Abstract: A holding device capable of reliably holding a workpiece with a simple operation. The holding device is for holding a workpiece and includes a base part; a guide member mounted on the base part and extending in a first direction; and a first holding mechanism movable in the first direction by an external force being applied thereto, the first holding mechanism being capable of holding the workpiece. Further, there is a second holding mechanism including a first member and a second member which face each other across the first holding mechanism in the first direction and each of which is movable relative to the base part by being driven by an actuator. The second holding mechanism is capable of sandwiching and holding the workpiece between the first member and the second member by changing a distance between the first member and the second member in the first direction.

Abstract: A processing device processes a frame-shaped workpiece which extends in a prescribed extension direction, and includes, integrally, a plate-shaped web surface portion, a plate-shaped first flange portion that bends and extends from one end of the web surface portion, and a plate-shaped second flange portion which bends from the other end of the web surface portion and extends in the opposite direction to the first flange portion. The processing device includes a shaping device which conveys the workpiece in the extension direction, and an exit side pinch roll device provided further downstream, in the workpiece conveying flow direction, than the shaping device. The exit side pinch roll device includes a first roll which presses a central region of an upper surface side of the web surface portion, and a second roll which presses a central region of a lower surface side of the web surface portion.

Abstract: A holding device capable of reliably holding a workpiece with a simple operation. The holding device is for holding a workpiece and includes a base part; a guide member mounted on the base part and extending in a first direction; and a first holding mechanism movable in the first direction by an external force being applied thereto, the first holding mechanism being capable of holding the workpiece. Further, there is a second holding mechanism including a first member and a second member which face each other across the first holding mechanism in the first direction and each of which is movable relative to the base part by being driven by an actuator. The second holding mechanism is capable of sandwiching and holding the workpiece between the first member and the second member by changing a distance between the first member and the second member in the first direction.

Abstract: A processing device processes a frame-shaped workpiece which extends in a prescribed extension direction, and includes, integrally, a plate-shaped web surface portion, a plate-shaped first flange portion that bends and extends from one end of the web surface portion, and a plate-shaped second flange portion which bends from the other end of the web surface portion and extends in the opposite direction to the first flange portion. The processing device includes a shaping device which conveys the workpiece in the extension direction, and an exit side pinch roll device provided further downstream, in the workpiece conveying flow direction, than the shaping device. The exit side pinch roll device includes a first roll which presses a central region of an upper surface side of the web surface portion, and a second roll which presses a central region of a lower surface side of the web surface portion.

Abstract: A workpiece processing method includes: a section roll forming step of subjecting a flat plate shaped workpiece to forming to impart a prescribed cross-sectional shape thereto; a solution heat treatment step of subjecting the workpiece, after the section roll forming step has been performed, to solution heat treatment; a contour roll forming step of subjecting the workpiece, after the solution heat treatment step has been performed, to forming to bend the workpiece into an arcuate shape; and a stretch forming step of subjecting the workpiece, after the contour roll forming step has been performed, to forming to impart a curved shape, following a curved surface of a die, to the workpiece by bringing the workpiece into contact with the curved surface and inputting a tension load to the workpiece.

Abstract: A stretch forming device includes a die and gripping portions gripping both end portions of an elongate material. The cross-sectional shape of the die has a curved shape bulging a central side of a forming surface; the length in a longitudinal direction of the elongate material is less than that of the forming surface; a second die having a second forming surface along the forming surface is installed removably on a central portion of the forming surface; and the stretch forming device has a first mode wherein, when the second die is installed on the forming surface, only the second die is pressed against the elongate material while a tensile force is applied to the elongate material, and a second mode wherein, when the second die is removed from the forming surface, the die is pressed against the elongate material while a tensile force is applied to the elongate material.

Abstract: A dielectric layer extending over a substrate has alternating first and second trenches extending in a first direction. The first trenches have a first shape in cross section along a plane that is perpendicular to the first direction and the second trenches have a second shape in cross section along the plane. Bit lines are located in at least the first trenches.

Abstract: A pattern of parallel lines defines first regions where no conductive material is to be located, a distance between adjacent lines in the first regions being smaller than a predetermined distance, and defines second regions where conductive material is to be located, a distance between adjacent lines in the second regions being larger than the predetermined distance. A subsequent layer caps air gaps between lines in the first regions. Conductive material is then deposited and planarized to form lines of conductive material in the second regions.

Abstract: A pattern of parallel lines defines first regions where no conductive material is to be located, a distance between adjacent lines in the first regions being smaller than a predetermined distance, and defines second regions where conductive material is to be located, a distance between adjacent lines in the second regions being larger than the predetermined distance. A subsequent layer caps air gaps between lines in the first regions. Conductive material is then deposited and planarized to form lines of conductive material in the second regions.

Abstract: A polyfluorohydrocarbon group-containing acrylate of the formula (1):R.sub.f --(CH.sub.2).sub.n --Q--(CH.sub.2).sub.h --.phi.--[X--.phi.--].sub.y --(CH.sub.2).sub.m OC(O)CR.dbd.CH.sub.2(1)wherein R.sub.f is a polyfluorohydrocarbon group having from 2 to 22 carbon atoms to which fluorine atoms are bonded, wherein some of such carbon atoms may be substituted by ether-type oxygen atoms,.phi. is a p-phenylene group which may be substituted by one or more halogen atoms selected from fluorine and chlorine, provided that when a plurality of .phi. are present in one molecule, such a plurality of .phi. may be the same or different from one another,R is a hydrogen atom, a methyl group, a fluorine atom, a chlorine atom or a bromine atom,Q is an oxygen atom or a sulfur atom,X is a single bond, --CH.dbd.CH--, --N.dbd.CH--, --CH.dbd.N-- or --C(O)--,n is an integer of from 1 to 22,h is an integer of from 0 to 22,m is an integer of from 1 to 11, andy is an integer of from 0 to 5.

