Patents by Inventor Satoyuki Chikaoka

Satoyuki Chikaoka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product
    Patent number: 11667609
    Abstract: Provided is a compound, which is represented by the following general formula (1): where X1 and X2 each independently represent an acrylic group or a methacrylic group, R1 to R8 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, and “n” represents an integer of from 1 to 10.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: June 6, 2023
    Assignees: ADEKA CORPORATION, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Hideyuki Otsuka, Daisuke Aoki, Daisuke Sawamoto, Atsushi Kobayashi, Satoyuki Chikaoka
  • NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT
    Publication number: 20220153698
    Abstract: Provided is a compound, which is represented by the following general formula (1): where X1 and X2 each independently represent an acrylic group or a methacrylic group, R1 to R8 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 6 carbon atoms, and “n” represents an integer of from 1 to 10.
    Type: Application
    Filed: February 20, 2020
    Publication date: May 19, 2022
    Applicants: ADEKA CORPORATION, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Hideyuki OTSUKA, Daisuke AOKI, Daisuke SAWAMOTO, Atsushi KOBAYASHI, Satoyuki CHIKAOKA
  • Aromatic sulfonium compounds, photoacid generators comprising the same, photopolymerizable compositions containing the same, stereolithographic resin compositions, and stereolithographic process
    Patent number: 6368769
    Abstract: Novel aromatic sulfonium compounds of general formula (I), photoacid generators comprising the same, and photopolymerizable compositions containing the same, capable of providing stereolithographic resin compositions which do not suffer from the hindrance to curing by oxygen, can easily give shaped articles having desired sizes by virtue of the high accuracy thereof in curing, and can attain a satisfactory curing depth owing to the high sensitivity thereof for radiant energy; and a stereolithographic process.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: April 9, 2002
    Assignee: Asahi Denki Kogyo Kabushiki Kaisha
    Inventors: Kazuo Ohkawa, Hiroyuki Tachikawa, Satoyuki Chikaoka
  • Energy beam curable epoxy resin composition
    Patent number: 6319652
    Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance,(2) energybeam sensitive cation polymerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: November 20, 2001
    Assignee: Asahi Kogaku Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka
  • Stereolithographic resin composition and stereolithographic method
    Patent number: 6130025
    Abstract: The stereolithographic resin composition comprising,(1)a catinically polymerizing organic compound, (2)an energy beam sensitive cationic polymerization initiator, and (3)a thermoplastic polymer compound which uniformly dissolves in said resin composition was provided. Therefore, the process for optical solid molding, which enabled the production of highly precise solid shape, was provided using said resin composition.
    Type: Grant
    Filed: November 12, 1997
    Date of Patent: October 10, 2000
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Satoyuki Chikaoka, Kazuo Ohkawa
  • Energy beam curable epoxy resin composition, stereolithographic resin composition and stereolithographic method
    Patent number: 5985510
    Abstract: The energy beam curable epoxy resin composition comprising as essential components, (1) specific cationically polymerizing organic substance, (2) energybeam sensitive cation polimerization initiator, (3) cationically polymerizing organic substance except for the specific cationically polymerizing organic substance, described above, (4) radically polymerizing organic compound, and (5) energy beam sensitive radical polymerization initiator. The cured articles resulted from said resin composition, have superior properties and particularlly superior dimensional stability on humidity absorption. Therefore, a stereolithographic resin composition and a stereolithographic method are also provided.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: November 16, 1999
    Assignee: Asahi Denka Kogyo Kabushiki Kaisha
    Inventors: Mitsuo Akutsu, Tetsuyuki Nakayashiki, Hiroyuki Tachikawa, Kazuo Ohkawa, Satoyuki Chikaoka