Patents by Inventor Satoshi Ohtani

Satoshi Ohtani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11015716
    Abstract: A sealing ring includes: a main body portion extending from one end to another end in a circumferential direction of a ring hole; and a pair of facing portions separately provided on the one end side and the other end side of the main body portion, the pair of facing portions being in contact with each other while facing each other in a direction of a central axis of the ring hole, the pair of facing portions each subjected to energizing force acting in a direction toward the other.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: May 25, 2021
    Assignee: IHI Corporation
    Inventor: Satoshi Ohtani
  • Patent number: 10876466
    Abstract: A wave washer according to an aspect of the present disclosure includes an annular body which is formed around an axis into a wave shape and at least one protruding piece which protrudes inward or outward from the body. The at least one protruding piece includes a flat surface which is perpendicular to the axis.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: December 29, 2020
    Assignees: IHI Corporation, CHUO HATSUJO KABUSHIKI KAISHA
    Inventors: Yuichiro Akiyama, Satoshi Ohtani, Naotada Ueda, Michihiko Tanigaki, Hideki Toya
  • Publication number: 20200347778
    Abstract: A wave washer according to an aspect of the present disclosure includes an annular body which is formed around an axis into a wave shape and at least one protruding piece which protrudes inward or outward from the body. The at least one protruding piece includes a flat surface which is perpendicular to the axis.
    Type: Application
    Filed: March 7, 2018
    Publication date: November 5, 2020
    Applicants: IHI Corporation, CHUO HATSUJO KABUSHIKI KAISHA
    Inventors: Yuichiro AKIYAMA, Satoshi OHTANI, Naotada UEDA, Michihiko TANIGAKI, Hideki TOYA
  • Publication number: 20190170258
    Abstract: A sealing ring includes: a main body portion extending from one end to another end in a circumferential direction of a ring hole; and a pair of facing portions separately provided on the one end side and the other end side of the main body portion, the pair of facing portions being in contact with each other while facing each other in a direction of a central axis of the ring hole, the pair of facing portions each subjected to energizing force acting in a direction toward the other.
    Type: Application
    Filed: February 5, 2019
    Publication date: June 6, 2019
    Applicant: IHI Corporation
    Inventor: Satoshi OHTANI
  • Publication number: 20110224927
    Abstract: An energy consumption improvement calculation apparatus calculates an amount of room-for-improvement that is an improvable amount of power consumption of at least one target device. A cycle use section of the energy consumption improvement calculation apparatus uses measured values and measurement times of power consumption and a fluctuating cycle of power consumption which fluctuates periodically.
    Type: Application
    Filed: October 19, 2009
    Publication date: September 15, 2011
    Applicant: OMRON CORPORATION
    Inventors: Kosuke Tsuruta, Taro Iwami, Hironori Inaba, Satoshi Ohtani
  • Publication number: 20080219544
    Abstract: A factor estimating support device supports estimation of factor from a result generated in a production system. In the factor estimating support device, material/environment history data and test history data acquired from the production system, and the causality structure data indicating causality between the plurality of variables are stored in the storage unit, where when determined that the final quality characteristic is abnormal in the final quality abnormal detecting part, determination is made on whether each variable other than the final quality characteristic is abnormal in the variable abnormality detecting part, and the determination result is reflected on a visible image in which the causality structure data is visualized in the visible image creating part.
    Type: Application
    Filed: March 7, 2008
    Publication date: September 11, 2008
    Applicant: OMRON CORPORATION
    Inventors: Hiroshi Tasaki, Yoshifumi Hasegawa, Kazuto Kojitani, Satoshi Ohtani, Takuma Kawai
  • Patent number: 6962751
    Abstract: Amorphous carbon coated tools include substrates formed from a cubic boron nitride sintered body, a diamond sintered body, a silicon nitride sintered body, or an aluminum oxide-titanium carbide sintered body, and amorphous carbon films thereon to make the cutting edges of the tools. The amorphous carbon films contain hydrogen at 5 atomic percent or below and have a maximum thickness of 0.05 ?m to 0.5 ?m on the cutting edges. The amorphous carbon films are most suitable for applications to cutting tools exemplified by cutters, knives, and slitters, and to indexable inserts used for example in turning tools including drills, endmills, and reamers, and milling cutters.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: November 8, 2005
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Haruyo Fukui, Yoshiharu Utsumi, Miki Irie, Hisanori Ohara, Hideki Moriguchi, Satoru Kukino, Makoto Setoyama, Satoshi Ohtani, Naoto Okazaki, Kiyoshi Ogata
  • Patent number: 6881475
    Abstract: An amorphous carbon coated tool includes a base material of WC base cemented carbide, and an amorphous carbon film formed on this base material. The cobalt content in the base material is at least 12% by mass. The maximum thickness of the amorphous carbon film is at least 0.05 ?m and not more than 0.5 ?m at the cutting edge. The amorphous carbon film is deposited with graphite as the source material by physical vapor deposition in an atmosphere substantially absent of hydrogen. The amorphous carbon film coated tool superior in wear resistance and adhesion resistance is preferably applicable to rotating tools such as drills, end mills and reamers, indexable inserts used for milling cutters and turning tools, and cutting-off tools such as cutters, knives, or slitters.
