Patents by Inventor Sawako Yoshikawa

Sawako Yoshikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7799720
    Abstract: A method of regenerating a carbon dioxide gas absorbent includes heating a carbon dioxide gas absorbent containing lithium silicate, which has been absorbed a carbon dioxide gas, under a reduced pressure atmosphere to release the carbon dioxide gas.
    Type: Grant
    Filed: February 1, 2006
    Date of Patent: September 21, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masahiro Kato, Kazuaki Nakagawa, Kenji Essaki, Sawako Yoshikawa
  • Patent number: 7182881
    Abstract: A fire extinguishing agent contains at least one compound selected from the group consisting of an alkali hydrogencarbonate and an alkali carbonate, the alkali hydrogencarbonate being thermally decomposed to generate carbon dioxide and an alkali carbonate, a metal oxide that reacts with the alkali carbonate to generate carbon dioxide, and a hydrophobic binder.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: February 27, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masahiro Kato, Sawako Yoshikawa, Kenji Essaki, Kazuaki Nakagawa
  • Publication number: 20060183628
    Abstract: A method of regenerating a carbon dioxide gas absorbent includes heating a carbon dioxide gas absorbent containing lithium silicate, which has been absorbed a carbon dioxide gas, under a reduced pressure atmosphere to release the carbon dioxide gas.
    Type: Application
    Filed: February 1, 2006
    Publication date: August 17, 2006
    Inventors: Masahiro Kato, Kazuaki Nakagawa, Kenji Essaki, Sawako Yoshikawa
  • Publication number: 20050214203
    Abstract: A catalyst-containing reaction accelerator used in a steam reforming reaction of hydrocarbon comprises a solid catalyst to accelerate the steam reforming reaction, and a composite absorbent which is mixed with the solid catalyst. The composite absorbent has a main absorbent which contains a lithium-containing oxide for absorbing and desorbing carbon dioxide by-produced by the steam reforming reaction, and a molten carbonate holding material which does not react with the main absorbent at a temperature at which the main absorbent absorbs and desorbs carbon dioxide.
    Type: Application
    Filed: March 23, 2005
    Publication date: September 29, 2005
    Inventors: Kenji Essaki, Masahiro Kato, Sawako Yoshikawa, Toshihiro Imada
  • Publication number: 20050106088
    Abstract: A halogen-containing gas absorbent comprising a lithium-containing composite oxide such as lithium silicate having an average particle diameter of 50 ?m to 3 mm can absorb a halogen-containing gas regardless of the water vapor amount in an ambient.
    Type: Application
    Filed: September 8, 2004
    Publication date: May 19, 2005
    Inventors: Masahiro Kato, Kazuaki Nakagawa, Sawako Yoshikawa, Kenji Essaki
  • Publication number: 20050025682
    Abstract: A chemical reaction apparatus includes a reaction chamber and a carbon dioxide absorbent chamber disposed behind the reaction chamber in adjacent to it. The reaction chamber generates a gas containing hydrogen and carbon dioxide from the material gas, and the carbon dioxide absorbent chamber absorbs carbon dioxide from the gas generated from the reaction chamber.
    Type: Application
    Filed: June 25, 2004
    Publication date: February 3, 2005
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kenji Essaki, Masahiro Kato, Sawako Yoshikawa, Kazuaki Nakagawa
  • Publication number: 20040118576
    Abstract: A fire extinguishing agent contains at least one compound selected from the group consisting of an alkali hydrogencarbonate and an alkali carbonate, the alkali hydrogencarbonate being thermally decomposed to generate carbon dioxide and an alkali carbonate, a metal oxide that reacts with the alkali carbonate to generate carbon dioxide, and a hydrophobic binder.
    Type: Application
    Filed: August 14, 2003
    Publication date: June 24, 2004
    Inventors: Masahiro Kato, Sawako Yoshikawa, Kenji Essaki, Kazuaki Nakagawa
  • Patent number: 6712879
    Abstract: There is disclosed a carbon dioxide gas absorbent comprising lithium silicate, 0.5 mol % to 4.9 mol % of alkali carbonate per mole of the lithium silicate, and at least one element selected from the group consisting of aluminum, magnesium, calcium, iron, titanium and carbon.
