Patents by Inventor Satoshi Kamata

Satoshi Kamata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11559835
    Abstract: A processing device processes a frame-shaped workpiece which extends in a prescribed extension direction, and includes, integrally, a plate-shaped web surface portion, a plate-shaped first flange portion that bends and extends from one end of the web surface portion, and a plate-shaped second flange portion which bends from the other end of the web surface portion and extends in the opposite direction to the first flange portion. The processing device includes a shaping device which conveys the workpiece in the extension direction, and an exit side pinch roll device provided further downstream, in the workpiece conveying flow direction, than the shaping device. The exit side pinch roll device includes a first roll which presses a central region of an upper surface side of the web surface portion, and a second roll which presses a central region of a lower surface side of the web surface portion.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: January 24, 2023
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Atsushi Sugai, Satoshi Kamata, Suguru Kondo, Takeshi Yamada, Akira Kono
  • Publication number: 20230002318
    Abstract: A compound of formula (I), or a salt thereof that may have an antagonistic action against an NMDA receptor that includes an NR2B subunit and may be useful as a prophylactic or therapeutic agent for depression, bipolar disorder, migraine, pain, a symptom peripheral to dementia, or the like.
    Type: Application
    Filed: November 12, 2020
    Publication date: January 5, 2023
    Inventors: Shuhei IKEDA, Makoto KAMATA, Yuya OGURO, Jumpei AIDA, Taisuke TAWARAISHI, Takeshi WAKABAYASHI, Norio OYABU, Atsuko OCHIDA, Kouichi IWANAGA, Satoshi YAMAMOTO, Masataka MURAKAMI, Minoru NAKAMURA, Fumie YAMAGUCHI, Takafumi YUKAWA
  • Patent number: 11535755
    Abstract: There is provided a technique for producing a quinacridone solid solution pigment, the technique making it possible to obtain a quinacridone solid solution pigment which produces a colored product having high chroma and a bluish hue, more preferably which has controlled particle diameters.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: December 27, 2022
    Assignee: Dainichiseika Color & Chemicals Mfg. Co.. Ltd.
    Inventors: Naoto Kamata, Toshiyuki Hitotsuyanagi, Sachio Yoshikawa, Satoshi Minami
  • Publication number: 20220275214
    Abstract: There is provided a technique for producing a quinacridone solid solution pigment, the technique making it possible to obtain a quinacridone solid solution pigment which produces a colored product having high chroma and a bluish hue, more preferably which has controlled particle diameters.
    Type: Application
    Filed: May 16, 2022
    Publication date: September 1, 2022
    Inventors: Naoto KAMATA, Toshiyuki HITOTSUYANAGI, Sachio YOSHIKAWA, Satoshi MINAMI
  • Publication number: 20220193929
    Abstract: A holding device capable of reliably holding a workpiece with a simple operation. The holding device is for holding a workpiece and includes a base part; a guide member mounted on the base part and extending in a first direction; and a first holding mechanism movable in the first direction by an external force being applied thereto, the first holding mechanism being capable of holding the workpiece. Further, there is a second holding mechanism including a first member and a second member which face each other across the first holding mechanism in the first direction and each of which is movable relative to the base part by being driven by an actuator. The second holding mechanism is capable of sandwiching and holding the workpiece between the first member and the second member by changing a distance between the first member and the second member in the first direction.
    Type: Application
    Filed: April 6, 2020
    Publication date: June 23, 2022
    Applicant: Kawasaki Jukogyo Kabushiki Kaisha
    Inventors: Kentaro AZUMA, Takayuki ISHIZAKI, Masataka YOSHIDA, Mitsunobu OKA, Satoshi KAMATA
  • Publication number: 20210291254
    Abstract: A processing device processes a frame-shaped workpiece which extends in a prescribed extension direction, and includes, integrally, a plate-shaped web surface portion, a plate-shaped first flange portion that bends and extends from one end of the web surface portion, and a plate-shaped second flange portion which bends from the other end of the web surface portion and extends in the opposite direction to the first flange portion. The processing device includes a shaping device which conveys the workpiece in the extension direction, and an exit side pinch roll device provided further downstream, in the workpiece conveying flow direction, than the shaping device. The exit side pinch roll device includes a first roll which presses a central region of an upper surface side of the web surface portion, and a second roll which presses a central region of a lower surface side of the web surface portion.
