Patents by Inventor Satoshi Morita

Satoshi Morita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11282168
    Abstract: Provided are an image processing apparatus, an image processing method, and a program that can highly efficiently execute a generation process of a color image based on an image including a plurality of pixel sets each including a plurality of single-color pixels arranged in a predetermined color pattern, in which the pixel sets are vertically and horizontally arranged side by side. An intermediate image generation unit (64) generates, based on a basic image, an intermediate image in which pixel values of a plurality of basic pixels included in the pixel set are set as values of intermediate pixel data of one intermediate pixel associated with the pixel set. A pixel value determination unit (70) determines pixel values of a plurality of colors of at least one final pixel associated with a target intermediate pixel based on values of the intermediate pixel data of the target intermediate pixel and values of the intermediate pixel data of the intermediate pixel adjacent to the target intermediate pixel.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: March 22, 2022
    Assignee: SONY INTERACTIVE ENTERTAINMENT INC.
    Inventors: Satoshi Morita, Masakazu Hayashi
  • Publication number: 20220056590
    Abstract: A substrate processing apparatus includes a rotation driving mechanism configured to rotate a rotary table configured to hold a substrate; an electric heater provided in the rotary table to be rotated along with the rotary table and configured to heat the substrate; a power receiving electrode provided in the rotary table to be rotated along with the rotary table and electrically connected to the electric heater; a power feeding electrode configured to be contacted with the power receiving electrode and configured to supply a power to the electric heater via the power receiving electrode; an electrode moving mechanism; a power feeder configured to supply the power to the power feeding electrode; a processing cup surrounding the rotary table; at least one processing liquid nozzle configured to supply a processing liquid; a processing liquid supply mechanism configured to supply at least an electroless plating liquid; and a controller.
    Type: Application
    Filed: September 26, 2019
    Publication date: February 24, 2022
    Inventors: Satoshi Morita, Masami Akimoto, Katsuhiro Morikawa, Kouichi Mizunaga, Mitsuaki Iwashita, Satoshi Kaneko
  • Patent number: 11208725
    Abstract: A substrate processing apparatus includes a rotary table comprising a base plate having a front surface where at least one suction hole is provided and an attraction plate having a front surface contacted with a non-processing surface of a substrate to attract the substrate, a rear surface contacted with the front surface of the base plate, and at least one through hole through which the front surface and the rear surface are connected; a rotation driving device configured to rotate the rotary table around a rotation axis; and a suction device configured to act a suction force on the suction hole, to contact the base plate with the attraction plate by acting the suction force between the base plate and the attraction plate, and to firmly contact the attraction plate with the substrate by acting the suction force between the attraction plate and the substrate through the through hole.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: December 28, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kouichi Mizunaga, Masami Akimoto, Satoshi Morita, Katsuhiro Morikawa
  • Publication number: 20210257236
    Abstract: A measurement processing process S103 of measuring a cut width of a film based on an image obtained by imaging, with an imaging unit 270, a peripheral portion of a substrate which is processed based on a substrate processing recipe; a creation process S602 of creating a management list in which a set value of the cut width of the film, a measurement value of the cut width of the film measured through the measurement processing process and time information at which the measurement result is obtained are correlated; an analysis process S603 (S606) of analyzing a state of the processed substrate based on the created management list; and a notification process S605 (S608, S609) of making a preset notification to a user based on an analysis result obtained through the analysis process are provided.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 19, 2021
    Inventors: Yoshifumi Amano, Satoshi Morita, Ryoji Ikebe, Isamu Miyamoto
  • Patent number: 11094568
    Abstract: A processing apparatus includes a chamber configured to accommodate a substrate to be processed, a nozzle provided in the chamber and configured to supply a processing solution to the substrate, a flow rate measuring part configured to measure a flow rate of the processing solution supplied to the nozzle, a flow path opening/closing part configured to open and close a supply flow path of the processing solution to the nozzle, and a controller configured to output a close signal causing the flow path opening/closing part to perform a closing operation that closes the supply flow path. The controller is configured to detect an operation abnormality of the flow path opening/closing part based on an accumulated amount of the flow rate measured by the flow rate measuring part after outputting the close signal.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: August 17, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kenji Nakamizo, Satoshi Morita, Akinori Tanaka, Hiroshi Komiya, Mikio Nakashima, Kousuke Fukuda, Youichi Masaki, Ryoji Ando, Ikuo Sunaka
