Patents by Inventor Satoshi Nakane

Satoshi Nakane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150390
    Abstract: The purpose of the present invention is to provide a novel stereoselective method for preparing a cyclic dinucleotide derivative and a production intermediate therefor, which can be used for an antibody-immunostimulant conjugate. Also provided is a method for producing a cyclic dinucleotide-linker and an antibody-immunostimulant conjugate while using the above production method. Further provided is a method for preparing a cyclic dinucleotide derivative, the method including the step of subjecting a compound (I) and a compound (IV) to stereoselective condensation using an optically active phosphitylating agent (Rc-II) or (Sc-II).
    Type: Application
    Filed: January 31, 2022
    Publication date: May 9, 2024
    Applicant: Daiichi Sankyo Company, Limited
    Inventors: Tomokazu OGURA, Takeshi NAKAYA, Hidekazu INOUE, Narumi ABE, Yuzo ABE, Tatsuya NAKAMURA, Yuko YAMAMOTO, Kohei SAKANISHI, Tatsuhiro SAKAMOTO, Satoshi NAKANE
  • Publication number: 20240112918
    Abstract: A plasma processing system includes: first and second processing chambers having respective first and second substrate supports; a transport chamber connected to the first and second processing chambers, and having a transport device; and a controller that executes processing of (a) disposing a substrate including a silicon-containing film having a recess portion and a mask on the silicon-containing film on the first substrate support of the first processing chamber, (b) forming a carbon-containing film on a side wall of the silicon-containing film defining the recess portion in the first processing chamber, (c) transporting the substrate from the first processing chamber to the second processing chamber via the transport chamber and disposing the substrate on the second substrate support, and (d) etching a bottom portion of the recess portion where the carbon-containing film is formed by using a plasma formed from a first processing gas in the second processing chamber.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 4, 2024
    Inventors: Noboru SAITO, Yuta NAKANE, Atsushi TAKAHASHI, Shinya ISHIKAWA, Satoshi OHUCHIDA, Maju TOMURA
  • Patent number: 5066344
    Abstract: An endless belt comprising a belt main body prepared from a liquid castable elastomeric material, a reinforcing fabric providing over the surface of the main body, and a shock absorbing layer of elastomeric material formed between the main body and the fabric. The belt is in the form of a flat belt or a belt having teeth or projections on at least one side thereof, has improved bending resistance and is operable with diminished noise. The belt is prepareed by a process comprising the steps of forming a shock absorbing layer of elastomeric material over the surface of a reinforcing fabric, fitting the fabric to one of an inner die and an outer die with the layer facing the other die, and pouring or injecting a liquid castable elastomeric material into a space between the fabric and the other die for molding.
    Type: Grant
    Filed: February 13, 1990
    Date of Patent: November 19, 1991
    Assignee: Nitta Industries Corporation
    Inventors: Junichi Inami, Koozi Kikuta, Satoshi Nakane, Kazumi Fujito, Hitoshi Hirosawa