    Type: Grant
    Filed: September 6, 2002
    Date of Patent: March 30, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masahiro Kato, Sawako Yoshikawa, Kenji Essaki, Kazuaki Nakagawa
  • Publication number: 20030232722
    Abstract: One embodiment of the present invention provides a carbon dioxide gas absorbent, which includes at least one compound selected from the group including sodium silicate, potassium silicate, and a combination thereof; and lithium silicate. Another embodiment of the present invention provides A carbon dioxide gas absorbent, which includes at least one compound selected from the group including sodium-based anhydrous water glass, potassium-based anhydrous water glass, and a combination thereof; and lithium silicate. The present invention also provides for methods of making the absorbents and methods of using same.
    Type: Application
    Filed: March 6, 2003
    Publication date: December 18, 2003
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Masahiro Kato, Sawako Yoshikawa, Kenji Essaki, Kazuaki Nakagawa
  • Publication number: 20030075050
    Abstract: There is disclosed a carbon dioxide gas absorbent comprising lithium silicate, 0.5 mol % to 4.9 mol % of alkali carbonate per mole of the lithium silicate, and at least one element selected from the group consisting of aluminum, magnesium, calcium, iron, titanium and carbon.
    Type: Application
    Filed: September 6, 2002
    Publication date: April 24, 2003
    Inventors: Masahiro Kato, Sawako Yoshikawa, Kenji Essaki, Kazuaki Nakagawa
  • Patent number: 6387845
    Abstract: Disclosed is a carbon dioxide gas absorbent containing lithium silicate reacting with a carbon dioxide gas to form lithium carbonate and represented by the general formula, LixSiyOz, where x, y, z are integers meeting the requirement of x+4y−2z=0. The lithium content x in the general formula should desirably be at least 4.
    Type: Grant
    Filed: March 16, 2000
    Date of Patent: May 14, 2002
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kato Masahiro, Kazuaki Nakagawa, Toshiyuki Ohashi, Sawako Yoshikawa, Kenji Essaki
  • Publication number: 20020037810
    Abstract: Disclosed is a carbon dioxide gas absorbent containing lithium silicate reacting with a carbon dioxide gas to form lithium carbonate and represented by the general formula, LixSiyOz, where x, y, z are integers meeting the requirement of x+4y−2z=0. The lithium content x in the general formula should desirably be at least 4.
    Type: Application
    Filed: March 16, 2000
    Publication date: March 28, 2002
    Inventors: Kazuaki Nakagawa, Masahiro Kato, Toshiyuki Ohashi, Sawako Yoshikawa, Kenji Essaki
  • Patent number: 6270948
    Abstract: A method of forming a pattern which comprises the steps of, forming an organosilicon film on a work film, the organosilicon film comprising an organosilicon compound having a silicon-silicon bond in a backbone chain thereof and a glass transition temperature of 0° C. or more, forming a resist pattern on the organosilicon film, and transcribing the resist pattern on the organosilicon film through an etching of the organosilicon film by making use of an etching gas containing at least one kind of atom selected from the group consisting of chlorine, bromine and iodine. The organosilicon pattern obtained by the etching is employed as a mask for patterning the work film.
    Type: Grant
    Filed: June 7, 1999
    Date of Patent: August 7, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuhiko Sato, Yoshihiko Nakano, Rikako Kani, Shuji Hayase, Yasunobu Onishi, Eishi Shiobara, Seiro Miyoshi, Hideto Matsuyama, Masaki Narita, Sawako Yoshikawa
  • Patent number: 6025117
    Abstract: A polysilane having a repeating unit represented by the following general formula (LPS-I), ##STR1## wherein A is a bivalent organic group, R.sup.1 substituents may be the same or different and are selected from hydrogen atom and substituted or unsubstituted hydrocarbon group and silyl group. The polysilane is excellent in solublity in an organic solvent so that it can be formed into a film by way of a coating method, which is excellent in mechanical strength and heat resistance. The polysilane can be employed as an etching mask to be disposed under a resist in a manufacturing method of a semiconductor device. The polysilane exhibits anti-reflective effect during exposure, a large etch rate ratio in relative to a resist, and excellent dry etching resistance.
    Type: Grant
    Filed: December 8, 1997
    Date of Patent: February 15, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshihiko Nakano, Rikako Kani, Shuji Hayase, Yasuhiko Sato, Seiro Miyoshi, Toru Ushirogouchi, Sawako Yoshikawa, Hideto Matsuyama, Yasunobu Onishi, Masaki Narita, Toshiro Hiraoka