  • Patent number: 11018035
    Abstract: A measurement processing process S103 of measuring a cut width of a film based on an image obtained by imaging, with an imaging unit 270, a peripheral portion of a substrate which is processed based on a substrate processing recipe; a creation process S602 of creating a management list in which a set value of the cut width of the film, a measurement value of the cut width of the film measured through the measurement processing process and time information at which the measurement result is obtained are correlated; an analysis process S603 (S606) of analyzing a state of the processed substrate based on the created management list; and a notification process S605 (S608, S609) of making a preset notification to a user based on an analysis result obtained through the analysis process are provided.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: May 25, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yoshifumi Amano, Satoshi Morita, Ryoji Ikebe, Isamu Miyamoto
  • Patent number: 11011436
    Abstract: Whether a film on a peripheral portion of a substrate is appropriately removed is rapidly determined without depending on a kind of the film on the peripheral portion to be removed. An acquisition process S502 of acquiring information upon the kind of the film of the substrate; a selection process S503 of selecting a measurement setting corresponding to the acquired kind of the film from a table for measurement settings previously stored in a storage unit; a control process S504 of controlling an imaging unit 270 to image the peripheral portion of the substrate by using the measurement setting selected in the selection process are provided.
    Type: Grant
    Filed: March 9, 2017
    Date of Patent: May 18, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yoshifumi Amano, Satoshi Morita, Ryoji Ikebe, Isamu Miyamoto
  • Publication number: 20210118706
    Abstract: A substrate processing apparatus includes: a rotary stage configured to hold a substrate; a rotary driver configured to rotate the rotary stage around a rotation axis; at least one electric heater installed in the rotary stage; at least one power receiving coil installed in the rotary stage and electrically connected to the electric heater; at least one power feeding coil installed to face the power receiving coil in a direction of the rotation axis with a gap between the power feeding coil and the power receiving coil; and a radio-frequency power supply unit configured to supply radio-frequency power to the power feeding coil.
    Type: Application
    Filed: October 6, 2020
    Publication date: April 22, 2021
    Inventors: Satoshi MORITA, Kouzou KAWAHARA
  • Patent number: 10936236
    Abstract: Provided are a rewriting system capable of shortening rewrite time, a rewriting system and a computer used for the rewriting system. The rewriting system includes an ECU and a rewriting device for at least transmitting to the ECU a rewrite data of memory contents stored in a flash ROM 14B (memory), the flash ROM 14B (memory) includes a rewrite target area A2 in which the memory contents to be rewritten are stored and a non-rewrite target area A1 in which the memory contents not to be rewritten are stored, and the rewriting device transmits the rewrite data of the memory contents to the ECU only for the memory contents of the rewrite target area in the flash ROM 14B (memory).
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: March 2, 2021
    Assignee: YAZAKI CORPORATION
    Inventors: Yoshihide Nakamura, Satoshi Morita, Yasuyuki Shigezane, Yoshinori Ikuta, Shuuji Satake
  • Patent number: 10916396
    Abstract: A plurality of semiconductor relays is provided between a power source and loads. The semiconductor relays have a function of a current detection for detecting a current passing through themselves. The loads are connected to output terminals respectively. A switching unit arbitrarily selects and switches a connecting destination of the semiconductor relays from among the plurality of output terminals. A microcomputer controls the switching unit on the basis of the detection results of a current flowing through the semiconductor relays, and adjusts the number of the semiconductor relays connected to the same load and connected to each other in parallel.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: February 9, 2021
    Assignee: YAZAKI CORPORATION
    Inventors: Tomohiro Shiozaki, Yoshihide Nakamura, Satoshi Morita, Yoshinori Ikuta, Shuuji Satake
  • Publication number: 20200258194
    Abstract: Provided are an image processing apparatus, an image processing method, and a program that can highly efficiently execute a generation process of a color image based on an image including a plurality of pixel sets each including a plurality of single-color pixels arranged in a predetermined color pattern, in which the pixel sets are vertically and horizontally arranged side by side. An intermediate image generation unit (64) generates, based on a basic image, an intermediate image in which pixel values of a plurality of basic pixels included in the pixel set are set as values of intermediate pixel data of one intermediate pixel associated with the pixel set. A pixel value determination unit (70) determines pixel values of a plurality of colors of at least one final pixel associated with a target intermediate pixel based on values of the intermediate pixel data of the target intermediate pixel and values of the intermediate pixel data of the intermediate pixel adjacent to the target intermediate pixel.
