Abstract: Some embodiments of the invention include a synthetic biocidal surface comprising an array of disordered nanospikes. The biocidal surface may be lethal to cells on said surface due to piercing of cell membranes by said nanospikes. Some embodiments may include a method of producing a synthetic biocidal surface comprising an array of disordered nanospikes that may include exposing a silicon comprising substrate surface to reactive-ion etching.

Abstract: Some embodiments of the invention include a synthetic biocidal surface comprising an array of disordered nanospikes. The biocidal surface may be lethal to cells on said surface due to piercing of cell membranes by said nanospikes. Some embodiments may include a method of producing a synthetic biocidal surface comprising an array of disordered nanospikes that may include exposing a silicon comprising substrate surface to reactive-ion etching.

Abstract: The invention relates to materials that exhibit biocidal activity and in particular to surfaces that exhibit novel surface topography that is lethal to cells on contact. The invention also relates to devices comprising such surfaces, to methods of producing the surfaces and to methods of eliminating or reducing cellular survival wherein cells are exposed to the surfaces. In particular the invention relates to a synthetic biocidal surface comprising an array of nanospikes that are lethal to cells on said surface due to piercing of cell membranes by said nanospikes and to a method of producing a synthetic biocidal surface comprising an array of nanospikes that are lethal to cells on said surface due to piercing of cell membranes by said nanospikes, which comprises exposing a silicon comprising substrate surface to reactive-ion etching.

Abstract: An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle beam of ions or electrons; a sample holder mounted relative to the charged particle source to hold a sample in the charged particle beam for the imaging or fabrication; and an optical source system configured to generate an optical beam, wherein the optical source system is mounted relative to the sample holder to direct the optical beam onto the sample to modify an electric charge of the sample during the imaging or fabrication to improve spatial resolution of the imaging or fabrication.

Abstract: A method of 3D holographic recording by using a very simple optical system includes dividing a femto-second laser pulse into a plurality of light beams by a diffraction beam splitter, focusing four light beams selected from the divided plurality of light beams, controlling each optical phase of the selected four light beams by a phase retarder, and further focusing these four light beams into a sample comprised of a photosensitive material capable of multi-photon exposure so that the photosensitive material is exposed to the interference among the four light beams and multi-photon absorption in the sample is induced, thus recording a 3D phase hologram on the irradiated portion of the sample.

Abstract: A high-luminance quantum correlation photon beam generator in which a laser light source (1) emits a laser pumped light and a parametric crystal (2) generates a pair of two photons of a signal photon and an idler photon on receiving the pumped light to emit two photon beams. Further, a beam splitter (5) splits a signal photon beam (6) from an idler photon beam (7), a mode inverter (10) rotates one of the signal photon beam, (6) and the idler photon beam (7) 180° around its geometric center, a phase adjusting means (8) adjusts phases of the signal photon beam (6) and the idler photon beam (7) based on an optical time delay, and a beam coupling means (14) overlays the signal photon beam (6) with the idler photon beam (7) in a common-line polarized annular shape by the mode inverter (10) to bring them into a quantum correlated state.

Abstract: A laser processing method and apparatus capable of forming an extremely minute modified area not exceeding half the diffraction limit value of the laser wavelength used for processing without causing plasma in a processing object such as a dielectric material substrate or semiconductor material substrate. In this technology, attention is paid to the fact that new damage is caused even at laser intensity that does not cause plasma at all, and a laser beam (1) that has lower laser intensity than the laser intensity threshold at which plasma occurs (for example, approximately 1/1.5 of that laser intensity threshold) is convergently radiated into a processing object (10) using an irradiation optical system (20) accuracy-designed so as not to cause a self-focusing effect at the convergence location (3).

Abstract: A micro-fabrication method characterized by comprising the steps of applying a pulse laser beam to a plastic material to be processed exhibiting a glass phase transition by heating and having a heat-shrinkage to form laser-processed patterns on the surface of or in the above plastic material to be processed, and then heat-treating the plastic material to be processed at a temperature not lower than a glass transition temperature Tg to fine the formed patterns by heat-shrinkage.

Abstract: A high-luminance quantum correlation photon beam generator a photon beam of a quantum correlated pair characterized by includes: a laser light source (1) operable to emit a laser pumped light; a parametric crystal (2) operable to generate a pair of two photons of a signal photon and an idler photon on receiving the pumped light from the laser light source (1) to emit two photon beams along two non-concentric cones; a beam splitting means (5) operable to split a signal photon beam (6) from an idler photon beam (7); a mode inverter (10) operable to rotate one of the annular signal photon beam (6) and the idler photon beam (7) 180° around its geometric center; a phase adjusting means (8) operable to adjust phases of the signal photon beam (6) and the idler photon beam (7) based on an optical time delay; and a beam coupling means (14) operable to overlay the signal photon beam (6) with the idler photon beam (7) in a common-line polarized annular shape by the mode inverter (10) to bring them into a quantum correla

Abstract: A method of 3D holographic recording by using a very simple optical system comprises: dividing a femto-second laser pulse into a plurality of light beams by a diffraction beam splitter (3), focusing four light beams selected from the divided plurality of light beam, and further focusing these four light beams into a sample (7) comprised of a photosensitive material capable of multi-photon exposure so that the photosensitive material is exposed to the interference among the four light beams and multi-photon absorption in the sample (7) is induced, thus recording a 3D phase hologram on the irradiated portion of the sample (7).

Abstract: A method of 3D holographic recording by using a very simple optical system comprises: dividing a femto-second laser pulse into a plurality of light beams by a diffraction beam splitter (3), focusing four light beams selected from the divided plurality of light beam, controlling each optical phase of the selected four light beams by a phase retarder (8). and further focusing these four light beams into a sample (7?) comprised of a photosensitive material capable of multi-photon exposure so that the photosensitive material is exposed to the interference among the four light beams and multi-photon absorption in the sample (7?) is induced, thus recording a 3D phase hologram on the irradiated portion of the sample (7?).