    Type: Application
    Filed: September 26, 2019
    Publication date: September 23, 2021
    Inventors: Atsushi SUGAI, Satoshi KAMATA, Suguru KONDO, Takeshi YAMADA, Akira KONO
  • Publication number: 20200353522
    Abstract: A workpiece processing method includes: a section roll forming step of subjecting a flat plate shaped workpiece to forming to impart a prescribed cross-sectional shape thereto; a solution heat treatment step of subjecting the workpiece, after the section roll forming step has been performed, to solution heat treatment; a contour roll forming step of subjecting the workpiece, after the solution heat treatment step has been performed, to forming to bend the workpiece into an arcuate shape; and a stretch forming step of subjecting the workpiece, after the contour roll forming step has been performed, to forming to impart a curved shape, following a curved surface of a die, to the workpiece by bringing the workpiece into contact with the curved surface and inputting a tension load to the workpiece.
    Type: Application
    Filed: March 26, 2019
    Publication date: November 12, 2020
    Inventors: Takeshi YAMADA, Akira KONO, Atsushi SUGAI, Yu MATSUNAGA, Takeshi HOSHINO, Shota HOSOI, Suguru KONDO, Satoshi KAMATA
  • Publication number: 20200108431
    Abstract: A stretch forming device includes a die and gripping portions gripping both end portions of an elongate material. The cross-sectional shape of the die has a curved shape bulging a central side of a forming surface; the length in a longitudinal direction of the elongate material is less than that of the forming surface; a second die having a second forming surface along the forming surface is installed removably on a central portion of the forming surface; and the stretch forming device has a first mode wherein, when the second die is installed on the forming surface, only the second die is pressed against the elongate material while a tensile force is applied to the elongate material, and a second mode wherein, when the second die is removed from the forming surface, the die is pressed against the elongate material while a tensile force is applied to the elongate material.
    Type: Application
    Filed: September 28, 2017
    Publication date: April 9, 2020
    Inventors: Takeshi YAMADA, Akira KONO, Atsushi SUGAI, Yu MATSUNAGA, Suguru KONDO, Satoshi KAMATA
  • Patent number: 9524974
    Abstract: A dielectric layer extending over a substrate has alternating first and second trenches extending in a first direction. The first trenches have a first shape in cross section along a plane that is perpendicular to the first direction and the second trenches have a second shape in cross section along the plane. Bit lines are located in at least the first trenches.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: December 20, 2016
    Assignee: SanDisk Technologies LLC
    Inventors: Erika Kanezaki, Ryo Nakamura, Kotaro Jinnouchi, Satoshi Kamata
  • Patent number: 9401305
    Abstract: A pattern of parallel lines defines first regions where no conductive material is to be located, a distance between adjacent lines in the first regions being smaller than a predetermined distance, and defines second regions where conductive material is to be located, a distance between adjacent lines in the second regions being larger than the predetermined distance. A subsequent layer caps air gaps between lines in the first regions. Conductive material is then deposited and planarized to form lines of conductive material in the second regions.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: July 26, 2016
    Assignee: SanDisk Technologies LLC
    Inventors: Yuji Takahashi, Takuya Futase, Yoko Furihata, Satoshi Kamata
  • Publication number: 20160126130
    Abstract: A pattern of parallel lines defines first regions where no conductive material is to be located, a distance between adjacent lines in the first regions being smaller than a predetermined distance, and defines second regions where conductive material is to be located, a distance between adjacent lines in the second regions being larger than the predetermined distance. A subsequent layer caps air gaps between lines in the first regions. Conductive material is then deposited and planarized to form lines of conductive material in the second regions.
