Patents by Inventor Satoshi Kawamoto

Satoshi Kawamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11952208
    Abstract: A wet particle storage tank includes a tank body capable of storing wet particles containing particles and solvent. The tank body has an upper storage section having a supply port through which the wet particles are supplied, a lower storage section located below the upper storage section and having a discharge port through which the wet particles are discharged, and a bridge forming section provided between the upper storage section and the lower storage section. The bridge forming section facilitates formation of a bridge by the wet particles to block falling of the wet particles from the upper storage section to the lower storage section.
    Type: Grant
    Filed: September 1, 2022
    Date of Patent: April 9, 2024
    Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Shugo Daikuhara, Takenori Ikeda, Satoshi Moriyama, Yuta Kawamoto, Keigo Oyaizu, Suguru Nomimura
  • Patent number: 11508570
    Abstract: A SiC film structure for obtaining a three-dimensional SiC film by forming the SiC film in an outer circumference of a substrate using a vapor deposition type film formation method and removing the substrate, the SiC film structure including: a main body having a three-dimensional shape formed of a SiC film and having an opening for removing the substrate; a lid configured to cover the opening; and a SiC coat layer configured to cover at least a contact portion between the main body and an outer edge portion of the lid and join the main body and the lid.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: November 22, 2022
    Assignee: ADMAP INC.
    Inventor: Satoshi Kawamoto
  • Patent number: 11049747
    Abstract: A SiC Freestanding Film Structure capable of preventing a functional surface of a SiC Freestanding Film Structure from being affected by a film thickness and improving strength by increasing the film thickness, the SiC Freestanding Film Structure is formed by depositing a SiC layer through a vapor deposition type film formation method. The SiC layer is deposited with respect to a first SiC layer serving as a functional surface in the SiC Freestanding Film Structure. Focusing on the functional surface and a non-functional surface positioned on front and back sides of any particular portion, the functional surface has smoothness higher than that of the non-functional surface.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: June 29, 2021
    Assignee: ADMAP INC.
    Inventor: Satoshi Kawamoto
  • Patent number: 10942512
    Abstract: A vehicle operating device includes a portable display unit configured to display a state of a vehicle, a portable input unit configured to receive operation information of the vehicle input thereto on the basis of a displayed content by the display unit, a first information processing unit configured to process first information among input operation information, a second information processing unit configured to process second information, which is different from the first information, among the input operation information, an interlock system configured to enable only the first information to be processed in an operating state and enable the first information and the second information to be processed in a released state, and a portable wireless output unit configured to output an operation signal of the vehicle based only on the first information processed in the operating state.
    Type: Grant
    Filed: September 8, 2015
    Date of Patent: March 9, 2021
    Assignee: MITSUBISHI HEAVY INDUSTRIES ENGINEERING, LTD.
    Inventors: Keisuke Kimura, Kenta Masumori, Fujio Shinoki, Satoshi Kawamoto
  • Publication number: 20210005469
    Abstract: A SiC Freestanding Film Structure capable of preventing a functional surface of a SiC Freestanding Film Structure from being affected by a film thickness and improving strength by increasing the film thickness, the SiC Freestanding Film Structure is formed by depositing a SiC layer through a vapor deposition type film formation method. The SiC layer is deposited with respect to a first SiC layer serving as a functional surface in the SiC Freestanding Film Structure. Focusing on the functional surface and a non-functional surface positioned on front and back sides of any particular portion, the functional surface has smoothness higher than that of the non-functional surface.
    Type: Application
    Filed: August 28, 2019
    Publication date: January 7, 2021
    Applicant: ADMAP INC.
    Inventor: Satoshi KAWAMOTO
  • Publication number: 20210005491
    Abstract: A SiC film structure for obtaining a three-dimensional SiC film by forming the SiC film in an outer circumference of a substrate using a vapor deposition type film formation method and removing the substrate, the SiC film structure including: a main body having a three-dimensional shape formed of a SiC film and having an opening for removing the substrate; a lid configured to cover the opening; and a SiC coat layer configured to cover at least a contact portion between the main body and an outer edge portion of the lid and join the main body and the lid.
    Type: Application
    Filed: August 28, 2019
    Publication date: January 7, 2021
    Applicant: ADMAP INC.
    Inventor: Satoshi KAWAMOTO
  • Patent number: 10804096
    Abstract: A SiC film structure capable of providing a sealing structure. A SiC film structure for obtaining a three-dimensional SiC film by forming the SiC film in an outer circumference of a substrate using a vapor deposition type film formation method and removing the substrate, the SiC film structure including: a main body having a three-dimensional shape formed of a SiC film and having an opening for removing the substrate; and a lid configured to cover the opening.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: October 13, 2020
    Assignee: ADMAP INC.
