Patents by Inventor Satya V. Nitta
Satya V. Nitta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11868789Abstract: A data management server computer (“server”) is disclosed. The server receives action data associated with one or more users identifying a plurality of actions performed through one or more computer devices in a multi-modal networked environment, identifies useful sequences of actions as compound actions, and generates deep links representing the compound actions as UI elements which when invoked cause execution of the represented compound actions.Type: GrantFiled: November 30, 2021Date of Patent: January 9, 2024Assignee: Merlyn Mind, Inc.Inventors: Ravindranath Kokku, Aditya Vempaty, Sharad Sundararajan, Satya V. Nitta, Latha Ramanan, Juan Ernesto Penarrieta Cornejo, Rajkumar Chandrasekaran, Helene Alonso, Paul V. Haley, Tamer Abuelsaad, Prasenjit Dey
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Publication number: 20230069549Abstract: A data management server computer (“server”) is disclosed. The server receives action data associated with one or more users identifying a plurality of actions performed through one or more computer devices in a multi-modal networked environment, identifies useful sequences of actions as compound actions, and generates deep links representing the compound actions as UI elements which when invoked cause execution of the represented compound actions.Type: ApplicationFiled: November 30, 2021Publication date: March 2, 2023Inventors: RAVINDRANATH KOKKU, ADITYA VEMPATY, SHARAD SUNDARARAJAN, SATYA V. NITTA, LATHA RAMANAN, JUAN ERNESTO PENARRIETA CORNEJO, RAJKUMAR CHANDRASEKARAN, HELENE ALONSO, PAUL V. HALEY, TAMER ABUELSAAD, PRASENJIT DEY
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Patent number: 11288443Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.Type: GrantFiled: November 19, 2019Date of Patent: March 29, 2022Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Publication number: 20220012413Abstract: A meeting summarization method, system, and computer program product, include compiling notes from a meeting between a plurality of users and providing a single document that summarizes the meeting based on the compiled notes.Type: ApplicationFiled: September 23, 2021Publication date: January 13, 2022Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Publication number: 20200211406Abstract: A room and activity management server computer (“server”) and processing methods are disclosed. In some embodiments, the server is programmed to manage multi-role activities collaboratively performed by multiple participants in a physical room with multiple media communications. For each activity, the server is configured to assign roles to participants and enforce rules that govern how the participants in given roles interact with one another or engage with the room at given times. In enforcing the rules, the server is programmed to improve such interaction and engagement through multimedia communications.Type: ApplicationFiled: January 2, 2019Publication date: July 2, 2020Inventors: RAVINDRANATH KOKKU, JIEHUA LI, AMOL NAYATE, SATYA V. NITTA, SEAN O'HARA, SHOM PONOTH, SHARAD SUNDARARAJAN
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Patent number: 10592599Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.Type: GrantFiled: May 31, 2018Date of Patent: March 17, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Publication number: 20200081966Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.Type: ApplicationFiled: November 19, 2019Publication date: March 12, 2020Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Patent number: 10192781Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: GrantFiled: February 26, 2016Date of Patent: January 29, 2019Assignee: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Patent number: 10089290Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.Type: GrantFiled: October 17, 2017Date of Patent: October 2, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Publication number: 20180276192Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.Type: ApplicationFiled: May 31, 2018Publication date: September 27, 2018Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Publication number: 20180060289Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.Type: ApplicationFiled: October 17, 2017Publication date: March 1, 2018Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Patent number: 9875225Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.Type: GrantFiled: August 29, 2016Date of Patent: January 23, 2018Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
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Patent number: 9673087Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: GrantFiled: September 6, 2015Date of Patent: June 6, 2017Assignee: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Publication number: 20170140669Abstract: A method, system and computer program product are disclosed for performing a virtual experiment using one or more mobile communications devices. In the virtual experiment, one or more users tangibly manipulate one or more mobile devices to simulate an experiment. Each of the mobile devices includes sensors, and these sensors sense a set of parameters of the mobile devices and generate parameter signals. In an embodiment, the method includes processing the parameter signals according to a set of rules to generate processed signals; and using the processed signals to generate a display on one or more of the mobile devices to show features of the simulated experiment. In embodiments of the invention, the method further comprises authoring content for the experiment including declaratively creating the content for the experiment and an associated effect of the content on the experiment to create an experiment manifest.Type: ApplicationFiled: November 13, 2015Publication date: May 18, 2017Inventors: Prasenjit Dey, Mukesh K. Mohania, Satya V. Nitta, Nitendra Rajput
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Patent number: 9613851Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: GrantFiled: September 6, 2015Date of Patent: April 4, 2017Assignee: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Publication number: 20160197002Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: ApplicationFiled: September 6, 2015Publication date: July 7, 2016Applicant: International Business Machines CorporationInventors: Satya V. NITTA, Shom Ponoth
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Publication number: 20160181144Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: ApplicationFiled: February 26, 2016Publication date: June 23, 2016Applicant: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Patent number: 9305882Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: GrantFiled: April 9, 2011Date of Patent: April 5, 2016Assignee: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Patent number: 9263391Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: GrantFiled: April 19, 2011Date of Patent: February 16, 2016Assignee: International Business Machines CorporationInventors: Satya V. Nitta, Shom Ponoth
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Publication number: 20160027686Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.Type: ApplicationFiled: September 6, 2015Publication date: January 28, 2016Applicant: International Business Machines CorporationInventors: Satya V. NITTA, Shom Ponoth