Patents by Inventor Satoshi Nagai

Satoshi Nagai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100028789
    Abstract: A method of controlling exposure device according to an embodiment includes preparing a photomask in which a check pattern is formed, wherein the check pattern comprising a plurality of patterns which have a first diameter and a second diameter and have pattern dimensions being changeable after being transferred according to polarization degree of exposure light are arranged in the second diameter direction, irradiating the photomask with the exposure light having a predetermined polarization degree so as to transfer the check pattern to a transferred object, and measuring the dimensions of the images of the check pattern transferred to the transferred object so as to obtain the polarization degree.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 4, 2010
    Inventors: Satoshi NAGAI, Kazuya Fukuhara
  • Publication number: 20100021752
    Abstract: Provided are a method of bonding resin materials for bonding a resin material (X) containing an oxymethylene-based polymer (A) and a resin material (Y), and a structure obtained by the bonding method. The method includes preparing as the resin material (Y) a low-melting-point oxymethylene-based polymer (B) having a melting point lower than that of the oxymethylene-based polymer (A) by 5 to 50° C., or preparing as the resin material (Y) the resin material (X) or another resin material, and providing the low-melting-point oxymethylene-based polymer (B) between the resin material (Y) and the resin material (X) and heating resin materials.
    Type: Application
    Filed: December 3, 2007
    Publication date: January 28, 2010
    Inventors: Akira Okamura, Satoshi Nagai
  • Publication number: 20100015458
    Abstract: Provided is an oxymethylene copolymer composition for a stretched material having a high strength and a high elastic modulus, the composition including: an oxymethylene copolymer; and a crosslinkable compound to be blended with the oxymethylene copolymer in an amount of 0.001 to 0.05 part by mass with respect to 100 parts by mass of the oxymethylene copolymer. The present invention also relates to a stretched material obtained by using the oxymethylene copolymer composition. Further, the present invention relates to a structure obtained by the secondary processing of the above stretched material, and a structure obtained by using the above oxymethylene copolymer composition in a bonding layer of the structure. The present invention also relates to a method of producing a structure, the method including: using the oxymethylene copolymer composition in a bonding layer of the structure; and removing a polyalkylene glycol component with water or a solvent.
    Type: Application
    Filed: December 3, 2007
    Publication date: January 21, 2010
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY , INC.
    Inventors: Akira Okamura, Satoshi Nagai
  • Publication number: 20090258319
    Abstract: In an exposure method, an anti-reflection film and a photoresist are stacked in order on the surface of a substrate. A periodic pattern of a pitch P is formed on a pattern surface of a photomask. A medium having a refractive index n is present between a projection lens having a numerical aperture NAp and the substrate. The refractive index, coefficient of extinction and thickness of the anti-reflection film are selected so that the reflectance of exposure light of a wavelength ? at an interface between the photoresist and the anti-reflection film is less than or equal to a desired value when an angle of incidence ? is within a range determined by ?/P?NAp?n×sin ??NAp. The angle of incidence ? is formed to a perpendicular line in the medium by light incident on the surface of the substrate.
    Type: Application
    Filed: April 14, 2009
    Publication date: October 15, 2009
    Inventors: Satoshi NAGAI, Kazuya Fukuhara
  • Publication number: 20090062503
    Abstract: The problem to be solved is to provide a process for producing a polyoxymethylene copolymer in a molding machine with a reduced generation of formaldehyde gas. In a process for continuously producing a polyoxymethylene copolymer comprising a step of melt-kneading a crude polyoxymethylene copolymer at a temperature not lower than the melting point thereof, devolatilizing under reduced pressure the formaldehyde gas generated as a decomposition product, subsequently mixing a formaldehyde scavenger containing a hydrazide compound (A) while keeping the copolymer in a molten state and immediately pelletizing the mixture, a dispersed solution obtained by slurry-dispersing said (A) in a diluent (B) having a melting point lower than temperature (Ta) which is the lower of the melting point and the decomposition temperature of (A), within a temperature range not lower than the melting point of (B) and lower than (Ta) is used as the formaldehyde scavenger.
