Patents by Inventor Scott Chang

Scott Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for improved ophthalmic imaging
    Patent number: 11412928
    Abstract: An ophthalmic imaging system has a specialized graphical user interface GUI to convey information for manually adjusting control inputs to bring an eye into alignment with the device. The GUI provides additional information such as laterality, visual alignment overlay aids, and live video feeds. The system further applies automatic gain control to fundus images, synchronizes itself with other ophthalmic systems on a computer network, and provides an optimized image load and display system.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: August 16, 2022
    Assignees: Carl Zeiss Meditec, Inc., Carl Zeiss Meditec AG
    Inventors: Gregory Anderson, Muzammil Arain, Keith Brock, Scott Chang, Matthew J. Everett, Zubir Khan, Archana Kolli, Priya Kulkarni, Benjamin Kwok, Conor Leahy, Gary Lee, Jennifer Luu, Pranav Malvania, David Nolan, Keith O'Hara, Sunny Virmani, Richard Orlowski
  • SYSTEMS AND METHODS FOR IMPROVED OPHTHALMIC IMAGING
    Publication number: 20200196863
    Abstract: An ophthalmic imaging system has a specialized graphical user interface GUI to convey information for manually adjusting control inputs to bring an eye into alignment with the device. The GUI provides additional information such as laterality, visual alignment overlay aids, and live video feeds. The system further applies automatic gain control to fundus images, synchronizes itself with other ophthalmic systems on a computer network, and provides an optimized image load and display system.
    Type: Application
    Filed: August 10, 2018
    Publication date: June 25, 2020
    Applicants: Carl Zeiss Meditec, Inc., Carl Zeiss Meditec AG, Carl Zeiss Meditec AG
    Inventors: Gregory ANDERSON, Muzammil ARAIN, Keith BROCK, Scott CHANG, Matthew J. EVERETT, Zubir KHAN, Archana KOLLI, Priya KULKARNI, Benjamin KWOK, Conor LEAHY, Gary LEE, Jennifer LUU, Pranav MALVANIA, David NOLAN, Keith O'HARA, Sunny VIRMANI, Richard ORLOWSKI
  • Polishing layer analyzer and method
    Patent number: 10272541
    Abstract: A polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.
    Type: Grant
    Filed: January 22, 2016
    Date of Patent: April 30, 2019
    Assignees: Rohm and Haas Electronic Matericals CMP Holdings, Inc., Dow Global Technologies LLC
    Inventors: Scott Chang, Jeff Tsai, Francis V. Acholla, Andrew Wank, Mark Gazze, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • Method of manufacturing chemical mechanical polishing pads
    Patent number: 9770808
    Abstract: A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processed to form polishing layers of chemical mechanical polishing pads.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: September 26, 2017
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., Dow Global Technologies LLC
    Inventors: Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • Chemical mechanical polishing pad, polishing layer analyzer and method
    Patent number: 9737971
    Abstract: A chemical mechanical polishing pad, polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.
    Type: Grant
    Filed: January 12, 2016
    Date of Patent: August 22, 2017
    Assignees: Rohm and Haas Electronic Materials CMP Holdings, Inc., Dow Global Technologies LLC
    Inventors: Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • POLISHING LAYER ANALYZER AND METHOD
    Publication number: 20170209979
    Abstract: A polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.
    Type: Application
    Filed: January 22, 2016
    Publication date: July 27, 2017
    Inventors: Scott Chang, Jeff Tsai, Francis V. Acholla, Andrew Wank, Mark Gazze, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING PADS
    Publication number: 20170197295
    Abstract: A method of manufacturing chemical mechanical polishing pads is provided, wherein an automated inspection system is configured to detect macro inhomogeneities is skived sheets and to classify the skived sheets as either acceptable or suspect; wherein the acceptable skived sheets are further processed to form polishing layers of chemical mechanical polishing pads.
    Type: Application
    Filed: January 12, 2016
    Publication date: July 13, 2017
    Inventors: Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • CHEMICAL MECHANICAL POLISHING PAD, POLISHING LAYER ANALYZER AND METHOD
    Publication number: 20170197290
    Abstract: A chemical mechanical polishing pad, polishing layer analyzer is provided, wherein the analyzer is configured to detect macro inhomogeneities is polymeric sheets and to classify the polymeric sheets as either acceptable or suspect.
    Type: Application
    Filed: January 12, 2016
    Publication date: July 13, 2017
    Inventors: Francis V. Acholla, Andrew Wank, Mark Gazze, Scott Chang, Jeff Tsai, William A. Heeschen, James David Tate, Leo H. Chiang, Swee-Teng Chin
  • Method of producing haptics for intraocular lenses having high fracture toughness
    Patent number: 5158719
    Abstract: In a method of producing an intraocular lens having a substantially clear optic and at least one filamentous haptic having high fracture toughness, solid particles are mixed into an uncured polymer, and the mixture is inserted into a mold. Ultrasonic energy is applied to the mold until the mixture solidifies. Heat is applied to complete the curing process. Ultrasonic energy is also preferably applied to the particles and uncured polymer mixture to improve dispersion of the particles therein.
    Type: Grant
    Filed: January 28, 1991
    Date of Patent: October 27, 1992
    Assignee: Optical Radiation Corporation
    Inventors: Scott Chang, Thomas R. Paul, Kenneth E. Weber, Edwin A. Creasman, Mei-Ing Cheng, David R. Navarrete, Jimmy D. McCullough
  • Haptics for intraocular lenses having high fracture toughness
    Patent number: 5037435
    Abstract: An intraocular lens comprises a substantially clear optic and at least one filamentous haptic having high fracture toughness. The haptic is formed of a polymer composition comprising low concentrations of solid particles uniformly dispersed throughout a polymer matrix.
    Type: Grant
    Filed: March 2, 1990
    Date of Patent: August 6, 1991
    Assignee: Optical Radiation Corporation
    Inventors: Scott Chang, Thomas R. Paul, Kenneth E. Weber, Edwin A. Creasman, Mei-Ing Cheng, David R. Navarrete, Jimmy D. McCullough