Patents by Inventor Satoshi Takita
Satoshi Takita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240124477Abstract: A novel organic compound is provided. Alternatively, an organic compound that exhibits light emission with favorable chromaticity is provided. Alternatively, an organic compound that exhibits blue light emission with favorable chromaticity is provided. Alternatively, an organic compound with favorable emission efficiency is provided. Alternatively, an organic compound having a high carrier-transport property is provided. Alternatively, an organic compound with favorable reliability is provided. An organic compound including at least one amino group in which any one of a substituted or unsubstituted dibenzofuranyl group, a substituted or unsubstituted dibenzothiophenyl group, and a substituted or unsubstituted carbazolyl group is boneded to any one of a substituted or unsubstituted naphthobisbenzofuran skeleton, a substituted or unsubstituted naphthobisbenzothiophene skeleton, and a substituted or unsubstituted naphthobenzofuranobenzothiophene skeleton is provided.Type: ApplicationFiled: October 23, 2023Publication date: April 18, 2024Applicant: Semiconductor Energy Laboratory Co., Ltd.Inventors: Kyoko Takeda, Harue Osaka, Satoshi Seo, Tsunenori Suzuki, Naoaki Hashimoto, Yusuke Takita
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Patent number: 11943944Abstract: A novel light-emitting device is provided. Alternatively, a light-emitting device having a long driving lifetime at high temperature is provided. The light-emitting device includes an anode, a cathode, and an EL layer positioned between the anode and the cathode. The EL layer includes a first layer, a second layer, a third layer, and a light-emitting layer in this order from the anode side. The first layer includes a first organic compound and a second organic compound. The second layer includes a third organic compound. The third layer includes a fourth organic compound. The light-emitting layer includes a fifth organic compound and an emission center substance. The first organic compound exhibits an electron-accepting property with respect to the second organic compound. A difference between HOMO levels of the fourth organic compound and the fifth organic compound is less than or equal to 0.24 eV.Type: GrantFiled: January 16, 2020Date of Patent: March 26, 2024Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Yusuke Takita, Tsunenori Suzuki, Naoaki Hashimoto, Takumu Okuyama, Satoshi Seo
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Patent number: 11930703Abstract: A novel organic compound is provided. An organic compound that emits light with high chromaticity is provided. An organic compound that emits blue light with high chromaticity is provided. An organic compound with high emission efficiency is provided. An organic compound having an excellent hole-transport property is provided. An organic compound having high reliability is provided. An organic compound that has a naphtho[2,3-b;7,6-b?]bisbenzofuran skeleton or a naphtho[2,3-b;7,6-b?]bisbenzothiophene skeleton and has a molecular weight of less than or equal to 5000 is provided. The present inventors have found that the organic compound is a significantly effective skeleton as a luminophor of a light-emitting element. The organic compound has high emission efficiency and exhibits favorable blue light emission; thus, a light-emitting element using the organic compound can be a blue light-emitting element with high emission efficiency.Type: GrantFiled: March 8, 2018Date of Patent: March 12, 2024Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Kyoko Takeda, Harue Osaka, Satoshi Seo, Tsunenori Suzuki, Naoaki Hashimoto, Yusuke Takita
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Patent number: 9964848Abstract: There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.Type: GrantFiled: April 13, 2015Date of Patent: May 8, 2018Assignee: FUJIFILM CorporationInventor: Satoshi Takita
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Publication number: 20150212406Abstract: There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.Type: ApplicationFiled: April 13, 2015Publication date: July 30, 2015Applicant: FUJIFILM CorporationInventor: Satoshi TAKITA
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Patent number: 9034440Abstract: There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.Type: GrantFiled: September 26, 2008Date of Patent: May 19, 2015Assignee: FUJIFILM CorporationInventor: Satoshi Takita
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Patent number: 8932800Abstract: The present invention provides a positive photosensitive resin composition including: a resin containing a specific acrylic acid-based constituent unit capable of undergoing dissociation of an acid-dissociable group to produce a carboxyl group, and a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates; and a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The present invention also provides a method for forming a cured film using the composition. The positive photosensitive composition is excellent in the sensitivity, film residual ratio and storage stability and by the method for forming a cured film using the positive photosensitive resin composition, a cured film excellent in the heat resistance, adhesion, transmittance and the like can be provided.Type: GrantFiled: November 12, 2012Date of Patent: January 13, 2015Assignee: FUJIFILM CorporationInventor: Satoshi Takita