    Type: Application
    Filed: April 10, 2006
    Publication date: March 5, 2009
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Satoshi Nagai, Akira Okamura, Daisuke Sunaga
  • Patent number: 7431945
    Abstract: The invention relates to an allergen remover composition containing component (a): an organic compound forming an azeotropic mixture with water and having an azeotropic point of lower than 100° C. with water at 1013.25 hPa, component (b): a component which upon evaporation of a liquid component in the allergen remover, forms a solid containing a compound represented by the following general formula (1) or component (b?): a combination of potassium ion, sodium ion and sulfate ion at a potassium ion/sodium ion molar ratio of from 2/8 to 9/1 and component (c): water. KxNay(SO4)2 ??(1) wherein x is a number of 0.8 to 3.6, y is a number of 0.4 to 3.2, and x+y is 4.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: October 7, 2008
    Assignee: Kao Corporation
    Inventors: Takeshi Ban, Satoshi Nagai, Katsuyuki Takano, Masahiro Suzuki, Michio Yokosuka
  • Publication number: 20080124633
    Abstract: A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle ?(0°<?<90°) is higher than transmittance of incident light of an incident angle 0°.
    Type: Application
    Filed: November 13, 2007
    Publication date: May 29, 2008
    Inventors: Satoshi Nagai, Kazuya Fukuhara, Masamitsu Itoh, Kenji Kawano, Satoshi Tanaka
  • Patent number: 7283929
    Abstract: An operation-supporting apparatus includes: an operation request input unit that inputs information relating to operation request items of plant equipment; an operating conditions setting unit that converts operation request input information to operating parameters; an operation history creation unit that creates an operation history by chronologically processing the operating parameters; a breakdown statistics database that stores an event tree of the plant equipment; an event simulator that calculates the degree of unreliability corresponding to the operating parameters, the operation request information, and the operation history information, and in compliance with the event tree; a risk-cost calculation unit that calculates risk-cost by determining the aggregate product of the degrees of unreliability and restoration costs; an operating method determination unit that determines whether operating conditions are suitable by comparing the risk-cost with profit gained by continuing operation; and an operatin
    Type: Grant
    Filed: September 26, 2005
    Date of Patent: October 16, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazunari Fujiyama, Toshihiro Fujiwara, Kazuhiro Saito, Taiji Hirasawa, Satoshi Nagai, Hitoshi Kichise, Mitsuyoshi Okazaki, Hirotsugu Kodama, Masanori Minowa, Takayuki Iwahashi, Yasunari Akikuni, Masao Arimura, Kentaro Takagi, Seiichi Asatsu, Shigeru Harada
  • Publication number: 20070212327
    Abstract: The invention provides a means capable of effectively inactivating and removing allergen or a precursor thereof. The invention relates to an allergen-reducing agent containing water and a water-soluble polymer compound having units having hydroxy or carboxy groups wherein at least a part of hydrogen atoms of the hydroxy or carboxy groups are substituted by specific groups containing a polyether group.
    Type: Application
    Filed: October 20, 2004
    Publication date: September 13, 2007
    Applicant: Kao Corporation
    Inventors: Satoshi Nagai, Katsuyuki Takano
  • Publication number: 20070032174
    Abstract: The present invention relates to a polishing apparatus for polishing a workpiece such as a semiconductor wafer to form a flat surface thereon. The polishing apparatus includes a polishing table (20), a polishing tool (1) attached to an upper surface of the polishing table (20), and a fluid passage (40) having openings on the upper surface of the polishing table (20). The apparatus is operable to bring a workpiece (W) into sliding contact with the polishing tool (1) to polish the workpiece while supplying a polishing liquid onto the polishing tool (1). The polishing tool (1) is fixed to the polishing table (20) by a vacuum produced in the fluid passage (40).
    Type: Application
    Filed: April 28, 2004
    Publication date: February 8, 2007
    Applicant: EBARA CORPORATION
    Inventor: Satoshi Nagai
  • Publication number: 20060100915
    Abstract: It is an object of this invention to provide an apparatus that selects and specifies an optimal operating method for plant equipment while estimating risk-cost that relates to damage, performance deterioration, and functional stoppage, of the plant equipment, and comparing the risk-cost with profit gained from operation.