Abstract: A polymer comprising polymeric units derived from an acrylate or methacrylate containing a polyfluoroalkyl group, polymeric units derived from an acrylate or methacrylate containing a blocked isocyanate group, and polymeric units derived from an acrylate or methacrylate containing a polyoxyalkylene chain.

Abstract: A polyfluorohydrocarbon group-containing acrylate of the formula (1):R.sub.f --(CH.sub.2).sub.n --Q--(CH.sub.2).sub.h --.phi.--[X--.phi.--].sub.y --(CH.sub.2).sub.m OC(O)CR.dbd.CH.sub.2 (1)wherein R.sub.f is a polyfluorohydrocarbon group having from 2 to 22 carbon atoms to which fluorine atoms are bonded, wherein some of such carbon atoms may be substituted by ether-type oxygen atoms,.phi. is a p-phenylene group which may be substituted by one or more halogen atoms selected from fluorine and chlorine, provided that when a plurality of .phi. are present in one molecule, such a plurality of .phi. may be the same or different from one another,R is a hydrogen atom, a methyl group, a fluorine atom, a chlorine atom or a bromine atom,Q is an oxygen atom or a sulfur atom,x is a single bond, --CH.dbd.CH--, --N.dbd.CH--, --CH.dbd.N-- or --C(O)--,n is an integer of from 1 to 22,h is an integer of from 0 to 22,m is an integer of from 1 to 11, andy is an integer of from 0 to 5.

Abstract: An aqueous dispersion type stain-proofing agent comprising an aqueous medium and fine particles containing a reaction product (A) and an addition polymer (B), wherein the reaction product (A) is a reaction product of a compound (a.sup.1) having a polyfluoroalkyl group and a group containing active hydrogen reactive with an isocyanate group, with a polyfunctional isocyanate compound (a.sup.2).

Abstract: A fluorine-containing benzophenone derivative of the formula (1), (2) or (3):.PHI..sup.1 (--X.sup.1 --Q.sup.1 --R.sub.f.sup.1).sub.n (1).PHI..sup.2 --X.sup.2 --Q.sup.2 --R.sub.f.sup.2 --Q.sup.3 --X.sup.3 --.PHI..sup.3 (2).PHI..sup.4 --X.sup.4 --Q.sub.f --X.sup.5 --.PHI..sup.5 (3)wherein .PHI..sup.1 is a 2-hydroxybenzophenone structure of the formula ka-1: ##STR1## (wherein Y is a hydrogen atom or a hydroxyl group, each of k and m indicates the number of bond sites, k is an integer of from 0 to 3, and m is an integer of from 0 to 3, provided that 1.ltoreq.(k+m).ltoreq.4), n corresponds to (k+m) and is an integer of from 1 to 4, each of .PHI..sup.2, .PHI..sup.3, .PHI..sup.4 and .PHI..sup.5 is a 2-hydroxybenzophenone structure of the formula ka-1 wherein (k+m) is 1, each of X.sup.1, X.sup.2, X.sup.3, X.sup.4 and X.sup.5 is a single bond or an oxygen atom, Q.sup.1 is a single bond or a bivalent linking group having a carbon atom directly bonded to X.sup.1, each of Q.sup.2 and Q.sup.

Abstract: A fluorine-containing benzophenone derivative of the formula (1), (2) or (3):.PHI..sup.1 (--X.sup.1 --Q.sup.1 --R.sub.f.sup.1).sub.n (1).PHI..sup.2 --X.sup.2 --Q.sup.2 --R.sub.f.sup.2 --Q.sup.3 --X.sup.3 --.PHI..sup.3 (2).PHI..sup.4 --X.sup.4 --Q.sub.f --X.sup.5 --.PHI..sup.5 (3)wherein .PHI..sup.1 is a 2-hydroxybenzophenone structure of the formula ka-1: ##STR1## (wherein Y is a hydrogen atom or a hydroxyl group, each of k and m indicates the number of bond sites, k is an integer of from 0 to 3, and m is an integer of from 0 to 3, provided that 1.ltoreq.(k+m).ltoreq.4), n corresponds to (k+m) and is an integer of from 1 to 4, each of .PHI..sup.2, .PHI..sup.3, .PHI..sup.4 and .PHI..sup.5 is a 2-hydroxybenzophenone structure of the formula ka-1 wherein (k+m) is 1, each of X.sup.1, X.sup.2, X.sup.3, X.sup.4 and X.sup.5 is a single bond or an oxygen atom, Q.sup.1 is a single bond or a bivalent linking group having a carbon atom directly bonded to X.sup.1, each of Q.sup.2 and Q.sup.

Abstract: Processes for producing tetrachloromethane and tetrachlorethylene are disclosed. Tetrachloromethane is produced by contacting a chlorinated feed material having two to four carbon atoms, and optionally including oxygen, hydrogen chloride or chlorine, with a molten salt catalyst of copper chloride together with an alkali metal or alkaline earth metal chloride at a temperature between 450.degree. and 750.degree. C. Tetrachloroethylene is produced by contacting tetrachloromethane, optionally together with chlorinatable material, oxygen and hydrogen chloride, with a similar catalyst at a temperature of 430.degree. to 650.degree. C.