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Patent number: 8771907Abstract: According to one embodiment, a positive photosensitive resin composition includes a resin containing a specified acrylic acid besed-structural unit which generates a carboxyl group when its dissociative group is dissociated, which resin is insoluble in alkali or sparingly soluble in alkali but when its acid-dissociative group is dissociated, becomes soluble in alkali, a resin containing a structural unit derived from a radical-polymerizable monomer containing an epoxy group, a compound containing two or more epoxy groups in its molecule, provided that the resin containing the structural unit derived from a radical-polymerizable monomer containing an epoxy group is not included in this compound, and a compound that when exposed to actinic rays of 300 nm or longer wavelength, generates an acid.Type: GrantFiled: September 27, 2010Date of Patent: July 8, 2014Assignee: FUJIFILM CorporationInventor: Satoshi Takita
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Patent number: 8329380Abstract: The present invention provides a positive photosensitive resin composition including: a resin containing a specific acrylic acid-based constituent unit capable of undergoing dissociation of an acid-dissociable group to produce a carboxyl group, and a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates; and a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The present invention also provides a method for forming a cured film using the composition. The positive photosensitive composition is excellent in the sensitivity, film residual ratio and storage stability and by the method for forming a cured film using the positive photosensitive resin composition, a cured film excellent in the heat resistance, adhesion, transmittance and the like can be provided.Type: GrantFiled: June 5, 2008Date of Patent: December 11, 2012Assignee: FUJIFILM CorporationInventor: Satoshi Takita
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Publication number: 20110229661Abstract: There are provided a positive photosensitive resin composition excellent in the sensitivity, film residual ratio and storage stability, comprising a resin containing a specific acrylic acid-based constituent unit capable of dissociating an acid-dissociable group to produce a carboxyl group, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates, a resin containing a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, and a compound capable of generating an acid upon irradiation with an actinic ray or radiation; a cured film forming method using the positive photosensitive resin composition; and a cured film excellent in the heat resistance, adhesion, transmittance and the like.Type: ApplicationFiled: September 26, 2008Publication date: September 22, 2011Applicant: C/O FUJIFILM CORPORATIONInventor: Satoshi Takita
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Publication number: 20110224250Abstract: The present invention provides a novel isoquinoline derivative which is useful as a pharmaceutical agent having a phosphodiesterase inhibitory activity.Type: ApplicationFiled: October 8, 2009Publication date: September 15, 2011Inventors: Yasushi Kohno, Satoshi Takita, Akihiko Kojima
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Publication number: 20110178041Abstract: Novel heterocyclic biaryl derivatives were disclosed which are useful as pharmaceutical agents and which exhibit a phosphodiesterase-inhibitory action. The heterocyclic biaryl derivatives are represented by the following general formula (1): wherein the Heterocycle 1 and the Heterocycle 2 are directly bonded together.Type: ApplicationFiled: September 24, 2009Publication date: July 21, 2011Inventors: Yasushi Kohno, Tatsunobu Sumiya, Satoshi Takita, Akihiko Kojima
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Publication number: 20110177302Abstract: According to one embodiment, a positive photosensitive resin composition includes a resin containing a specified acrylic acid besed-structural unit which generates a carboxyl group when its dissociative group is dissociated, which resin is insoluble in alkali or sparingly soluble in alkali but when its acid-dissociative group is dissociated, becomes soluble in alkali, a resin containing a structural unit derived from a radical-polymerizable monomer containing an epoxy group, a compound containing two or more epoxy groups in its molecule, provided that the resin containing the structural unit derived from a radical-polymerizable monomer containing an epoxy group is not included in this compound, and a compound that when exposed to actinic rays of 300 nm or longer wavelength, generates an acid.Type: ApplicationFiled: September 27, 2010Publication date: July 21, 2011Applicant: FUJIFILM CorporationInventor: Satoshi TAKITA
