directing agent and has titanium in the structural skeleton thereof, the Ti content being 0.10 mmol/g or higher. This beta zeolite preferably has an Si/Ti molar ratio of 20-200. Also, the Si/Al molar ratio is preferably 100 or higher.

Abstract: There are provided a method for manufacturing a modified aluminosilicate by which a hydroquinone is highly selectively manufactured by reaction of a phenol with hydrogen peroxide, a modified aluminosilicate, and a method for manufacturing an aromatic dihydroxy compound by using the modified aluminosilicate, under industrially advantageous conditions. The method for manufacturing a modified aluminosilicate of the present invention includes a first step of treating an aluminosilicate with an acid, a second step of primarily calcining the treated material obtained in the first step at 550° C. to 850° C., and a third step of contacting the calcined material obtained in the second step with a liquid. containing one or more elements selected from the group consisting of Group 4 elements and. Group 5 elements on. the periodic table, and then drying and secondarily calcining the resultant. The modified aluminosilicate included in the present invention.

Abstract: The purpose of the present invention is to provide a metal-substituted beta zeolite that exhibits a more excellent catalytic performance than conventional one, and a method for producing the same. The present invention provides a metal-substituted beta zeolite by subjecting an alkali metal-form beta zeolite produced without using an organic structure-directing agent to ion exchange with ammonium ion and then, using a filter cake procedure, to ion exchange with copper ion or iron(II) ion. The present invention also provides a metal-substituted beta zeolite which has been ion exchanged with copper ion or iron(II) ion and in which the amount of Lewis acid sites is greater than the amount of Bronsted acid sites when the amount of Bronsted acid sites and the amount of Lewis acid sites are measured by ammonia infrared-mass spectroscopy temperature-programmed desorption on the as-produced state.

Abstract: A vibration analyzer includes a sensor that measures a vibration of an end effector supported by a distal end of a robot, a storage unit that stores a vibration calculation model of the robot, and a control unit configured to perform separation processing for separating a vibration to be reduced that is measured by the sensor into vibration data of the robot and vibration data of the end effector by using the vibration calculation model of the robot.