Abstract: Provided is a robot arranged in a housing, the robot including: a first movable portion; a second movable portion having a hand holding a wafer; and a control unit which controls the first movable portion and the second movable portion so as to convey the wafer in a state where the wafer held by the hand is located inside an operation region defined in a space between a front wall and a back wall so as not to overlap an open/close region for a cassette opener, which is provided at a position corresponding to an opening of the front wall, to open and close a cassette, and to cause the hand to access the opening of the front wall in a state where the hand is parallel to a horizontal plane.

Abstract: Provided is a robot including: a first movable portion which has a first arm having a proximal end side connected to a first base and a second arm having a proximal end side connected to a distal end side of the first arm; a second movable portion which has a second base having a proximal end side connected to a distal end side of the second arm, a third arm having a proximal end side connected to a distal end side of the second base, and a hand having a proximal end side connected to a distal end side of the third arm and holding a wafer; and a control unit, and a width, in a direction perpendicular to the vertical plane, of a trajectory of the first movable portion falls within a width, in the direction perpendicular to the vertical plane, of a trajectory of the wafer.

Abstract: Provided is a system including: a housing having a front wall including a plurality of openings for access to a cassette storing a wafer and a back wall facing the front wall; and a robot arranged in the housing, in which the robot has a first base, a first movable portion, a second movable portion having a hand holding the wafer, and a control unit which controls the first movable portion and the second movable portion, and the plurality of openings are positioned in a maximum accessible region of the hand determined based on a position where the robot is arranged in the housing, a length of the first movable portion in a state where the first movable portion is maximally extended, and a length of the second movable portion in a state where the second movable portion is maximally extended.

Abstract: An optical system (LS) has a lens (L11) that satisfies the following conditional expressions. - 0.01 < ndLZ - ( 2.015 - 0.0068 × vdLZ ) 50. < vdLZ < 65. 0.545 < ? ? gFLZ - 0.01 < ? ? gFLZ - ( 0.6418 - 0.00168 × vdLZ ) where ndLZ is the refractive index to the d line of the lens, vdLZ is the Abbe number with respect to the d line of the lens, and ?gFLZ is the partial dispersion ratio of the lens.

Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

Abstract: The onium salt is capable of generating an acid with controlled diffusion, a chemically amplified positive resist composition comprising the onium salt. The onium salt contains a fluorinated alkanesulfonic acid anion having an alkyl or fluoroalkyl group and an iodized aromatic ring generates an acid with controlled diffusion. A chemically amplified positive resist composition comprising the onium salt is also provided.

Abstract: A resist composition comprising a base polymer, a photoacid generator, and a quencher is provided. The base polymer contains a polymer comprising phenolic hydroxy-containing units, aromatic ring-containing units, and units containing a phenolic hydroxy group protected with an acid labile group. A resist film is processed into a pattern of satisfactory profile exhibiting a high resolution, reduced LER, and rectangularity while the influence of residue defects is restrained.

Abstract: An optical system (LS) has a lens (L11) that satisfies the following conditional expressions. ?0.010<ndLZ?(2.015?0.0068×?dLZ) 50.00<?dLZ<65.00 0.545<?gFLZ ?0.010<?gFLZ?(0.6418?0.00168×?dLZ) where ndLZ is the refractive index to the d line of the lens, ?dLZ is the Abbe number with respect to the d line of the lens, and ?gFLZ is the partial dispersion ratio of the lens.

Abstract: In an adjustment assistance system, an image acquisition part acquires an image captured by a camera. The camera is provided on a car which runs in a hoistway of an elevator. A presentation part indicates on a surface thereof a calibration pattern to be captured by the camera in the hoistway. A detection part detects the calibration pattern in an image acquired by the image acquisition part. An attitude calculation part calculates an attitude of the camera based on an inclination, with respect to an optical axis of the camera, of a normal line to the surface of the presentation part indicating the calibration pattern detected by the detection part.