    Type: Application
    Filed: August 29, 2003
    Publication date: May 11, 2006
    Inventors: Kazunari Fujiyama, Toshihiro Fujiwara, Kazuhiro Saito, Taiji Hirasawa, Satoshi Nagai, Hitoshi Kichise, Mitsuyoshi Okazaki, Hirotsugu Kodama, Masanori Minowa, Takayuki Iwahashi, Yasunari Akikuni, Masao Arimura, Kentaro Takagi, Seiichi Asatsu, Shigeru Harada
  • Publication number: 20060063863
    Abstract: A polyacetal resin composition comprising 100 parts by weight of a polyacetal polymer, 0.01 to 0.5 part by weight of a hydrazide compound, 0.01 to 0.1 part by weight of an amino-substituted triazine compound and 0.01 to 5 parts by weight of a hindered phenolic compound, wherein the resin composition has a total content of hydroxides, organic acid salts and inorganic acid salts of an alkali metal and an alkali earth metal of 50 ppm or less by weight in terms of the total of the alkali metal and the alkali earth metal; and a molded article thereof. The polyacetal resin composition greatly suppresses the emission of formaldehyde from a pellet or molded article thereof and rarely produces a mold deposit.
    Type: Application
    Filed: September 19, 2005
    Publication date: March 23, 2006
    Inventors: Daisuke Sunaga, Yuji Takeda, Akira Okamura, Satoshi Nagai
  • Patent number: 7002876
    Abstract: An acoustic-propagation-time measuring apparatus includes an acoustic transmitting and receiving section having an acoustic element capable of transmitting and receiving acoustic waves, an A/D converter which converts an echo signal reflected from a target object to be measured into a digital signal, an inverse-analysis section that converts the digital echo signal into an impulse signal through inverse analysis where the digital echo signal is multiplied by an inverse matrix, a calculating section that measures an acoustic propagation time and a time difference based on the digital echo signal converted to the impulse signal, and a display section which displays the acoustic propagation time and time difference calculated by the calculating section.
    Type: Grant
    Filed: July 23, 2004
    Date of Patent: February 21, 2006
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masafumi Komai, Satoshi Nagai, Takehiko Suzuki
  • Patent number: 6965834
    Abstract: The present invention provides a method of inspecting a target component part (e.g., valve casing) of an apparatus (e.g., steam control valve) included in a steam turbine system. When a time period in a range of 24 to 100 hours passes from the shutting-down of the turbine system, or before a temperature of an atmosphere surrounding the component part is lowered to 100° C., the width of the opening of the crack formed in the component part or a clearance relating to the component part is measured without disassembling the target component part and an enclosing member (e.g., valve casing) from the apparatus. As the measurement is performed when a thermal stress is induced in the component parts or when the temperature distribution is wide, the risk level of the crack or the clearance is determined accurately.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: November 15, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuhiro Saito, Kazunari Fujiyama, Taiji Hirasawa, Satoshi Nagai, Toshihiro Fujiwara, Hitoshi Kichise, Hirotsugu Kodama, Mitsuyoshi Okazaki
  • Patent number: 6928391
    Abstract: Data on inspection, diagnosis, repair and operation histories are entered in a plant-maintenance apparatus for equipment that constitute a plant to be maintained. Failure-event tree breakdown is performed on failures to be expected for the equipment. Unreliability is predicted of at least one starting item in the failure-event tree breakdown. Unreliability of each item in the failure-event tree is calculated based on a failure unreliability function. Unreliability and a cost of recovery from each failure event in the failure-event tree are multiplied and results of the multiplication are accumulated in accordance with the tree breakdown to obtain a recovery cost. Preventive maintenance expenses are calculated for preventing failure events. Maintenance timing and technique are decided through comparison between the recovery cost and the preventive maintenance expenses.
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: August 9, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazunari Fujiyama, Toshihiro Fujiwara, Kazuhiro Saito, Taiji Hirawawa, Satoshi Nagai, Hitoshi Kichise, Mitsuyoshi Okazaki, Hirotsugu Kodama, Seiichi Asatsu, Masanori Minowa, Takayuki Iwahashi, Shigeru Harada, Mamoru Sudo, Fumiharu Ishii
  • Patent number: 6925418
    Abstract: An apparatus for maintaining plant equipment incorporates an input unit to receive information on targets and ranges of plant equipment to be maintained and a failure-event tree breakdown unit to perform tree-breakdown on failures to be expected from events to be inspected. A failure-unreliability function calculation unit calculates unreliability of each item in failure-event tree breakdown and a failure-derived monetary loss calculation unit multiplies each unreliability and a cost of recovery from each event in accordance with the failure-event tree breakdown. A preventive maintenance expense calculation unit calculates preventive maintenance expenses for preventing failure events and a maintenance decision-making unit decides maintenance timing and technique through comparison between the recovery cost and the preventive maintenance expense.
