Patents by Inventor Sayaka Inoue

Sayaka Inoue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CROSS-LINKABLE NITRILE RUBBER COMPOSITION AND CROSS-LINKED RUBBER
    Publication number: 20170037224
    Abstract: A cross-linkable nitrile rubber composition including a highly saturated nitrile rubber (a) containing ?,?-ethylenically unsaturated nitrile monomer units and ?,?-ethylenically unsaturated dicarboxylic acid monoester monomer units and having an iodine value of 120 or less, organic staple fiber (b) with an average fiber length of 0.1 to 12 mm, and a polyamine cross-linking agent (c) is provided. The cross-linkable nitrile rubber composition able to give cross-linked rubber excellent in tensile stress and low heat buildup can be provided.
    Type: Application
    Filed: December 22, 2014
    Publication date: February 9, 2017
    Applicant: ZEON CORPORATION
    Inventors: Tomonori NAKASHIMA, Sayaka INOUE
  • NITRILE GROUP-CONTAINING COPOLYMER RUBBER, CROSS-LINKABLE RUBBER COMPOSITION, AND CROSS-LINKED RUBBER
    Publication number: 20170015773
    Abstract: A nitrile group-containing copolymer rubber containing ?-ethylenically unsaturated nitrile monomer units in 10 to 60 wt % and having a weight average radius of gyration of 10 to 100 nm in range is provided. According to the present invention, a nitrile group-containing copolymer rubber excellent in processability and able to give cross-linked rubber excellent in normal physical properties can be provided.
    Type: Application
    Filed: March 25, 2015
    Publication date: January 19, 2017
    Applicant: ZEON CORPORATION
    Inventors: Sayaka INOUE, Chikara KATANO
  • NITRILE GROUP-CONTAINING HIGHLY SATURATED COPOLYMER RUBBER COMPOSITION AND CROSS-LINKED RUBBER
    Publication number: 20160297955
    Abstract: A nitrile group-containing highly saturated copolymer rubber composition includes a nitrile group-containing highly saturated copolymer rubber (A) having ?,?-ethylenically unsaturated nitrile monomer units and (meth)acrylic acid ester monomer units and having an iodine value of 120 or less and a polyether ester-based plasticizer (B) having structural unit made of three or more ether compounds which are successively bonded. A nitrile group-containing highly saturated copolymer rubber composition excellent in vulcanization speed and giving cross-linked rubber has excellent heat resistance and cold resistance.
    Type: Application
    Filed: November 26, 2014
    Publication date: October 13, 2016
    Applicant: Zeon Corporation
    Inventors: Sayaka INOUE, Tomonori NAKASHIMA
  • Resin composition, molded product and method for producing molded product
    Patent number: 8268917
    Abstract: A resin composition, containing at least (A) a polylactic acid, (B) a phosphazene compound and (C) a crystal nucleator.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: September 18, 2012
    Assignee: Fuji Xerox Co., Ltd.
    Inventors: Masaya Ikuno, Kenji Yao, Sayaka Inoue
  • PARTICLE, RESIN COMPOSITION AND RESIN MOLDED ARTICLE
    Publication number: 20110237719
    Abstract: A particle including: at least one selected from an ionic liquid that has, as an organic cation, one selected from cyclic amidine ion-based organic cations, pyridinium-based organic cations, ammonium-based organic cations, sulfonium-based organic cations, and phosphonium-based organic cations, or a liquid phosphate ester; and a polymer compound that serves as a base material, a resin composition including the particle and a resin molded article including the resin composition are provided.
    Type: Application
    Filed: August 25, 2010
    Publication date: September 29, 2011
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Sayaka INOUE, Masahiro Moriyama, Masaya Ikuno, Masato Mikami, Masayuki Okoshi, Kenji Yao
  • RESIN COMPOSITION, MOLDED PRODUCT AND METHOD FOR PRODUCING MOLDED PRODUCT
    Publication number: 20110230607
    Abstract: A resin composition, containing at least (A) a polylactic acid, (B) a phosphazene compound and (C) a crystal nucleator.
    Type: Application
    Filed: August 26, 2010
    Publication date: September 22, 2011
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Masaya IKUNO, Kenji YAO, Sayaka INOUE