Patents by Inventor Scott C. Jackson

Scott C. Jackson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5594159
    Abstract: A process is disclosed for producing 1,1,1,3,3,3-hexafluoropropane and/or 1,1,1,3,3-pentafluoropropene from (CF.sub.3).sub.2 CHCOOH and/or its water soluble salts. The process involves providing a mixture containing water and such carboxy compound(s) which has a pH of less than about 4, and reacting the mixture at a temperature of at least about 75.degree. C. Certain ether compounds may be included in the mixture along with (CF.sub.3)2 CHCOOH and/or its water soluble salts. The reaction of the carboxy (and optionally ether) compound(s) with water may be employed in connection with a process for producing tetrafluoroethylene and/or hexafluoropropylene by pyrolysis, where by-product perfluoroisobutylene is reacted with water (and optionally an alkanol) to produce (CF.sub.3).sub.2 CHCOOH (and optionally one or more ether compounds).
    Type: Grant
    Filed: April 13, 1995
    Date of Patent: January 14, 1997
    Assignee: E I Du Pont De Nemours and Company
    Inventors: Scott C. Jackson, Paul R. Resnick, Steven H. Swearingen
  • Patent number: 5547653
    Abstract: Halocarbon is carbonized at a temperature of at least 600.degree. C. in the presence of excess hydrogen and the absence of water to obtain carbon and anhydrous haloacid as the primary reaction products.
    Type: Grant
    Filed: October 24, 1994
    Date of Patent: August 20, 1996
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: James L. Webster, Scott C. Jackson
  • Patent number: 5516946
    Abstract: A process is disclosed for producing CF.sub.3 CH.sub.2 CF.sub.3 and/or CF.sub.3 CH.dbd.CF.sub.2 from at least one ether compound selected from the group consisting of compounds having the formula (CF.sub.3).sub.2 CHCF.sub.2 OR and compounds having the formula (CF.sub.3).sub.2 C.dbd.CFOR (wherein R is an alkyl group of the formula C.sub.n H.sub.2n+1 and n is an integer from 1 to 6) by contacting the ether compound(s) with water at an elevated temperature of at least about 75.degree. C. The reaction of ether compound(s) with water may be employed in connection with a process for producing tetrafluoroethylene and/or hexafluoropropylene by pyrolysis, where by-product perfluoroisobutylene is reacted with an alkanol to produce the ether compound(s).
    Type: Grant
    Filed: February 22, 1995
    Date of Patent: May 14, 1996
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Scott C. Jackson, Paul R. Resnick, Steven H. Swearingen
  • Patent number: 5420368
    Abstract: A process is disclosed for producing CF.sub.3 CH.sub.2 CF.sub.3 and/or CF.sub.3 CH.dbd.CF.sub.2 from at least one ether compound selected from the group consisting of compounds having the formula (CF.sub.3).sub.2 CHCF.sub.2 OR and compounds having the formula (CF.sub.3).sub.2 C.dbd.CFOR (wherein R is an alkyl group of the formula C.sub.n H.sub.2n+1 and n is an integer from 1 to 6) by contacting the ether compound(s) with water at an elevated temperature of at least about 75.degree. C. The reaction of ether compound(s) with water may be employed in connection with a process for producing tetrafluoroethylene and/or hexafluoropropylene by pyrolysis, where by-product perfluoroisobutylene is reacted with an alkanol to produce the ether compound (s).
    Type: Grant
    Filed: June 29, 1994
    Date of Patent: May 30, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Scott C. Jackson, Paul R. Resnick, Steven H. Swearingen
  • Patent number: 5085904
    Abstract: Multilayer structures suitable for food packaging is provided, wherein barrier layers of SiO and SiO.sub.2 are successively vacuum deposited on a resin substrate such as PET film. This combination of silicon oxide layers provides economical, color-free, microwaveable packaging. Barrier properties of the packaging after retorting can be improved by incorporation of a dopant of metallic material in the SiO.sub.2 layer.
    Type: Grant
    Filed: April 20, 1990
    Date of Patent: February 4, 1992
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Gedeon I. Deak, Scott C. Jackson
  • Patent number: 5084356
    Abstract: A structure comprising a polymeric film substrate and a glassy coating of silicon dioxide heavily doped with at least one metal selected from the group consisting of antimony, aluminum, chromium, cobalt, copper, indium, iron, lead, manganese, tin, titanium, tungsten, zinc, and zirconium, provides improved barrier properties.
    Type: Grant
    Filed: April 20, 1990
    Date of Patent: January 28, 1992
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Gedeon I. Deak, Scott C. Jackson
  • Patent number: 4931782
    Abstract: A touch screen overlay for use on the viewing surface of a visual display device formed from a flexible membrane laminate having improved conductor durability. The flexible laminate comprises first and second flexible substrates formed of transparent polyester material. An array of parallel transparent conductors is deposited on a surface of each flexible substrate. The two flexible substrates are joined together by an adhesive sheet of polyester material. The substrates are joined so that transparent conductors are deposited on the surface of each flexible substrate which faces away from the viewing surface when the overlay is attached to the visual display device. The two arrays, when so superimposed, form a grid-like pattern, separated by the thickness of the upper one of the flexible substrates and the adhesive sheet. A third flexible substrate also formed of polyester material covers the surface of the upper one of the other flexible substrates carrying the upper array of parallel conductors.
    Type: Grant
    Filed: June 24, 1988
    Date of Patent: June 5, 1990
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Scott C. Jackson
  • Patent number: 4654226
    Abstract: A photochemical vapor deposition apparatus includes a reactor housing having a window in one wall above a reaction chamber in the housing. A transparent curtain divides the reaction chamber into a reaction zone and a flush zone. At least one substrate is mounted in the reaction zone in light communication with the window so that ultraviolet radiation may penetrate through the window into the reaction zone. The window is kept clear by a gas flowing through the flush zone.
    Type: Grant
    Filed: March 3, 1986
    Date of Patent: March 31, 1987
    Assignee: The University of Delaware
    Inventors: Scott C. Jackson, Richard E. Rocheleau