Abstract: Slits and holes within a reticle for a local interconnect layer (LIL) are sized according to factors such as relative isolation and whether they are large or small. This helps overcome side-lobing and other undesirable effects of interference.

Abstract: A reticle 100 includes two or more image patterns for different layers of an integrated circuit, each one in a separate image field 110-120. These image layers are used in the production of the same integrated circuit. By placing multiple image layers on the same reticle, fewer reticles need to be produced and a prototype circuit can then be made more cheaply. Likewise the reduced set of reticles can be used where there is a limited run of circuits. If any or all reticle layers need to be replaced, then the replacement set is also cheaper.