Patents by Inventor Satoshi Inagaki
Satoshi Inagaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240392427Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.Type: ApplicationFiled: August 1, 2024Publication date: November 28, 2024Applicant: United Semiconductor Japan Co., Ltd.Inventor: Satoshi Inagaki
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Publication number: 20240361840Abstract: A vibration distribution control device configured to generate a vibration source being present at a predetermined position by using a plurality of vibrators includes: a calculator configured to calculate a perceived intensity from a vibration waveform of the vibration source; a distributor configured to distribute the perceived intensity of each of the plurality of vibrators in accordance with an azimuth of the vibration source and arrangement positions of the plurality of vibrators; and signal output processor circuitry configured to control and output vibrations of the plurality of vibrators based on information distributed by the distribution distributor.Type: ApplicationFiled: June 4, 2021Publication date: October 31, 2024Applicant: TOHOKU UNIVERSITYInventors: Masashi KONYO, Takuma INAGAKI, Daiki KIKUCHI, Kosuke YAMAGUCHI, Satoshi TADOKORO
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Patent number: 12123087Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.Type: GrantFiled: January 12, 2022Date of Patent: October 22, 2024Assignee: United Semiconductor Japan Co., Ltd.Inventor: Satoshi Inagaki
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Patent number: 12110647Abstract: A bag body 10 is filled with stones 12. A restraining rope 14 extends from the bottom of the bag body 10 through the center of the bag body 10 and is pulled up together with a lifting rope 15 to lift the bag body 10. The bag body 10 is within a predetermined range centered about a curve given by W/H1 (diameter/restraining rope length)=15.898×(W/W0)2?17.784×(W/W0)+6.6314, where W represents the diameter of the bag body 10, H1 represents the length of the restraining rope 14 from the bottom portion of the bag body 10 to a root position of a mouth closing rope 13 of a bag material through the center of the bag body 10, and W0 represents the diameter when the bag material 11 is filled with the filling material 12.Type: GrantFiled: May 7, 2021Date of Patent: October 8, 2024Assignee: KYOWA CO., LTD.Inventors: Satoshi Inagaki, Hidehiro Fujita, Issei Umetsu, Hirofumi Koyama, Masataka Kinoshita, Koji Kajiwara, Hironori Kawamura
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Publication number: 20240229397Abstract: A bag body 10 is filled with stones 12. A restraining rope 14 extends from the bottom of the bag body 10 through the center of the bag body 10 and is pulled up together with a lifting rope 15 to lift the bag body 10. The bag body 10 is within a predetermined range centered about a curve given by W/H1 (diameter/restraining rope length)=15.898×(W/W0)2?17.784×(W/W0)+6.6314, where W represents the diameter of the bag body 10, H1 represents the length of the restraining rope 14 from the bottom portion of the bag body 10 to a root position of a mouth closing rope 13 of a bag material through the center of the bag body 10, and W0 represents the diameter when the bag material 11 is filled with the filling material 12.Type: ApplicationFiled: May 7, 2021Publication date: July 11, 2024Applicants: KAJIMA CORPORATION, FUDO TETRA CORPORATION, KYOWA CO., LTD.Inventors: Satoshi INAGAKI, Hidehiro FUJITA, Issei UMETSU, Hirofumi KOYAMA, Masataka KINOSHITA, Koji KAJIWARA, Hironori KAWAMURA
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Publication number: 20240216899Abstract: Provided is a method for manufacturing a modified aluminosilicate in which a hydroquinone is highly selectively manufactured by a reaction between a phenol and hydrogen peroxide under industrially advantageous conditions, wherein the manufacturing method includes: a second step for treating an aluminosilicate with an acid; a third step for performing primary calcination of the treatment product obtained in the second step; and a fourth step in which the primary calcined product obtained in the third step and liquid containing one or more elements selected from the group consisting of elements in Group 4 and Group 5 of the Periodic Table are brought into contact with each other, and drying and secondary calcination then performed.Type: ApplicationFiled: April 22, 2022Publication date: July 4, 2024Applicant: MITSUI CHEMICALS, INC.Inventors: Nobuhiko HORIUCHI, Takuma MATSUSHIMA, Satoshi AKIYAMA, Akihiro OKABE, Itsuki IMOTO, Keita NAKANISHI, Susumu SAITO, Yoshihiro KUBOTA, Satoshi INAGAKI
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Publication number: 20240068100Abstract: A wafer support member that can move in the same chamber after a film has been formed on a wafer and enable processing of the film-formed wafer and a semiconductor manufacturing apparatus including the wafer support member are provided. The wafer support plate 10 includes a flat portion 1 configured to support a wafer W and an outer circumferential protruding portion 2, being disposed in a surrounding shape on an outer circumference of the flat portion 1 and being formed with a larger thickness than the wafer W. The flat portion 1 includes a perforated support portion 1A and an annular support portion 1B. The annular support portion 1B is disposed outside of the perforated support portion 1A and supports an outer circumferential end portion Wo of the wafer W.Type: ApplicationFiled: August 17, 2023Publication date: February 29, 2024Applicant: United Semiconductor Japan Co., Ltd.Inventor: Satoshi Inagaki