    Type: Grant
    Filed: April 9, 2003
    Date of Patent: August 2, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazunari Fujiyama, Toshihiro Fujiwara, Kazuhiro Saito, Taiji Hirawawa, Satoshi Nagai, Hitoshi Kichise, Mitsuyoshi Okazaki, Hirotsugu Kodama, Seiichi Asatsu, Masanori Minowa, Takayuki Iwahashi, Shigeru Harada, Mamoru Sudo, Fumiharu Ishii
  • Publication number: 20050119148
    Abstract: The invention relates to an allergen remover composition containing component (a): an organic compound forming an azeotropic mixture with water and having an azeotropic point of lower than 100° C. with water at 1013.25 hPa, component (b): a component which upon evaporation of a liquid component in the allergen remover, forms a solid containing a compound represented by the following general formula (1) or component (b?) a combination of potassium ion, sodium ion and sulfate ion at a potassium ion/sodium ion molar ratio of from 2/8 to 9/1 and component (c) water. KxNay(SO4)2??(1) wherein x is a number of 0.8 to 3.6, y is a number of 0.4 to 3.2, and x+y is 4.
    Type: Application
    Filed: November 9, 2004
    Publication date: June 2, 2005
    Applicant: KAO CORPORATION
    Inventors: Takeshi Ban, Satoshi Nagai, Katsuyuki Takano, Masahiro Suzuki, Michio Yokosuka
  • Publication number: 20050114883
    Abstract: An information providing method includes the steps of receiving pieces of terminal identifying information and pieces of user identifying information from a plurality of terminal devices, identifying user attributes for each of the pieces of user identifying information by referring to a user management table containing correspondences between the user identifying information and user attributes, by referring to an information management table containing correspondences among user attributes, provided information, and related information, extracting pieces of provided information and pieces of related information for each of the user attributes, outputting, for each of the pieces of user identifying information, the extracted provided information to terminal devices identified by corresponding pieces of the terminal identifying information, and displaying the extracted related information on a screen of a screen device.
    Type: Application
    Filed: May 26, 2004
    Publication date: May 26, 2005
    Inventors: Satoshi Nagai, Toshihiro Kodaka, Hirokazu Hanno, Takashi Kurihara, Mitsuru Nakajima
  • Publication number: 20050018539
    Abstract: An acoustic-propagation-time measuring apparatus includes an acoustic transmitting and receiving section having an acoustic element capable of transmitting and receiving acoustic waves, an A/D converter which converts an echo signal reflected from a target object to be measured into a digital signal, an inverse-analysis section that converts the digital echo signal into an impulse signal through inverse analysis where the digital echo signal is multiplied by an inverse matrix, a calculating section that measures an acoustic propagation time and a time difference based on the digital echo signal converted to the impulse signal, and a display section which displays the acoustic propagation time and time difference calculated by the calculating section.
    Type: Application
    Filed: July 23, 2004
    Publication date: January 27, 2005
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Masafumi Komai, Satoshi Nagai, Takehiko Suzuki
  • Publication number: 20040171511
    Abstract: Provided is an allergen-removing agent and an allergen-removing method which makes it possible to remove allergen substances effectively by a simple cleaning operation and further does not change feeling of the object. An allergen-removing agent is provide, comprising (a) an organic compound which makes with water into an azeotropic mixture and has an azeotropic temperature with water of less than 100° C. at 1013.25 hPa, (b) water, and (c) a solid source substance being an organic compound having a melting point of 25° C. or more, being soluble in at least one of component (a) and component (b) and generating a solid by evaporation of liquid components of the allergen-removing agent.
    Type: Application
    Filed: December 8, 2003
    Publication date: September 2, 2004
    Inventors: Satoshi Nagai, Katsuyuki Takano, Masahiro Suzuki, Takeshi Ban, Michio Yokosuka