Patents by Inventor Satya V. Nitta

Satya V. Nitta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11868789
    Abstract: A data management server computer (“server”) is disclosed. The server receives action data associated with one or more users identifying a plurality of actions performed through one or more computer devices in a multi-modal networked environment, identifies useful sequences of actions as compound actions, and generates deep links representing the compound actions as UI elements which when invoked cause execution of the represented compound actions.
    Type: Grant
    Filed: November 30, 2021
    Date of Patent: January 9, 2024
    Assignee: Merlyn Mind, Inc.
    Inventors: Ravindranath Kokku, Aditya Vempaty, Sharad Sundararajan, Satya V. Nitta, Latha Ramanan, Juan Ernesto Penarrieta Cornejo, Rajkumar Chandrasekaran, Helene Alonso, Paul V. Haley, Tamer Abuelsaad, Prasenjit Dey
  • Publication number: 20230069549
    Abstract: A data management server computer (“server”) is disclosed. The server receives action data associated with one or more users identifying a plurality of actions performed through one or more computer devices in a multi-modal networked environment, identifies useful sequences of actions as compound actions, and generates deep links representing the compound actions as UI elements which when invoked cause execution of the represented compound actions.
    Type: Application
    Filed: November 30, 2021
    Publication date: March 2, 2023
    Inventors: RAVINDRANATH KOKKU, ADITYA VEMPATY, SHARAD SUNDARARAJAN, SATYA V. NITTA, LATHA RAMANAN, JUAN ERNESTO PENARRIETA CORNEJO, RAJKUMAR CHANDRASEKARAN, HELENE ALONSO, PAUL V. HALEY, TAMER ABUELSAAD, PRASENJIT DEY
  • Patent number: 11288443
    Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: March 29, 2022
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Publication number: 20220012413
    Abstract: A meeting summarization method, system, and computer program product, include compiling notes from a meeting between a plurality of users and providing a single document that summarizes the meeting based on the compiled notes.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Publication number: 20200211406
    Abstract: A room and activity management server computer (“server”) and processing methods are disclosed. In some embodiments, the server is programmed to manage multi-role activities collaboratively performed by multiple participants in a physical room with multiple media communications. For each activity, the server is configured to assign roles to participants and enforce rules that govern how the participants in given roles interact with one another or engage with the room at given times. In enforcing the rules, the server is programmed to improve such interaction and engagement through multimedia communications.
    Type: Application
    Filed: January 2, 2019
    Publication date: July 2, 2020
    Inventors: RAVINDRANATH KOKKU, JIEHUA LI, AMOL NAYATE, SATYA V. NITTA, SEAN O'HARA, SHOM PONOTH, SHARAD SUNDARARAJAN
  • Patent number: 10592599
    Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: March 17, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Publication number: 20200081966
    Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.
    Type: Application
    Filed: November 19, 2019
    Publication date: March 12, 2020
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Patent number: 10192781
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: January 29, 2019
    Assignee: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Patent number: 10089290
    Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: October 2, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Publication number: 20180276192
    Abstract: A meeting summarization method, system, and computer program product, include capturing notes of a user including a time stamp from the user associated with a meeting, synchronizing an agenda of the meeting and the notes of the user based on a correlation between a time stamp of a topic on the agenda and a time stamp of the notes of the user, and analyzing the synchronized topic and the notes to determine highlights of the meeting based on a co-occurrence of the time stamp of the notes of the user and the time stamp of the topic on the agenda.
    Type: Application
    Filed: May 31, 2018
    Publication date: September 27, 2018
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Publication number: 20180060289
    Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.
    Type: Application
    Filed: October 17, 2017
    Publication date: March 1, 2018
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Patent number: 9875225
    Abstract: A meeting summarization method, system, and computer program product, include recording meeting audio of a meeting, capturing notes including a time stamp from each of a plurality of users associated with the meeting, synchronizing the recorded meeting audio of the meeting and each of the notes of each of the plurality of users based on a correlation between the time stamp, and analyzing the synchronized meeting audio and notes to determine highlights of the meeting based on a co-occurrence of notes between the plurality of users.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: January 23, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Keith William Grueneberg, Jason Crawford, Jonathan Lenchner, Satya V. Nitta, Christian Makaya, Sharad C. Sundararajan
  • Patent number: 9673087
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Grant
    Filed: September 6, 2015
    Date of Patent: June 6, 2017
    Assignee: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Publication number: 20170140669
    Abstract: A method, system and computer program product are disclosed for performing a virtual experiment using one or more mobile communications devices. In the virtual experiment, one or more users tangibly manipulate one or more mobile devices to simulate an experiment. Each of the mobile devices includes sensors, and these sensors sense a set of parameters of the mobile devices and generate parameter signals. In an embodiment, the method includes processing the parameter signals according to a set of rules to generate processed signals; and using the processed signals to generate a display on one or more of the mobile devices to show features of the simulated experiment. In embodiments of the invention, the method further comprises authoring content for the experiment including declaratively creating the content for the experiment and an associated effect of the content on the experiment to create an experiment manifest.
    Type: Application
    Filed: November 13, 2015
    Publication date: May 18, 2017
    Inventors: Prasenjit Dey, Mukesh K. Mohania, Satya V. Nitta, Nitendra Rajput
  • Patent number: 9613851
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Grant
    Filed: September 6, 2015
    Date of Patent: April 4, 2017
    Assignee: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Publication number: 20160197002
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Application
    Filed: September 6, 2015
    Publication date: July 7, 2016
    Applicant: International Business Machines Corporation
    Inventors: Satya V. NITTA, Shom Ponoth
  • Publication number: 20160181144
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Application
    Filed: February 26, 2016
    Publication date: June 23, 2016
    Applicant: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Patent number: 9305882
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Grant
    Filed: April 9, 2011
    Date of Patent: April 5, 2016
    Assignee: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Patent number: 9263391
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Grant
    Filed: April 19, 2011
    Date of Patent: February 16, 2016
    Assignee: International Business Machines Corporation
    Inventors: Satya V. Nitta, Shom Ponoth
  • Publication number: 20160027686
    Abstract: A dual damascene article of manufacture comprises a trench containing a conductive metal column where the trench and the conductive metal column extend down into and are contiguous with a via. The trench and the conductive metal column and the via have a common axis. These articles comprise interconnect structures incorporating air-gap spacers containing metal/insulator structures for Very Large Scale Integrated (VLSI) and Ultra Large Scale Integrated (ULSI) devices and packaging. The trench in this regard comprises a sidewall air-gap immediately adjacent the side walls of the trench and the conductive metal column, the sidewall air-gap extending down to the via to a depth below a line fixed by the bottom of the trench, and continues downward in the via for a distance of from about 1 Angstrom below the line to the full depth of the via. In another aspect, the article of manufacture comprises a capped dual damascene structure.
    Type: Application
    Filed: September 6, 2015
    Publication date: January 28, 2016
    Applicant: International Business Machines Corporation
    Inventors: Satya V. NITTA, Shom Ponoth