    Type: Application
    Filed: November 5, 2014
    Publication date: May 5, 2016
    Inventors: Yuji Takahashi, Takuya Futase, Yoko Furihata, Satoshi Kamata
  • Patent number: 5646222
    Abstract: A polyfluorohydrocarbon group-containing acrylate of the formula (1):R.sub.f --(CH.sub.2).sub.n --Q--(CH.sub.2).sub.h --.phi.--[X--.phi.--].sub.y --(CH.sub.2).sub.m OC(O)CR.dbd.CH.sub.2(1)wherein R.sub.f is a polyfluorohydrocarbon group having from 2 to 22 carbon atoms to which fluorine atoms are bonded, wherein some of such carbon atoms may be substituted by ether-type oxygen atoms,.phi. is a p-phenylene group which may be substituted by one or more halogen atoms selected from fluorine and chlorine, provided that when a plurality of .phi. are present in one molecule, such a plurality of .phi. may be the same or different from one another,R is a hydrogen atom, a methyl group, a fluorine atom, a chlorine atom or a bromine atom,Q is an oxygen atom or a sulfur atom,X is a single bond, --CH.dbd.CH--, --N.dbd.CH--, --CH.dbd.N-- or --C(O)--,n is an integer of from 1 to 22,h is an integer of from 0 to 22,m is an integer of from 1 to 11, andy is an integer of from 0 to 5.
    Type: Grant
    Filed: July 16, 1996
    Date of Patent: July 8, 1997
    Assignee: Asahi Glass Company Ltd.
    Inventors: Takashige Maekawa, Ryoko Osawa, Satoshi Kamata, Seisaku Kumai
  • Patent number: 5578688
    Abstract: A polymer comprising polymeric units derived from an acrylate or methacrylate containing a polyfluoroalkyl group, polymeric units derived from an acrylate or methacrylate containing a blocked isocyanate group, and polymeric units derived from an acrylate or methacrylate containing a polyoxyalkylene chain.
    Type: Grant
    Filed: July 3, 1995
    Date of Patent: November 26, 1996
    Assignee: Asahi Glass Company Ltd.
    Inventors: Katsuji Ito, Satoshi Kamata, Toshiro Goto
  • Patent number: 5565607
    Abstract: A polyfluorohydrocarbon group-containing acrylate of the formula (1):R.sub.f --(CH.sub.2).sub.n --Q--(CH.sub.2).sub.h --.phi.--[X--.phi.--].sub.y --(CH.sub.2).sub.m OC(O)CR.dbd.CH.sub.2 (1)wherein R.sub.f is a polyfluorohydrocarbon group having from 2 to 22 carbon atoms to which fluorine atoms are bonded, wherein some of such carbon atoms may be substituted by ether-type oxygen atoms,.phi. is a p-phenylene group which may be substituted by one or more halogen atoms selected from fluorine and chlorine, provided that when a plurality of .phi. are present in one molecule, such a plurality of .phi. may be the same or different from one another,R is a hydrogen atom, a methyl group, a fluorine atom, a chlorine atom or a bromine atom,Q is an oxygen atom or a sulfur atom,x is a single bond, --CH.dbd.CH--, --N.dbd.CH--, --CH.dbd.N-- or --C(O)--,n is an integer of from 1 to 22,h is an integer of from 0 to 22,m is an integer of from 1 to 11, andy is an integer of from 0 to 5.
    Type: Grant
    Filed: February 24, 1995
    Date of Patent: October 15, 1996
    Assignee: Asahi Glass Company Ltd.
    Inventors: Takashige Maekawa, Ryoko Osawa, Satoshi Kamata, Seisaku Kumai
  • Patent number: 5548022
    Abstract: An aqueous dispersion type stain-proofing agent comprising an aqueous medium and fine particles containing a reaction product (A) and an addition polymer (B), wherein the reaction product (A) is a reaction product of a compound (a.sup.1) having a polyfluoroalkyl group and a group containing active hydrogen reactive with an isocyanate group, with a polyfunctional isocyanate compound (a.sup.2).
    Type: Grant
    Filed: May 15, 1995
    Date of Patent: August 20, 1996
    Assignee: Asahi Glass Company Ltd.