    Inventor: Satoshi Kawamoto
  • Publication number: 20200279732
    Abstract: A SiC film structure capable of providing a sealing structure. A SiC film structure for obtaining a three-dimensional SiC film by forming the SiC film in an outer circumference of a substrate using a vapor deposition type film formation method and removing the substrate, the SiC film structure including: a main body having a three-dimensional shape formed of a SiC film and having an opening for removing the substrate; and a lid configured to cover the opening.
    Type: Application
    Filed: October 25, 2019
    Publication date: September 3, 2020
    Applicant: ADMAP INC.
    Inventor: Satoshi KAWAMOTO
  • Publication number: 20170277178
    Abstract: A vehicle operating device includes a portable display unit configured to display a state of a vehicle, a portable input unit configured to receive operation information of the vehicle input thereto on the basis of a displayed content by the display unit, a first information processing unit configured to process first information among input operation information, a second information processing unit configured to process second information, which is different from the first information, among the input operation information, an interlock system configured to enable only the first information to be processed in an operating state and enable the first information and the second information to be processed in a released state, and a portable wireless output unit configured to output an operation signal of the vehicle based only on the first information processed in the operating state.
    Type: Application
    Filed: September 8, 2015
    Publication date: September 28, 2017
    Inventors: Keisuke KIMURA, Kenta MASUMORI, Fujio SHINOKI, Satoshi KAWAMOTO
  • Patent number: 8633290
    Abstract: An optical resin comprises a copolymer of 4-methyl-1-pentene and at least one monomer selected from the group consisting of 3-methyl-1-pentene, 3-methyl-1-butene and 4,4-dimethyl-1-pentene. The content of a constituent unit (a) derived from 4-methyl-1-pentene is equal to or more than 60 mol % and equal to or less than 99 mol %, and the total content of a constituent unit (b) derived from at least one monomer selected from the group consisting of 3-methyl-1-pentene, 3-methyl-1-butene and 4,4-dimethyl-1-pentene is equal to or more than 1 mol % and equal to or less than 40 mol %.
    Type: Grant
    Filed: July 13, 2009
    Date of Patent: January 21, 2014
    Assignees: Mitsui Chemicals, Inc., Sharp Corporation
    Inventors: Satoshi Kawamoto, Kouichi Kizu, Sunil Krzysztof Moorthi, Akira Sakai
  • Patent number: 8507922
    Abstract: Disclosed is a silicon carbide substrate which has less high frequency loss and excellent heat dissipating characteristics. The silicon carbide substrate (S) is provided with a first silicon carbide layer (1), which is composed of a polycrystalline silicon carbide, and a second silicon carbide layer (2), which is composed of polycrystalline silicon carbide formed on the surface of the first silicon carbide layer. The second silicon carbide layer (2) has a high-frequency loss smaller than that of the first silicon carbide layer (1), the first silicon carbide layer (1) has a thermal conductivity higher than that of the second silicon carbide layer (2), and on the surface side of the second silicon carbide layer (2), the high-frequency loss at a frequency of 20 GHz is 2 dB/mm or less, and the thermal conductivity is 200 W/mK or more.
    Type: Grant
    Filed: July 5, 2011
    Date of Patent: August 13, 2013
    Assignees: Mitsui Engineering & Shipbuilding Co., Ltd., Admap Inc.
    Inventors: Satoshi Kawamoto, Masaki Nakamura
  • Publication number: 20130157067
    Abstract: Provided is a plasma-resistant member which can be recycled and does not easily produce particles even when exposed to plasma. Specifically provided is a plasma-resistant member which has a predetermined surface profile and is used within a plasma etching chamber. The plasma-resistant member comprises: a first SiC layer (12) that is formed by a CVD method and has a corroded surface by having been exposed to plasma etching; and a second SiC layer (13) that is laminated on the corroded surface of the first SiC layer (12) by a CVD method and has a surface that is machined so as to have the predetermined surface profile.
    Type: Application
    Filed: June 30, 2011
    Publication date: June 20, 2013
    Applicants: ADMAP INC., MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
    Inventors: Satoshi Kawamoto, Masaki Nakamura, Hideyuki Takahara, Robert Wu
  • Publication number: 20130112997
    Abstract: Disclosed is a silicon carbide substrate which has less high frequency loss and excellent heat dissipating characteristics. The silicon carbide substrate (S) is provided with a first silicon carbide layer (1), which is composed of a polycrystalline silicon carbide, and a second silicon carbide layer (2), which is composed of polycrystalline silicon carbide formed on the surface of the first silicon carbide layer. The second silicon carbide layer (2) has a high-frequency loss smaller than that of the first silicon carbide layer (1), the first silicon carbide layer (1) has a thermal conductivity higher than that of the second silicon carbide layer (2), and on the surface side of the second silicon carbide layer (2), the high-frequency loss at a frequency of 20 GHz is 2 dB/mm or less, and the thermal conductivity is 200 W/mK or more.
    Type: Application
    Filed: July 5, 2011
    Publication date: May 9, 2013
    Applicants: ADMAP INC., MITSUI ENGINEERING & SHIPBUILDING CO., LTD.