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Patent number: 11872693Abstract: A robot mechanism is provided with a parallel link including a first output base, a first parallel link mechanism disposed on a first side of the first output base, and a second parallel link mechanism and an end effector disposed on a second side of the first output base. The first parallel link mechanism includes a first driver that generates a linear motion output and a second driver that generates a linear motion output. A tilting link mechanism including a mass body that generates a second moment load in a direction to reduce a first moment load exerted on the first parallel link mechanism by the weight of the second parallel link mechanism and the end effector is connected to the first driver and the second driver.Type: GrantFiled: December 2, 2021Date of Patent: January 16, 2024Assignee: NSK LTD.Inventors: Kohei Shirahama, Sumio Sugita, Satoshi Inagaki
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Publication number: 20230364789Abstract: Provided is a robot control device capable of reducing a robot vibration amount using machine learning based on a small number of operations.Type: ApplicationFiled: December 14, 2021Publication date: November 16, 2023Applicant: FANUC CORPORATIONInventors: Satoshi INAGAKI, Hajime SUZUKI
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Patent number: 11766778Abstract: A driving device includes a corrector, an actuator, and a position sensor. The actuator includes a nut connected to a movable part, a ball screw shaft onto which the nut is screwed, and a pulse motor that drives to rotate the ball screw shaft. The corrector includes a correction amount map in which a position correction amount for calibrating a predictable error is mapped for each position of the movable part. The corrector estimates an ideal movement position to which the movable part moves based on a command signal and refers to the correction amount map to calculate the position correction amount corresponding to a present position detected by the position sensor. The corrector generates a correction signal by correcting the command signal so as to reduce the difference between a corrected present position obtained by correcting the present position by the position correction amount and the ideal movement position.Type: GrantFiled: December 2, 2021Date of Patent: September 26, 2023Assignee: NSK LTD.Inventors: Satoshi Inagaki, Sumio Sugita
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Patent number: 11654426Abstract: The method for manufacturing a modified aluminosilicate includes a first step of treating an aluminosilicate with an acid, a second step of primarily calcining the treated material obtained in the first step at 550° C. to 850° C., and a third step of contacting the calcined material obtained in the second step with a liquid containing one or more Group 4 elements and/or Group 5 elements, and then drying and secondarily calcining the resultant. The modified aluminosilicate includes one or more Group 4 elements and/or Group 5 elements, and exhibits an absorbance at 300 nm in an ultraviolet visible spectrum of 1.0 or higher. The method for manufacturing aromatic dihydroxy compounds includes reacting a phenol with hydrogen peroxide in the presence of a specific modified aluminosilicate.Type: GrantFiled: May 20, 2019Date of Patent: May 23, 2023Assignee: MITSUI CHEMICALS, INC.Inventors: Yoshiya Matsukawa, Nobuhiko Horiuchi, Akihiro Okabe, Yoshihiro Kubota, Satoshi Inagaki
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Publication number: 20230122717Abstract: A robot mechanism is provided with a parallel link including a first output base, a first parallel link mechanism disposed on a first side of the first output base, and a second parallel link mechanism and an end effector disposed on a second side of the first output base. The first parallel link mechanism includes a first driver that generates a linear motion output and a second driver that generates a linear motion output. A tilting link mechanism including a mass body that generates a second moment load in a direction to reduce a first moment load exerted on the first parallel link mechanism by the weight of the second parallel link mechanism and the end effector is connected to the first driver and the second driver.Type: ApplicationFiled: December 2, 2021Publication date: April 20, 2023Applicant: NSK LTD.Inventors: Kohei SHIRAHAMA, Sumio SUGITA, Satoshi INAGAKI
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Publication number: 20230122978Abstract: A driving device includes a corrector, an actuator, and a position sensor. The actuator includes a nut connected to a movable part, a ball screw shaft onto which the nut is screwed, and a pulse motor that drives to rotate the ball screw shaft. The corrector includes a correction amount map in which a position correction amount for calibrating a predictable error is mapped for each position of the movable part. The corrector estimates an ideal movement position to which the movable part moves based on a command signal and refers to the correction amount map to calculate the position correction amount corresponding to a present position detected by the position sensor. The corrector generates a correction signal by correcting the command signal so as to reduce the difference between a corrected present position obtained by correcting the present position by the position correction amount and the ideal movement position.Type: ApplicationFiled: December 2, 2021Publication date: April 20, 2023Applicant: NSK LTD.Inventors: Satoshi INAGAKI, Sumio SUGITA
