Patents by Inventor Sayaka Nose

Sayaka Nose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CINNAMIC ACID DERIVATIVE, POLYMER THEREOF, AND LIQUID CRYSTAL ALIGNMENT LAYER COMPRISING CURED PRODUCT THEREOF
    Publication number: 20140154428
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).
    Type: Application
    Filed: June 26, 2012
    Publication date: June 5, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Sayaka Nose, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • CINNAMIC ACID DERIVATIVE, POLYMER THEREOF, AND LIQUID CRYSTAL ALIGNMENT LAYER COMPRISING CURED PRODUCT THEREOF
    Publication number: 20140121345
    Abstract: Provided is a liquid crystal alignment layer of which a constituent member is a compound represented by the general formula (I).
    Type: Application
    Filed: May 31, 2012
    Publication date: May 1, 2014
    Applicant: DIC CORPORATION
    Inventors: Martin Schadt, Sayaka Nose, Masayuki Iwakubo, Masanao Hayashi, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu
  • POLYMER FOR USE IN LIQUID CRYSTAL ALIGNMENT LAYER
    Publication number: 20130116396
    Abstract: The present invention relates to materials used for aligning liquid crystals of liquid crystal display elements and to a polymer for use in liquid crystal vertical alignment layer used in producing a liquid crystal vertical alignment layer. The polymer for use in a liquid crystal vertical alignment layer includes (a) a moiety that is photochemically isomerizable but not photochemically crosslinked, (b) a moiety that is photochemically crosslinkable, and (c) a moiety that stabilizes a vertical alignment. The polymer can be used to produce a vertical alignment layer that has a liquid crystal alignment property enabling control of alignment at a low UV dose and that offers a large pretilt angle and superior optical stability.
    Type: Application
    Filed: March 29, 2011
    Publication date: May 9, 2013
    Applicant: DIC CORPORATION
    Inventors: Sayaka Nose, Yutaka Nagashima, Isa Nishiyama, Haruyoshi Takatsu, Martin Schadt, Vladimir Chigrinov, Hoi Sing Kwok