Abstract: A plasma processing system is provided. The plasma processing system includes a processing chamber having a gas inlet for introducing cleaning gases. The cleaning gas is optimized to remove byproducts deposited on inner surfaces of the processing chamber. The processing chamber includes a top electrode for creating a plasma from the cleaning gas to perform the cleaning process. A variable conductance meter for controlling a pressure inside the processing chamber independently of a flow rate of process gases is included. The variable conductance meter is positioned on an outlet of the chamber. An optical emission spectrometer (OES) for detecting an endpoint of the cleaning process performed in the processing chamber is included. The OES is located to detect an emission intensity in the processing chamber from the plasma. The OES is configured to trace the emission intensity. A pumping system for evacuating the processing chamber between processing operations is included.

Abstract: A method for determining an endpoint of an in-situ cleaning process of a semiconductor processing chamber is provided. The method initiates with providing an optical emission spectrometer (OES) configured to monitor selected wavelength signals. Then, baseline OES threshold signal intensities are determined for each of the selected wavelength signals. Next, an endpoint time of each step of the in-situ cleaning process is determined. Determining an endpoint time includes executing a process recipe to process a semiconductor substrate within the processing chamber. Executing the in-situ cleaning process and recording the endpoint time for each step of the in-situ cleaning process are also included in determining the endpoint time. Then, nominal operating times are established for each step of the in-situ cleaning process. A plasma processing system for executing a two step in-situ cleaning process is also provided.

Abstract: A plasma reactor system with controlled DC bias for manufacturing semiconductor wafers and the like. The reactor system includes a plasma chamber, a plasma generating coil and a chuck including a chuck electrode. The chuck supports a workpiece within the chamber. The plasma reactor system further includes a pair of generators, one of which supplies a radio frequency signal to the plasma generating coil. The second generator delivers a RF signal which to the chuck electrode and acts to control DC bias at the workpiece. Peak voltage sensor circuitry and set point signal circuitry controls the power output of the generator, and a matching network coupled between the generator and the first electrode matches the impedance of the RF signal with the load applied by the plasma. DC bias determines the energy with which plasma particles impact the surface of a workpiece and thereby determines the rate at which the process is performed.

Abstract: A plasma reactor system with controlled DC bias for manufacturing semiconductor wafers and the like. The reactor system includes a plasma chamber, a plasma generating coil and a chuck including a chuck electrode. The chuck supports a workpiece within the chamber. The plasma reactor system further includes a pair of generators, one of which supplies a radio frequency signal to the plasma generating coil. The second generator delivers a RF signal which to the chuck electrode and acts to control DC bias at the workpiece. Peak voltage sensor circuitry and set point signal circuitry controls the power output of the generator, and a matching network coupled between the generator and the first electrode matches the impedance of the RF signal with the load applied by the plasma. DC bias determines the energy with which plasma particles impact the surface of a workpiece and thereby determines the rate at which the process is performed.

Abstract: A new mail transport protocol is proposed for use over a reliable byte-stream transport. This protocol is faster, simpler and more streaming than prior methods, and handles binary and unicode data more efficiently. The protocol requires fewer communication round trips between servers per message transferred than existing methods. It transmits and receives byte data as is without requiring further per-byte processing on advanced operating systems such as UNIX, and requires only new-line processing in text on legacy operating systems.

Abstract: A method and apparatus for providing easy access to a service provider that provides service over a communications system. In accordance with the present invention, a caller that wishes to gains access to the service provider simply needs to make a single call to a so-called queuing system, and hang up. The queuing system obtains information regarding the caller such as the caller's name, address and phone number, makes a connection with the service provider, calls-back the caller when the connection is made, and connects the caller to the service provider through the connection. The caller is thereby connected to the service provider without having to spend a substantial amount of his/her free time making calls. This is particularly advantageous when the service provider is popular or oversubscribed (e.g. a service that provides Super Bowl tickets).

Abstract: A wastewater separator to separate waste from a mixed wastewater stream including one or more of heavy waste, light waste and water. The wastewater separator comprises a separation container, a inlet and an outlet. The separation container comprises (1) a wastewater stream director within the separation container, the wastewater stream director being sized, shaped and positioned relative to the wastewater inlet to direct the wastewater stream along a preferred flow path to permit the light waste to separate from the wastewater stream in a first direction to a collection area and to permit the heavy waste to separate from the wastewater stream in a second direction towards a heavy waste removal area; and (2) a flow-directing outlet baffle within the separation container for directing the wastewater stream to the wastewater outlet from the heavy waste removal area to remove the heavy waste from the separation container.

Abstract: A method for electronic communication using wide area network (WAN) storage and signalling capabilities. The method and apparatus provides for deposit of a message in message stores in the WAN, storage of the message such that the message is uniformly accessible throughout the WAN and notifying the recipient of the message of the availability and address of the message in the message stores in the WAN so that he can access the message.