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Patent number: 11485644Abstract: Provided are the following: an MWW type zeolite which has many Brønsted acid sites when in the form of a proton type and which is highly suitable as a cracking catalyst for cumene; a method for producing same; and an application of same. The present invention provides an MWW type zeolite in which the ratio (B/A) of the peak intensity (B) attributable to tetracoordinate aluminum relative to the peak intensity (A) attributable to hexacoordinate aluminum is 2 or more in 27Al MAS NMR, when measured as an ammonium type. The present invention also provides a method for producing an MWW type zeolite, the method having a step for carrying out a hydrothermal synthesis reaction in the presence of: a seed crystal of an MWW type zeolite containing no organic structure-directing agent; and a reaction mixture containing a silica source, an alumina source, an alkali source, an organic structure-directing agent, and water. The reaction mixture satisfies the following molar ratio: X/SiO2<0.Type: GrantFiled: November 28, 2018Date of Patent: November 1, 2022Assignees: Mitsui Mining & Smelting Co., Ltd., NATIONAL UNIVERSITY CORPORATION TOTTORI UNIVERSITY, NATIONAL UNIVERSITY CORPORATION YOKOHAMA NATIONAL UNIVERSITYInventors: Yoshihiro Kamimura, Akira Endou, Yasuo Yamazaki, Naonobu Katada, Satoshi Suganuma, Yoshihiro Kubota, Satoshi Inagaki
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Patent number: 11447396Abstract: Provided are the following: an MWW type zeolite which has many Brønsted acid sites when in the form of a proton type and which is highly suitable as a cracking catalyst for cumene; a method for producing same; and an application of same. The present invention provides an MWW type zeolite in which the ratio (B/A) of the peak intensity (B) attributable to tetracoordinate aluminum relative to the peak intensity (A) attributable to hexacoordinate aluminum is 2 or more in 27Al MAS NMR, when measured as an ammonium type. The present invention also provides a method for producing an MWW type zeolite, the method having a step for carrying out a hydrothermal synthesis reaction in the presence of: a seed crystal of an MWW type zeolite containing no organic structure-directing agent; and a reaction mixture containing a silica source, an alumina source, an alkali source, an organic structure-directing agent, and water. The reaction mixture satisfies the following molar ratio: X/SiO2<0.Type: GrantFiled: November 28, 2018Date of Patent: September 20, 2022Assignees: Mitsui Mining & Smelting Co., Ltd., NATIONAL UNIVERSITY CORPORATION TOTTORI UNIVERSITY, NATIONAL UNIVERSITY CORPORATION YOKOHAMA NATIONAL UNIVERSITYInventors: Yoshihiro Kamimura, Akira Endou, Yasuo Yamazaki, Naonobu Katada, Satoshi Suganuma, Yoshihiro Kubota, Satoshi Inagaki
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Patent number: 11378936Abstract: A control device controls a mechanical device having a movable member driven by a motor. The control device includes a radio signal exchange unit that receives a sensor signal indicating a position, a velocity or an acceleration of a tip part of the movable member, a data acquisition unit that acquires first time-series data of acceleration based on the received sensor signal, a data calculation unit that calculates second time-series data of acceleration at the tip part based on a drive command to the motor, a delay time calculation unit that calculates, when the mechanical device performs a predetermined basic operation, a delay time of the first time-series data to the second time-series data, based on a degree of correlation between the first and second time-series data, and a time synchronization unit that synchronizes time of the sensor part and control device based on the delay time.Type: GrantFiled: April 15, 2020Date of Patent: July 5, 2022Assignee: FANUC CORPORATIONInventors: Satoshi Inagaki, Hajime Suzuki
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Publication number: 20220136094Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.Type: ApplicationFiled: January 12, 2022Publication date: May 5, 2022Applicant: United Semiconductor Japan Co., Ltd.Inventor: Satoshi Inagaki
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Publication number: 20220081755Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.Type: ApplicationFiled: September 17, 2020Publication date: March 17, 2022Inventor: Satoshi Inagaki
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Patent number: 11255011Abstract: A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.Type: GrantFiled: September 17, 2020Date of Patent: February 22, 2022Assignee: United Semiconductor Japan Co., Ltd.Inventor: Satoshi Inagaki
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Patent number: 11230003Abstract: A robot system includes: a learning control unit configured to perform learning for calculating a learning correction amount for bringing a position of a control target portion toward a target position; a robot control unit configured to control the operation of the robot mechanism unit; a power spectrum calculating unit configured to calculate a power spectrum of a vibration data of the control target portion; a comparison unit configured to compare each power spectrum between at the time of the current learning and at the time of the immediately preceding learning; and a learning correction amount updating unit configured to adjust at least one of a phase and a gain of the learning correction amount used at the time of the current learning to set the adjusted learning correction amount as a new learning correction amount used at the time of next learning.Type: GrantFiled: June 19, 2019Date of Patent: January 25, 2022Assignee: FANUC CORPORATIONInventors: Satoshi Inagaki, Hajime Suzuki