Abstract: A flush toilet includes a toilet main body and a tank device for supplying flush water to the toilet main body, where the tank device includes a storage tank provided behind the toilet main body and above a floor surface, the storage tank includes a large tank section and a small tank section and has an asymmetrical shape in a front-back or left-right direction, the large tank section being a large-capacity side of the storage tank that is divided into two at a center in the left-right direction when seen in the front-back direction, the small tank section being a small-capacity side of the storage tank that is divided into two at the center in the left-right direction, and the storage tank or the toilet main body includes a deformation-preventing supporting member for preventing deformation of the storage tank by supporting the storage tank.

Abstract: A media processing apparatus includes a slit insertable a sheet bundle of multiple sheets, a sheet-bundle holder, a liquid applier, a press binder, and a controller. The sheet-bundle holder holds the sheet bundle and detects the thickness of the sheet bundle. The liquid applier applies liquid to the sheet bundle. The press binder presses and binds the sheet bundle to perform press-binding process. The controller causes the sheet-bundle holder to hold the sheet bundle and detect the thickness of the sheet bundle, determines whether to cause the liquid applier to apply liquid to the sheet bundle based on the thickness of the sheet bundle, causes the liquid applier to apply the liquid to the sheet bundle when it is determined that the thickness of the sheet bundle is equal or larger than a prescribed thickness, and causes the press binder to press and bind the sheet bundle.

Abstract: An acetal modifier affording a group having an oxygen or sulfur-containing cyclic saturated heterocycle serving as a protective group for an aliphatic or aromatic hydroxy group is provided as well as a polymer adapted to turn alkali soluble as a result of deprotection under the action of acid, the polymer comprising repeat units A1 having on side chain a structure including an aromatic hydroxy group protected with an acid labile group. A chemically amplified positive resist composition comprising the polymer is also provided.

Abstract: A refractive index distribution generation device includes a processor and a memory. The processor performs a refractive index distribution generation process of generating a refractive index distribution corresponding to a processing-target image. The refractive index distribution generation process includes an input process of inputting, from the memory, the processing-target image, first refractive index information indicating a refractive index of a first structure, and second refractive index information indicating a refractive index of a second structure different from the first structure, and a setting process of setting respective refractive indexes that constitute a refractive index distribution.

Abstract: A chemically amplified positive resist composition is provided comprising a polymer comprising repeat units having a phenolic hydroxy group protected with a tertiary ether type acid labile group and an acid generator capable of generating a fluorinated aromatic sulfonic acid. A resist pattern with a high resolution, reduced LER, rectangularity, minimized influence of develop loading, and few development residue defects can be formed.

Abstract: The chemically amplified negative resist composition has improved in resolution during pattern formation, which can form a resist pattern having improved LER, fidelity, and dose margin. The chemically amplified negative resist composition comprises a polymer comprising repeat units derived from a monomer having a dehydrating functional group is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER, fidelity, and dose margin.

Abstract: A sheet discharge device includes a discharge tray that accommodates a discharged sheet with an end portion on an upstream side along a discharging direction of the sheet abutting against a wall surface and a plurality of exhaust passages that are provided in the wall surface of the discharge tray and that are inclined to extend outward of both end portions along a width direction intersecting the discharging direction of the sheet toward a lower side of the wall surface.

Abstract: A chemically amplified negative resist composition comprising (A) a sulfurane or selenurane compound having formula (A1) wherein M is sulfur or selenium and (B) a base polymer containing a polymer comprising repeat units having formula (B1) is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER or LWR.

Abstract: A chemically amplified positive resist composition is provided comprising (A) a sulfurane or selenurane compound having formula (A1) wherein M is sulfur or selenium and (B) a base polymer containing a polymer comprising repeat units having formula (B1). The resist composition exhibits a high resolution during pattern formation and forms a pattern with improved LER and CDU.

Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and an aromatic carboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.

Abstract: A chemically amplified positive resist composition is provided comprising (A) a quencher containing an onium salt having a nitrogen-containing aliphatic heterocycle and an aromatic carboxylic acid structure in its anion and (B) a base polymer containing a specific polymer which is decomposed under the action of acid to increase its solubility in alkaline developer. The resist composition exhibits a high resolution during pattern formation and forms a pattern of rectangular profile with improved LER, fidelity and dose margin.