Patents by Inventor Scott Chegwidden

Scott Chegwidden has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Double-metal EUV mask absorber
    Publication number: 20050227152
    Abstract: A composite extreme ultraviolet light (EUV) mask absorber structure and method are disclosed to address the structural and processing requirements of EUV lithography. A first mask absorber layer anisotropically etched with minimal etch bias at a relatively fast etch rate, is combined with a highly-selective second mask absorber layer, to produce a mask absorber with desirable hybrid performance properties.
    Type: Application
    Filed: June 3, 2005
    Publication date: October 13, 2005
    Inventors: Pei-Yang Yan, Hsing-Chien Ma, Scott Chegwidden