    Type: Application
    Filed: October 23, 2017
    Publication date: August 13, 2020
    Inventors: Satoshi MORITA, Masakazu HAYASHI
  • Patent number: 10707109
    Abstract: A substrate processing apparatus includes carry in/out station, transfer station, processing station, and image capturing unit. The carry in/out station includes first conveyance device that takes out and conveys substrate from cassette. The transfer station is disposed adjacent to the carry in/out station, and includes substrate placement unit on which the substrate conveyed by the first conveyance device is placed. The processing station is disposed adjacent to the transfer station, and includes second conveyance device that takes out and conveys the substrate from the substrate placement unit, and a plurality of processing units that processes the substrate conveyed by the second conveyance device. The image capturing unit is disposed in the transfer station, and captures an image of the peripheral edge portion of one of the upper and lower surfaces of the substrate and the end surface of the substrate.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: July 7, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Satoshi Morita, Ryoji Ikebe, Yasuaki Noda, Norihisa Koga, Keisuke Hamamoto, Masato Hosaka
  • Patent number: 10665091
    Abstract: An ID setting device includes: an output circuit configured to output, as serial data, an ID to be set in an ECU, which is an ID setting target; an input circuit to which an ID that is set is input as serial data from the ECU; and a control unit configured to check the ID output by the output circuit and the ID input to the input circuit against each other. The serial data has a duty cycle which is according to setting data on a per bit basis.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: May 26, 2020
    Assignee: YAZAKI CORPORATION
    Inventors: Yoshihide Nakamura, Satoshi Morita, Yasuyuki Shigezane, Yoshinori Ikuta, Shuuji Satake
  • Publication number: 20200105550
    Abstract: A substrate processing apparatus includes a rotation driving device configured to rotate a rotary table holding a substrate; a processing liquid nozzle configured to supply a processing liquid onto a top surface of the substrate; an electric heater provided at a top plate and configured to heat the substrate through the top plate; an electronic component configured to perform a power feed to the electric heater and transmission/reception of a control signal for the electric heater; and a periphery cover body connected to a peripheral portion of the top plate to be rotated along with the top plate. An accommodation space in which the electronic component is accommodated is formed under the top plate. The accommodation space is surrounded by a surrounding structure including the top plate and the periphery cover body. A gap between the peripheral portion of the top plate and the periphery cover body is sealed.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Inventors: Katsuhiro Morikawa, Masami Akimoto, Satoshi Morita, Kouichi Mizunaga
  • Publication number: 20200102654
    Abstract: A substrate processing apparatus includes a rotary table comprising a base plate having a front surface where at least one suction hole is provided and an attraction plate having a front surface contacted with a non-processing surface of a substrate to attract the substrate, a rear surface contacted with the front surface of the base plate, and at least one through hole through which the front surface and the rear surface are connected; a rotation driving device configured to rotate the rotary table around a rotation axis; and a suction device configured to act a suction force on the suction hole, to contact the base plate with the attraction plate by acting the suction force between the base plate and the attraction plate, and to firmly contact the attraction plate with the substrate by acting the suction force between the attraction plate and the substrate through the through hole.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Inventors: Kouichi Mizunaga, Masami Akimoto, Satoshi Morita, Katsuhiro Morikawa
  • Publication number: 20200105574
