Patents by Inventor Satyajit Verma

Satyajit Verma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5994455
    Abstract: A process for the preparation of polyoxymethylene copolymers, wherein 1,3,5-trioxane is polymerized with generally known comonomers in the presence of a strong protonic acid initiator and in the presence of a formaldehyde dialkyl acetal, and wherein the initiator is dissolved in the formaldehyde dialkyl acetal before admixing to the trioxane and the comonomers.
    Type: Grant
    Filed: September 8, 1998
    Date of Patent: November 30, 1999
    Assignee: Ticonna GmbH
    Inventors: Karl-Friedrich Muck, Horst Roschert, Robert M. Gronner, Satyajit Verma, Michael G. Yearwood
  • Patent number: 5962623
    Abstract: A continuous process for the preparation of polyacetal copolymers from 1,3,5-trioxane and the comonomers known for this purpose using strong protic acids as an initiator, in which the initiator is added in an amount of 0.01 to 0.6 ppm, based on the total amount of monomers, in finely divided form to the monomer mixture, after the polymerization step the crude polymer is transferred from the polymerization reactor to a mixing unit without further intermediate steps, excess monomer is removed from the crude polymer in the mixing unit or between polymerization reactor and mixing unit by applying reduced pressure and, if desired, generally customary stabilizers, assistants, fillers, reinforcing materials and/or colorants are incorporated into the polymer in the mixing unit.
    Type: Grant
    Filed: September 8, 1998
    Date of Patent: October 5, 1999
    Assignee: Ticona GmbH
    Inventors: Peter Eckardt, Michael Hoffmockel, Karl-Friedrich Muck, Gerhard Reuschel, Satyajit Verma, Michael G. Yearwood
  • Patent number: 5024897
    Abstract: Compositions comprising polyamides, polyolefins and ethylene vinyl alcohol copolymers useful as compatibilizers, related processes and articles made therefrom. A composition comprising from 50 to 99.4 percent by weight of a polyolefin, from 0.5 to 50 percent by weight of a polyamide, from 0.1 to 10 percent by weight of an ethylene vinyl alcohol copolymer comprising from 50 to 95 mole percent ethylene groups and from 5 to 50 mole percent vinyl alcohol groups and less than 5.0 mole percent and preferably less than 2.0 mole percent unhydrolyzed vinyl acetate groups.
    Type: Grant
    Filed: May 2, 1990
    Date of Patent: June 18, 1991
    Assignee: Allied-Signal Inc.
    Inventors: Charles D. Mason, William Sacks, Theodore R. Engelmann, Satyajit Verma
  • Patent number: 4950515
    Abstract: Compositions comprising polyamides, polyolefins and ethylene vinyl alcohol copolymers useful as compatabilizers, related processes and articles made therefrom. A composition comprising from 50 to 99.4 percent by weight of a polyolefin, from 0.5 to 50 percent by weight of polyamide, from 0.1 to 10 percent by weight of an ethylene vinyl alcohol copolymer comprising from 50 to 95 mole percent ethylene groups and from 5 to 59 mole percent vinyl alcohol groups and less than 5.0 mole percent and preferably less than 2.0 mole percent unhydrolyzed vinyl acetate groups.
    Type: Grant
    Filed: February 7, 1989
    Date of Patent: August 21, 1990
    Assignee: Allied-Signal Inc.
    Inventors: Charles D. Mason, William Sacks, Theodore R. Engelmann, Satyajit Verma
  • Patent number: RE39182
    Abstract: A process for the preparation of polyoxymethylene copolymers, wherein 1,3,5-trioxane is polymerized with generally known comonomers in the presence of a strong protonic acid initiator and in the presence of a formaldehyde dialkyl acetal, and wherein the initiator is dissolved in the formaldehyde dialkyl acetal before admixing to the trioxane and the comonomers.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: July 11, 2006
    Assignee: Ticona GmbH
    Inventors: Karl-Friedrich Mück, Horst Röschert, Robert M. Gronner, Satyajit Verma, Michael G. Yearwood