Abstract: An apparatus for processing a substrate is provided. A capacitively coupled plasma electrode is within a capacitively coupled plasma processing chamber. A plasma confinement component is within the capacitively coupled plasma processing chamber, wherein at least one of the capacitively coupled plasma electrode and plasma confinement component comprises a metal component body with a plasma facing surface and a plasma spray coating over the plasma facing surface.

Abstract: Systems and methods for cleaning an edge ring pocket are described herein. One of the methods includes providing one or more process gases to a plasma chamber, supplying a low frequency (LF) radio frequency (RF) power to an edge ring that is located adjacent to a chuck of the plasma chamber. The LF RF power is supplied while the one or more process gases are supplied to the plasma chamber to maintain plasma within the plasma chamber. The supply of the LF RF power increases energy of plasma ions near the edge ring pocket to remove residue in the edge ring pocket. The LF RF power is supplied during the time period in which a substrate is not being processed within the plasma chamber.

Abstract: Methods, systems, apparatuses, and computer programs are presented for controlling etch rate and plasma uniformity using magnetic fields. A semiconductor substrate processing apparatus includes a vacuum chamber including a processing zone for processing a substrate using capacitively coupled plasma (CCP). The apparatus further includes a magnetic field sensor configured to detect a signal representing a residual magnetic field associated with the vacuum chamber. At least one magnetic field source is configured to generate one or more supplemental magnetic fields through the processing zone of the vacuum chamber. A magnetic field controller is coupled to the magnetic field sensor and the at least one magnetic field source. The magnetic field controller is configured to adjust at least one characteristic of the one or more supplemental magnetic fields, causing the one or more supplemental magnetic fields to reduce the residual magnetic field to a pre-determined value.

Abstract: Systems and methods for cleaning an edge ring pocket are described herein. One of the methods includes providing one or more process gases to a plasma chamber, supplying a low frequency (LF) radio frequency (RF) power to an edge ring that is located adjacent to a chuck of the plasma chamber. The LF RF power is supplied while the one or more process gases are supplied to the plasma chamber to maintain plasma within the plasma chamber. The supply of the LF RF power increases energy of plasma ions near the edge ring pocket to remove residue in the edge ring pocket. The LF RF power is supplied during the time period in which a substrate is not being processed within the plasma chamber.

Abstract: A method for etching features in a silicon oxide containing etch layer disposed below a patterned mask in a chamber is provided. An etch gas comprising a tungsten containing gas is flowed into the chamber. The etch gas comprising the tungsten containing gas is formed into a plasma. The silicon oxide etch layer is exposed to the plasma formed from the etch gas comprising the tungsten containing gas. Features are etched in the silicon oxide etch layer while exposed to the plasma formed from the etch gas comprising the tungsten containing gas.

Abstract: Systems and methods for generating and displaying customer commitment framework data are provided. Exemplary methods for determining the shareability of online content may include obtaining, via a digital intelligence system, customer experience data regarding any of a product, a brand, and customer responses for a first entity, as well as periodically calculating, via the digital intelligence system, customer commitment framework data from the customer experience data, and generating a customer commitment dashboard that comprises a graphical representation of the customer commitment framework data.

Abstract: A distributed hash table infrastructure is described that supports pluggable modules for various services. Transport providers, security providers, and other service providers may be swapped, providing flexibility in supporting various devices and networking configurations.

Abstract: Systems and methods for product cycle analysis using social media data are provided herein. Some exemplary methods may include evaluating social media conversations for an author, executing a semiotic analysis of the social media conversations to categorize the social media conversations, and computing a product commitment score for the author, for social media conversation having been categorize within a product commitment score domain.

Abstract: A distributed hash table infrastructure is described that supports pluggable modules for various services. Transport providers, security providers, and other service providers may be swapped, providing flexibility in supporting various devices and networking configurations.

Abstract: A method of trimming the critical dimension of an isolated line to a greater extent than a dense line is provided. A mask is formed of an organic material over the etch layer wherein the mask has at least a first region with a first pattern density and a second region with a second pattern density. A surface area of the organic material in the first region is measured. A surface area of the organic material in the second region is measured. A reverse bias trim of the mask is provided, wherein a ratio of a trim rate of the organic material in the first region to a trim rate of the organic material in the second region is related to a ratio of the measured surface area of the organic material in the first region to the measured surface area of the organic material in the second region.

Abstract: An application and its associated user interface provide a meeting window for use in organizing and holding meetings using peer-to-peer network facilities. The meeting window offers menu selections for choosing a network over which to hold the meeting and for discovering and inviting meeting participants. The meeting window includes three main panes, one each for managing attendees, for distributing files to attendees, and for streaming presentation materials real-time to attendees. Data streaming is also supported to network devices such as projectors. Control of the presentation may be delegated by the presentation owner to another attendee, and may also be revoked by the presentation owner. The real-time streaming of the presentation may be paused and resumed to accommodate meeting dynamics or real-time changes.

Abstract: A portable computing device includes at least three buttons and circuitry for sensing the pressing of at least three buttons, one being recessed, and in response to such sensing provides a battery disable signal to a non-removable battery. The portable computing device further includes circuitry for sensing the coupling of the device to a device cradle, and in response to such coupling, or in response to the press of the recess button, provides a battery enable signal to the non-removable battery.

Abstract: The invention is a method of etching an integrated circuit (IC) structure that includes a metal hard mask layer. The etching of the metal hard mask layer is performed by first feeding a gas mixture comprising a fluorine containing gas and oxygen (O2) gas to a reactor. The method then proceeds to generate a plasma that etches the metal hard mask layer. The method can be applied to either performing a via etch or a trench etch. Additionally, the invention teaches the removal of a photoresist layer without affecting the metal hard mask layer.