    Inventors: Katsuji Ito, Satoshi Kamata
  • Patent number: 5519078
    Abstract: A fluorine-containing benzophenone derivative of the formula (1), (2) or (3):.PHI..sup.1 (--X.sup.1 --Q.sup.1 --R.sub.f.sup.1).sub.n (1).PHI..sup.2 --X.sup.2 --Q.sup.2 --R.sub.f.sup.2 --Q.sup.3 --X.sup.3 --.PHI..sup.3 (2).PHI..sup.4 --X.sup.4 --Q.sub.f --X.sup.5 --.PHI..sup.5 (3)wherein .PHI..sup.1 is a 2-hydroxybenzophenone structure of the formula ka-1: ##STR1## (wherein Y is a hydrogen atom or a hydroxyl group, each of k and m indicates the number of bond sites, k is an integer of from 0 to 3, and m is an integer of from 0 to 3, provided that 1.ltoreq.(k+m).ltoreq.4), n corresponds to (k+m) and is an integer of from 1 to 4, each of .PHI..sup.2, .PHI..sup.3, .PHI..sup.4 and .PHI..sup.5 is a 2-hydroxybenzophenone structure of the formula ka-1 wherein (k+m) is 1, each of X.sup.1, X.sup.2, X.sup.3, X.sup.4 and X.sup.5 is a single bond or an oxygen atom, Q.sup.1 is a single bond or a bivalent linking group having a carbon atom directly bonded to X.sup.1, each of Q.sup.2 and Q.sup.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: May 21, 1996
    Assignee: Asahi Glass Company Ltd.
    Inventors: Ryoko Osawa, Takashige Maekawa, Tatsuo Momii, Satoshi Kamata
  • Patent number: 5468904
    Abstract: A fluorine-containing benzophenone derivative of the formula (1), (2) or (3):.PHI..sup.1 (--X.sup.1 --Q.sup.1 --R.sub.f.sup.1).sub.n (1).PHI..sup.2 --X.sup.2 --Q.sup.2 --R.sub.f.sup.2 --Q.sup.3 --X.sup.3 --.PHI..sup.3 (2).PHI..sup.4 --X.sup.4 --Q.sub.f --X.sup.5 --.PHI..sup.5 (3)wherein .PHI..sup.1 is a 2-hydroxybenzophenone structure of the formula ka-1: ##STR1## (wherein Y is a hydrogen atom or a hydroxyl group, each of k and m indicates the number of bond sites, k is an integer of from 0 to 3, and m is an integer of from 0 to 3, provided that 1.ltoreq.(k+m).ltoreq.4), n corresponds to (k+m) and is an integer of from 1 to 4, each of .PHI..sup.2, .PHI..sup.3, .PHI..sup.4 and .PHI..sup.5 is a 2-hydroxybenzophenone structure of the formula ka-1 wherein (k+m) is 1, each of X.sup.1, X.sup.2, X.sup.3, X.sup.4 and X.sup.5 is a single bond or an oxygen atom, Q.sup.1 is a single bond or a bivalent linking group having a carbon atom directly bonded to X.sup.1, each of Q.sup.2 and Q.sup.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: November 21, 1995
    Assignee: Asahi Glass Company Ltd.
    Inventors: Ryoko Osawa, Takashige Maekawa, Tatsuo Momii, Satoshi Kamata
  • Patent number: 4092370
    Abstract: Processes for producing tetrachloromethane and tetrachlorethylene are disclosed. Tetrachloromethane is produced by contacting a chlorinated feed material having two to four carbon atoms, and optionally including oxygen, hydrogen chloride or chlorine, with a molten salt catalyst of copper chloride together with an alkali metal or alkaline earth metal chloride at a temperature between 450.degree. and 750.degree. C. Tetrachloroethylene is produced by contacting tetrachloromethane, optionally together with chlorinatable material, oxygen and hydrogen chloride, with a similar catalyst at a temperature of 430.degree. to 650.degree. C.
    Type: Grant
    Filed: September 30, 1975
    Date of Patent: May 30, 1978
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Eiichi Ichiki, Dazuo Kida, Satoshi Kamata, Yoshinori Kobayashi