    Type: Grant
    Filed: June 11, 2002
    Date of Patent: April 19, 2005
    Assignees: Sumitomo Electric Industries, Ltd, Nissin Electric Co., Ltd.
    Inventors: Satoshi Ohtani, Naoto Okazaki, Kiyoshi Ogata, Haruyo Fukui, Miki Irie, Yoshiharu Utsumi, Hisanori Ohara, Hideki Moriguchi, Akihiko Ikegaya, Keiichi Tsuda, Makoto Setoyama
  • Publication number: 20030054171
    Abstract: Amorphous carbon coated tools having excellent wear-resistant and anti-adhesion features and methods of producing the same are provided.
    Type: Application
    Filed: June 11, 2002
    Publication date: March 20, 2003
    Inventors: Haruyo Fukui, Yoshiharu Utsumi, Miki Irie, Hisanori Ohara, Hideki Moriguchi, Satoru Kukino, Makoto Setoyama, Satoshi Ohtani, Naoto Okazaki, Kiyoshi Ogata
  • Publication number: 20030049083
    Abstract: An amorphous carbon coated tool includes a base material of WC base cemented carbide, and an amorphous carbon film formed on this base material. The cobalt content in the base material is at least 12% by mass. The maximum thickness of the amorphous carbon film is at least 0.05 &mgr;m and not more than 0.5 &mgr;m at the cutting edge. The amorphous carbon film is deposited with graphite as the source material by physical vapor deposition in an atmosphere substantially absent of hydrogen. The amorphous carbon film coated tool superior in wear resistance and adhesion resistance is preferably applicable to rotating tools such as drills, end mills and reamers, indexable inserts used for milling cutters and turning tools, and cutting-off tools such as cutters, knives, or slitters.
    Type: Application
    Filed: June 11, 2002
    Publication date: March 13, 2003
    Inventors: Satoshi Ohtani, Naoto Okazaki, Kiyoshi Ogata, Haruyo Fukui, Miki Irie, Yoshiharu Utsumi, Hisanori Ohara, Hideki Moriguchi, Akihiko Ikegaya, Keiichi Tsuda, Makoto Setoyama
  • Patent number: 5239194
    Abstract: A semiconductor substrate has a plurality of MOS transistors formed therein. Each of the transistors comprises high density diffusion regions having high impurity density and serving as source and drain, low density diffusion regions having low impurity density and extending in contact with the high density diffusion regions, respectively, a channel region formed between the low density diffusion regions, and a gate formed above the substrate and insulated from the channel region. One of the transistors has its drain connected to an input/output terminal. The low density diffusion region of the one has impurity density higher than that of the other. The channel length of the one is greater than that of the other.
    Type: Grant
    Filed: February 28, 1991
    Date of Patent: August 24, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Satoshi Ohtani, Masayuki Yoshida, Nobutaka Kitagawa, Tomotaka Saito
  • Patent number: 5159324
    Abstract: The present invention concerns an icon aided run function display system wherein a function may be selected from a plurality of choices shown on a display means and having a function selection means for selecting the function and terminating the selection. Further, the present invention comprises an apparatus for selecting an additional device display in a recording apparatus having a plurality of selectively attachable devices. Moreover, the present invention comprises a call selection system having a function selection key wherein a plurality of selection functions and a function selection message are simultaneously display with the operation of a cursor.
    Type: Grant
    Filed: August 9, 1991
    Date of Patent: October 27, 1992
    Assignee: Fuji Xerox Corporation, Ltd.
    Inventors: Satoshi Ohtani, Kaoru Kaminaga, Mamoru Kobayashi