Patents by Inventor Satoshi Oida

Satoshi Oida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11276796
    Abstract: Photovoltaic structures having multiple absorber layers separated by a diffusion barrier are provided. In one aspect, a method of forming an absorber on a substrate includes: depositing a first layer of light absorbing material on the substrate; depositing a diffusion barrier; depositing a second layer of light absorbing material on the diffusion barrier, wherein the first layer of light absorbing material has a different band gap from the second layer of light absorbing material; and annealing the absorber, wherein the diffusion barrier prevents diffusion of elements between the first layer of light absorbing material and the second layer of light absorbing material during the annealing. A solar cell and method for formation thereof are also provided.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: March 15, 2022
    Assignee: International Business Machines Corporation
    Inventors: Priscilla D. Antunez, Arthur W. Ellis, Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 11227996
    Abstract: A resistive element in an artificial neural network, the resistive element includes a Silicon-on-insulator (SOI) substrate, and a Silicon layer formed on the Silicon-on-insulator substrate. The Silicon layer includes dopants derived from a thin film dopant layer, and the thin film dopant layer includes a programmed amount of dopant including at least one of Boron and Phosphorus.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: January 18, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ali Afzali-Ardakani, Matthew Warren Copel, James Bowler Hannon, Satoshi Oida
  • Patent number: 11024803
    Abstract: A method of forming a resistive random access memory (RRAM) element, the method includes forming a Silicon layer on an oxide layer, depositing a thin film dopant layer on the Silicon layer, and controlling a concentration of the dopant in the thin film dopant layer.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: June 1, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ali Afzali-Ardakani, Matthew Warren Copel, James Bowler Hannon, Satoshi Oida
  • Patent number: 10748059
    Abstract: A resistive element in an electrochemical artificial neural network, includes a transition metal oxide thin film forming a working electrode, a pair of first electrodes connected to the working electrode, and a reference electrode for electrochemical doping of the working electrode. The biasing of the pair of first electrodes with respect to the reference electrode according to a determination of conductivity between the pair of first electrodes controls the resistance of the working electrode.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: August 18, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Matthew Warren Copel, James Bowler Hannon, Satoshi Oida, John Jacob Yurkas
  • Patent number: 10749050
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Grant
    Filed: January 9, 2017
    Date of Patent: August 18, 2020
    Assignee: International Business Machines Corporation
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Publication number: 20190305169
    Abstract: Photovoltaic structures having multiple absorber layers separated by a diffusion barrier are provided. In one aspect, a method of forming an absorber on a substrate includes: depositing a first layer of light absorbing material on the substrate; depositing a diffusion barrier; depositing a second layer of light absorbing material on the diffusion barrier, wherein the first layer of light absorbing material has a different band gap from the second layer of light absorbing material; and annealing the absorber, wherein the diffusion barrier prevents diffusion of elements between the first layer of light absorbing material and the second layer of light absorbing material during the annealing. A solar cell and method for formation thereof are also provided.
    Type: Application
    Filed: June 11, 2019
    Publication date: October 3, 2019
    Inventors: Priscilla D. Antunez, Arthur W. Ellis, Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 10361331
    Abstract: Photovoltaic structures having multiple absorber layers separated by a diffusion barrier are provided. In one aspect, a method of forming an absorber on a substrate includes: depositing a first layer of light absorbing material on the substrate; depositing a diffusion barrier; depositing a second layer of light absorbing material on the diffusion barrier, wherein the first layer of light absorbing material has a different band gap from the second layer of light absorbing material; and annealing the absorber, wherein the diffusion barrier prevents diffusion of elements between the first layer of light absorbing material and the second layer of light absorbing material during the annealing. A solar cell and method for formation thereof are also provided.
    Type: Grant
    Filed: January 18, 2017
    Date of Patent: July 23, 2019
    Assignee: International Business Machines Corporation
    Inventors: Priscilla D. Antunez, Arthur W. Ellis, Richard A. Haight, James B. Hannon, Satoshi Oida
  • Publication number: 20190198762
    Abstract: A method of forming a resistive random access memory (RRAM) element, the method includes forming a Silicon layer on an oxide layer, depositing a thin film dopant layer on the Silicon layer, and controlling a concentration of the dopant in the thin film dopant layer.