    Abstract: A substrate processing apparatus includes a rotation driving device configured to rotate a rotary table holding a substrate; an electric heater provided at the rotary table and configured to heat the substrate; a power receiving electrode provided at the rotary table and electrically connected to the electric heater; a power feeding electrode configured to be contacted with the power receiving electrode to supply a power to the electric heater via the power receiving electrode; an electrode moving device configured to connect and disconnect the power feeding electrode and the power receiving electrode relatively; a power feeder configured to supply the power to the power feeding electrode; a processing cup disposed to surround the rotary table; at least one processing liquid nozzle configured to supply a processing liquid onto the substrate; a processing liquid supply device configured to supply the processing liquid to the processing liquid nozzle; and a controller.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Inventors: Satoshi Morita, Masami Akimoto, Katsuhiro Morikawa, Kouichi Mizunaga
  • Publication number: 20200107404
    Abstract: A substrate processing apparatus includes a rotary table configured to hold and rotate a substrate; an electronic component provided at the rotary table and configured to be rotated along with the rotary table; a first electrode unit provided at the rotary table and configured to be rotated along with the rotary table, the first electrode unit comprising multiple first electrodes electrically connected to the electronic component via multiple first conductive lines; an electric device configured to perform a power supply to the electronic component and a transmission/reception of signals; a second electrode unit comprising multiple second electrodes electrically connected to the electric device via multiple second conductive lines and arranged at positions respectively corresponding to the multiple first electrodes to be brought into contact with the multiple first electrodes; and an electrode moving device configured to connect/disconnect the first electrode unit to/from the second electrode unit.
    Type: Application
    Filed: September 26, 2019
    Publication date: April 2, 2020
    Inventors: Satoshi Morita, Masami Akimoto, Katsuhiro Morikawa, Kouichi Mizunaga, Kouzou Kawahara
  • Patent number: 10351084
    Abstract: When an anomaly is determined in the transition of ECUs to a power saving state, a power supply control system sequentially turns on current supply switches while keeping a bypass switch on. A monitoring controller determines an anomaly in the transition of the ECUs to a power saving state on the basis of whether the dark current in the ECUs calculated from the amount of change at that time in the current in the power supply line is greater than an ordinary dark current. Further, in the startup state of the ECUs, power from a power supply can be supplied to the ECUs via the power supply line and individual supply lines.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: July 16, 2019
    Assignee: YAZAKI CORPORATION
    Inventors: Akinori Maruyama, Shuuji Satake, Satoshi Morita, Yoshinori Ikuta, Yoshihide Nakamura, Yasuyuki Shigezane
  • Publication number: 20190096730
    Abstract: A substrate processing apparatus includes carry in/out station, transfer station, processing station, and image capturing unit. The carry in/out station includes first conveyance device that takes out and conveys substrate from cassette. The transfer station is disposed adjacent to the carry in/out station, and includes substrate placement unit on which the substrate conveyed by the first conveyance device is placed. The processing station is disposed adjacent to the transfer station, and includes second conveyance device that takes out and conveys the substrate from the substrate placement unit, and a plurality of processing units that processes the substrate conveyed by the second conveyance device. The image capturing unit is disposed in the transfer station, and captures an image of the peripheral edge portion of one of the upper and lower surfaces of the substrate and the end surface of the substrate.
    Type: Application
    Filed: September 21, 2018
    Publication date: March 28, 2019
    Inventors: Satoshi Morita, Ryoji Ikebe, Yasuaki Noda, Norihisa Koga, Keisuke Hamamoto, Masato Hosaka
  • Publication number: 20190066955
    Abstract: A plurality of semiconductor relays is provided between a power source and loads. The semiconductor relays have a function of a current detection for detecting a current passing through themselves. The loads are connected to output terminals respectively. A switching unit arbitrarily selects and switches a connecting destination of the semiconductor relays from among the plurality of output terminals. A microcomputer controls the switching unit on the basis of the detection results of a current flowing through the semiconductor relays, and adjusts the number of the semiconductor relays connected to the same load and connected to each other in parallel.
    Type: Application
    Filed: July 19, 2018
    Publication date: February 28, 2019
    Inventors: Tomohiro Shiozaki, Yoshihide Nakamura, Satoshi Morita, Yoshinori Ikuta, Shuuji Satake