Abstract: A retention system for securing a stage mirror to the wafer stage of a semiconductor manufacturing device includes at least one first bracket and at least one second bracket. The retention system rigidly secures the stage mirror to the wafer stage during movement of the wafer stage to reduce positional measurement errors. The at least one first bracket has a substantially planar first contact surface for engaging the reflective surface of the mirror. The first contact surface is a finished aluminum surface, which does not scratch the mirror surface. The at least one first bracket is formed with a gusset providing increased stiffness in the direction of movement of the wafer stage. The at least one second bracket includes an actuator for moving a substantially planar second contact surface into engagement with a rear surface of the mirror. In one embodiment, the actuator is a threaded fastener and the second contact surface is a finished polyimide resin tip.

Abstract: A retention system for securing a stage mirror to the wafer stage of a semiconductor manufacturing device includes at least one first bracket and at least one second bracket. The retention system rigidly secures the stage mirror to the wafer stage during movement of the wafer stage to reduce positional measurement errors. The at least one first bracket has a substantially planar first contact surface for engaging the reflective surface of the mirror. The first contact surface is a finished aluminum surface, which does not scratch the mirror surface. The at least one first bracket is formed with a gusset providing increased stiffness in the direction of movement of the wafer stage. The at least one second bracket includes an actuator for moving a substantially planar second contact surface into engagement with a rear surface of the mirror. In one embodiment, the actuator is a threaded fastener and the second contact surface is a finished polyimide resin tip.