    Type: Application
    Filed: February 28, 2019
    Publication date: June 27, 2019
    Applicant: International Business Machines Corporation
    Inventors: Ali AFZALI-ARDAKANI, Matthew Warren COPEL, James Bowler HANNON, Satoshi OIDA
  • Publication number: 20190198761
    Abstract: A resistive element in an artificial neural network, the resistive element includes a Silicon-on-insulator (SOI) substrate, and a Silicon layer formed on the Silicon-on-insulator substrate. The Silicon layer includes dopants derived from a thin film dopant layer, and the thin film dopant layer includes a programmed amount of dopant including at least one of Boron and Phosphorus.
    Type: Application
    Filed: February 28, 2019
    Publication date: June 27, 2019
    Applicant: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Matthew Warren Copel, James Bowler Hannon, Satoshi Oida
  • Patent number: 10269994
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se)(CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: April 23, 2019
    Assignee: International Business Machines Corporation
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 10256405
    Abstract: A method of forming semiconductor elements in an artificial neural network, the method including forming a substrate including an oxide layer, forming a Silicon layer on the oxide layer, depositing a thin film dopant layer on the Silicon layer, and controlling a concentration of the dopant in the thin film dopant layer.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: April 9, 2019
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ali Afzali-Ardakani, Matthew Warren Copel, James Bowler Hannon, Satoshi Oida
  • Publication number: 20180294410
    Abstract: A method of forming semiconductor elements in an artificial neural network, the method including forming a substrate including an oxide layer, forming a Silicon layer on the oxide layer, depositing a thin film dopant layer on the Silicon layer, and controlling a concentration of the dopant in the thin film dopant layer.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 11, 2018
    Inventors: Ali AFZALI-ARDAKANI, Matthew Warren COPEL, James Bowler HANNON, Satoshi OIDA
  • Publication number: 20180293487
    Abstract: A resistive element in an electrochemical artificial neural network, includes a transition metal oxide thin film forming a working electrode, a pair of first electrodes connected to the working electrode, and a reference electrode for electrochemical doping of the working electrode. The biasing of the pair of first electrodes with respect to the reference electrode according to a determination of conductivity between the pair of first electrodes controls the resistance of the working electrode.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 11, 2018
    Inventors: Matthew Warren COPEL, James Bowler Hannon, Satoshi Oida, John Jacob Yurkas
  • Publication number: 20180204970
    Abstract: Photovoltaic structures having multiple absorber layers separated by a diffusion barrier are provided. In one aspect, a method of forming an absorber on a substrate includes: depositing a first layer of light absorbing material on the substrate; depositing a diffusion barrier; depositing a second layer of light absorbing material on the diffusion barrier, wherein the first layer of light absorbing material has a different band gap from the second layer of light absorbing material; and annealing the absorber, wherein the diffusion barrier prevents diffusion of elements between the first layer of light absorbing material and the second layer of light absorbing material during the annealing. A solar cell and method for formation thereof are also provided.
    Type: Application
    Filed: January 18, 2017
    Publication date: July 19, 2018
    Inventors: Priscilla D. Antunez, Arthur W. Ellis, Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 10008618
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: June 26, 2018
    Assignee: International Business Machines Corporation
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Publication number: 20180108793
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Application
    Filed: December 18, 2017
    Publication date: April 19, 2018
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 9935214
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Grant
    Filed: October 12, 2015
    Date of Patent: April 3, 2018
    Assignee: International Business Machines Corporation
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Publication number: 20170323985
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Application
    Filed: July 25, 2017
    Publication date: November 9, 2017
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida
  • Patent number: 9711613
    Abstract: In an aspect of the present invention, a graphene field-effect transistor (GFET) structure is formed. The GFET structure comprises a wider portion and a narrow extension portion extending from the wider portion that includes one or more graphene layers edge contacted to source and drain contacts, wherein the source and drain contacts are self-aligned to the one or more graphene layers.
    Type: Grant
    Filed: November 3, 2016
    Date of Patent: July 18, 2017
    Assignee: International Business Machines Corporation
    Inventors: Aaron D. Franklin, Hiroyuki Miyazoe, Satoshi Oida, Joshua T. Smith
  • Publication number: 20170117435
    Abstract: A method for forming a back contact on an absorber layer in a photovoltaic device includes forming a two dimensional material on a first substrate. An absorber layer including Cu—Zn—Sn—S(Se) (CZTSSe) is grown over the first substrate on the two dimensional material. A buffer layer is grown on the absorber layer on a side opposite the two dimensional material. The absorber layer is exfoliated from the two dimensional material to remove the first substrate from a backside of the absorber layer opposite the buffer layer. A back contact is deposited on the absorber layer.
    Type: Application
    Filed: January 9, 2017
    Publication date: April 27, 2017
    Inventors: Richard A. Haight, James B. Hannon, Satoshi Oida