Patents by Inventor Satyajit Shinde

Satyajit Shinde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9831098
    Abstract: Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming an isolation trench between two fin structures on an integrated circuit substrate, forming a flowable film in the isolation trench using a flowable chemical vapor deposition process, and annealing the flowable film to form a silicon oxide dielectric layer in the isolation trench. The annealing is performed at a temperature of less than about 200° C. with a process gas including N2 and H2O2.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: November 28, 2017
    Assignee: GLOBALFOUNDRIES, INC.
    Inventors: Xinyuan Dou, Sukwon Hong, Satyajit Shinde, Sandeep Gaan, Tao Han, Carlos Chacon, Shimpei Yamaguchi
  • Publication number: 20170018452
    Abstract: Methods for fabricating integrated circuits are provided. In one example, a method for fabricating an integrated circuit includes forming an isolation trench between two fin structures on an integrated circuit substrate, forming a flowable film in the isolation trench using a flowable chemical vapor deposition process, and annealing the flowable film to form a silicon oxide dielectric layer in the isolation trench. The annealing is performed at a temperature of less than about 200° C. with a process gas including N2 and H2O2.
    Type: Application
    Filed: July 13, 2015
    Publication date: January 19, 2017
    Inventors: Xinyuan Dou, Sukwon Hong, Satyajit Shinde, Sandeep Gaan, Tao Han, Carlos Chacon, Shimpei Yamaguchi