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Publication number: 20100173246Abstract: The present invention provides a positive photosensitive resin composition including: a resin containing a specific acrylic acid-based constituent unit capable of undergoing dissociation of an acid-dissociable group to produce a carboxyl group, and a constituent unit having a functional group capable of reacting with the carboxyl group to form a covalent bond, the resin being alkali-insoluble or sparingly alkali-soluble and becoming alkali-soluble when the acid-dissociable group dissociates; and a compound capable of generating an acid upon irradiation with an actinic ray or radiation. The present invention also provides a method for forming a cured film using the composition. The positive photosensitive composition is excellent in the sensitivity, film residual ratio and storage stability and by the method for forming a cured film using the positive photosensitive resin composition, a cured film excellent in the heat resistance, adhesion, transmittance and the like can be provided.Type: ApplicationFiled: June 5, 2008Publication date: July 8, 2010Applicant: FUJIFILM CORPORATIONInventor: Satoshi Takita
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Publication number: 20100160335Abstract: It is to provide a novel pyridazinone derivative represented by the following general formula (1), which is useful as a pharmaceutical and has a phosphodiesterase inhibitory action: wherein R1 represents H or C1-6 alkyl, each of R2 and R3 represents H, X, C1-6 alkoxy, Z represents O or S, and A represents AA or BB, wherein AA represents: and BB represents: wherein R4 represents H or C1-6 alkyl, and each of R5 and R6 represents C1-6 alkyl.Type: ApplicationFiled: June 18, 2008Publication date: June 24, 2010Inventors: Yasushi Kohno, Koji Ochiai, Satoshi Takita, Akihiko Kojima, Tomohiko Eiraku, Tetsuya Kishi
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Publication number: 20100130738Abstract: It is to provide a novel pyrazolone derivative represented by the following general formula (1), which is useful as a pharmaceutical and has a phosphodiesterase inhibitory action: wherein R1,R2: C1-6 alkyl; R3,R4: H, X, C1-6 alkoxy; Z:O, S; A:AA, BB, wherein AA represents wherein BB represents wherein R5: H, C1-6 alkyl; R6,R7: C1-6 alkyl.Type: ApplicationFiled: June 18, 2008Publication date: May 27, 2010Inventors: Yasushi Kohno, Koji Ochiai, Satoshi Takita, Tetsuya Kishi
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Publication number: 20100119973Abstract: A positive photosensitive resin composition, includes: (A) a resin containing an acid-dissociable group having a specific acetal structure as defined in the specification, which is alkali-insoluble or sparingly alkali-soluble and becomes alkali-soluble when the acid-dissociable group is dissociated; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a crosslinking agent; and (D) an adhesion aid, and a cured film forming method uses the same.Type: ApplicationFiled: March 27, 2008Publication date: May 13, 2010Applicant: FUJIFILM CORPORATIONInventor: Satoshi Takita
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Publication number: 20090318385Abstract: A novel pyrazolopyridine derivative is provided which is useful as a pharmaceutical drug having phosphodiesterase inhibitory activity. The pyrazolopyridine derivative is represented by the following general formula (1): [wherein R1 is a hydrogen atom, an optionally substituted alkyl group having 1 to 6 carbon atoms, or the like, R2 is an optionally substituted alkyl group having 1 to 6 carbon atoms or the like, R5 and R6 are independently a hydrogen atom or a halogen atom, R13 is a hydrogen atom or a halogen atom, n is 0 or 1, is a single or double bond, R3 is a hydrogen atom, a hydroxyl group, or the like, and R4 is a hydrogen atom, a phenyl group, or the like] or a pharmaceutically acceptable salt thereof, and a hydrate thereof.Type: ApplicationFiled: September 5, 2007Publication date: December 24, 2009Inventors: Yasushi Kohno, Satoshi Takita, Akihiko Kojima, Tetsuya Kishi
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Patent number: 6114089Abstract: A positive working photosensitive lithographic printing plate comprising an aluminum substrate and a positive working photosensitive layer, the aluminum substrate having been anodized and rendered water-wettable, wherein an intermediate layer containing a polymer comprising (A) a unit interacting with an alumina layer and (B) a unit interacting with a water-wettable layer is provided between the aluminum substrate and the photosensitive layer. The photosensitive layer and the water-wettable aluminum substrate have good adhesion so that the printing plate has a satisfactory press life.Type: GrantFiled: April 7, 1998Date of Patent: September 5, 2000Assignee: Fuji Photo Film Co., Ltd.Inventors: Satoshi Takita, Mitsuhiro Imaizumi, Keiji Akiyama, Seiji Uno, Shiro Tan
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Patent number: 6037098Abstract: Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and a compound represented by formula (Ia) or (Ib) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.3 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.4, where R.sub.4 represents an alkyl group or an aryl group; X.sup.- represents the specific anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid; and l, m, and n represents an integer of 1 to 3.Type: GrantFiled: March 30, 1998Date of Patent: March 14, 2000Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshiaki Aoai, Satoshi Takita