    Inventors: Satoshi Kawamoto, Masaki Nakamura
  • Publication number: 20120306860
    Abstract: An image generation section of the image generation system generates a stereoscopic image so that an information display object is stereoscopically displayed at a first depth position when a parallax level has been set to a first parallax level, and is stereoscopically displayed at a second depth position when the parallax level has been set to a second parallax level. The image generation section generates the stereoscopic image so that a first edge of the information display object is stereoscopically displayed within a first area when the parallax level has been set to the second parallax level, a first boundary plane being a boundary plane specified by a line segment that connects the first edge and a third viewpoint when the parallax level has been set to the first parallax level, and the first area being an area positioned between the first boundary plane and a first clipping plane.
    Type: Application
    Filed: March 28, 2012
    Publication date: December 6, 2012
    Applicant: NAMCO BANDAI Games Inc.
    Inventors: Koji Hatta, Satoshi Kawamoto, Taichi Wada, Motonaga Ishii
  • Publication number: 20110105710
    Abstract: An optical resin comprises a copolymer of 4-methyl-1-pentene and at least one monomer selected from the group consisting of 3-methyl-1-pentene, 3-methyl-1-butene and 4,4-dimethyl-1-pentene. The content of a constituent unit (a) derived from 4-methyl-1-pentene is equal to or more than 60 mol % and equal to or less than 99 mol %, and the total content of a constituent unit (b) derived from at least one monomer selected from the group consisting of 3-methyl-1-pentene, 3-methyl-1-butene and 4,4-dimethyl-1-pentene is equal to or more than 1 mol % and equal to or less than 40 mol %.
    Type: Application
    Filed: July 13, 2009
    Publication date: May 5, 2011
    Applicants: MITSUI CHEMICALS, INC., Sharp Corporation
    Inventors: Satoshi Kawamoto, Kouichi Kizu, Sunil Krzystof Moorthi, Akira Sakai
  • Patent number: 7851068
    Abstract: In an optical compensation film, when a direction that gives the maximum in-plane refractive index is X axis, an in-plane direction perpendicular to X axis is Y axis, a film thickness direction is Z axis, refractive indexes at the wavelength of 590 nm in each axis direction are nX, nY, and nZ respectively, and the film thickness is d, an in-plane retardation value defined as R=(nX?nY)·d and a thickness direction retardation value defined as Rth=|(nX+nY)/2?nZ|·d, both of which are measured under conditions at 23 degrees centigrade and a relative humidity of 50%, satisfy the inequalities of Rth/R?5 and R?9.5 (nm).
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: December 14, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Satoshi Kawamoto, Masumi Saruwatari
  • Publication number: 20090161045
    Abstract: The present invention is to provide a method of compensating the wavelength dependence of birefringence of an optical part (B) which comprises using a film (a) made of a (co)polymer (?) obtained from at least one olefin selected among 4-methyl-1-pentene, 3-methyl-1-pentene, and 3-methyl-1-butene as a (co)monomer ingredient.
    Type: Application
    Filed: April 27, 2007
    Publication date: June 25, 2009
    Inventors: Satoshi Kawamoto, Eiichi Takahashi, Kouichi Kizu, Toru Takaoka, Michio Tsugawa, Ryouichi Seki, Shiro Shichijyo, Yoshikazu Yamada, Akira Sakai
  • Publication number: 20080145680
    Abstract: In an optical compensation film when a direction wherein a refractive index within a film surface is maximum is an X axis, a direction vertical to the X axis within the surface is a Y axis, and a film thickness direction is a Z axis, and refractive indexes at 590 nm in each axis direction are nX, nY, nZ, and a film thickness is d, a retardation value within the surface expressed as R=(nX?nY)?d, which is measured under conditions at 23° C. and a relative humidity of 50%, and a thickness direction retardation value expressed as Rth=|(nX+nY)/2?nZ|·d satisfy inequalities of Rth/R?5 and R?9.5 (nm).
    Type: Application
    Filed: September 22, 2005
    Publication date: June 19, 2008
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Satoshi Kawamoto, Masumi Saruwatari
  • Patent number: 5982546
    Abstract: A reflecting film has at least a transparent polymer film and a thin silver layer applied on the transparent polymer film to reflect light entered from a side of the transparent polymer film. The reflecting film retains a reflectance of at least 90% to visible light even after the reflector is exposed for 300 hours at a reflecting film temperature of 100.degree. C. and an exposure intensity of 500 mW/cm.sup.2 to artificial sunlight from which light of 390 nm and shorter in wavelength has been eliminated. For fabricating the reflecting film, a surface of the transparent polymer film is preferably treated with a metal-containing plasma, then the thin-silver layer is deposited on the treated surface. A reflector making use of the reflecting film is also disclosed.
    Type: Grant
    Filed: May 30, 1996
    Date of Patent: November 9, 1999
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Satoshi Kawamoto, Yumi Gotoh, Shin Fukuda, Nobuhiro Fukuda