Patents by Inventor Sayaka Oike

Sayaka Oike has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8110613
    Abstract: Provided is a method for efficiently producing a cationically curable condensed silicon compound. There was an unsolved problem that, in a condensation reaction, an oxetanyl group is subjected to ring-opening under an acidic condition, while gelation is easily caused under an alkaline condition. It was found that a silicon compound (C) having an oxetanyl group can be obtained without causing gelation even at a high concentration by the present method including a first step of separately subjecting a silicon compound (A) having four siloxane bond-forming groups and a silicon compound (B) having an oxetanyl group to alcohol exchange reaction with 1-propanol and a second step of subjecting silicon compounds (AP) and (BP) undergone the first step to hydrolytic copolycondensation under an alkaline condition at a specific ratio.
    Type: Grant
    Filed: December 14, 2009
    Date of Patent: February 7, 2012
    Assignee: Toagosei Co., Ltd.
    Inventors: Sayaka Oike, Akinori Kitamura, Hiroshi Suzuki
  • Publication number: 20110245448
    Abstract: Provided is a method for efficiently producing a cationically curable condensed silicon compound. There was an unsolved problem that, in a condensation reaction, an oxetanyl group is subjected to ring-opening under an acidic condition, while gelation is easily caused under an alkaline condition. It was found that a silicon compound (C) having an oxetanyl group can be obtained without causing gelation even at a high concentration by the present method including a first step of separately subjecting a silicon compound (A) having four siloxane bond-forming groups and a silicon compound (B) having an oxetanyl group to alcohol exchange reaction with 1-propanol and a second step of subjecting silicon compounds (AP) and (BP) undergone the first step to hydrolytic copolycondensation under an alkaline condition at a specific ratio.
    Type: Application
    Filed: December 14, 2009
    Publication date: October 6, 2011
    Applicant: TOAGOSEI CO., LTD.
    Inventors: Sayaka Oike, Akinori Kitamura, Hiroshi Suzuki