Patents by Inventor Scott Coston
Scott Coston has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20070247606Abstract: A system and method are used to substantially homogenize and remove at least some coherence from a beam of radiation.Type: ApplicationFiled: November 30, 2006Publication date: October 25, 2007Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Scott Coston, Adel Joobeur, Henri Vink, Yevgeniy Shmarev
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Publication number: 20070146674Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.Type: ApplicationFiled: March 6, 2007Publication date: June 28, 2007Applicant: ASML Holding N.V.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
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Publication number: 20070127005Abstract: A system and method are used to substantially homogenizing and removing at least some coherence from a beam of light.Type: ApplicationFiled: December 2, 2005Publication date: June 7, 2007Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Scott Coston, Adel Joobeur, Yevgeniy Konstantinovich Shmarev, HENRI JOHANNES VINK
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Patent number: 7187430Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.Type: GrantFiled: July 22, 2004Date of Patent: March 6, 2007Assignee: ASML Holding N.V.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
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Patent number: 7158307Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).Type: GrantFiled: January 20, 2006Date of Patent: January 2, 2007Assignee: ASML Holding N.V.Inventors: Scott Coston, Wenceslao A. Cebuhar, Jason D. Hintersteiner
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Publication number: 20060119947Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).Type: ApplicationFiled: January 20, 2006Publication date: June 8, 2006Applicant: ASML Holding N.V.Inventors: Scott Coston, Wenceslao Cebuhar, Jason Hintersteiner
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Patent number: 7006295Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).Type: GrantFiled: March 25, 2004Date of Patent: February 28, 2006Assignee: ASML Holding N.V.Inventors: Scott Coston, Wenceslao A. Cebuhar, Jason D. Hintersteiner
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Publication number: 20050007677Abstract: A method and system allow for changing (continuously or variably) both a field height and pupil of a beam that illuminates an object field. In one example, the object field can have a pattern generator (e.g., one or more reticles, spatial light modulators, or the like) positioned therein. The system and method for changing both the field height and the pupil can include a field defining element, a pupil defining element, and first and second zoom systems. The field defining element (FDE) can generate a field height of an illumination beam. The first zoom system can allow for changing of the field height of the illumination beam. The pupil defining element (PDE) can generate a pupil of the illumination beam. The second zoom system can allow for changing of the pupil of the illumination beam.Type: ApplicationFiled: March 31, 2004Publication date: January 13, 2005Inventors: Scott Coston, Richard Guerra
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Publication number: 20040263821Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.Type: ApplicationFiled: July 22, 2004Publication date: December 30, 2004Applicant: ASML Holding N.V.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
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Patent number: 6813003Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.Type: GrantFiled: June 11, 2002Date of Patent: November 2, 2004Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
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Publication number: 20040179270Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s).Type: ApplicationFiled: March 25, 2004Publication date: September 16, 2004Applicant: ASML Holding N.V.Inventors: Scott Coston, Wenceslao A. Cebuhar, Jason D. Hintersteiner
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Patent number: 6775069Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.Type: GrantFiled: October 16, 2002Date of Patent: August 10, 2004Assignee: ASML Holding N.V.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter J. Baumgartner, Walter Augustyn
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Publication number: 20030227609Abstract: A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.Type: ApplicationFiled: June 11, 2002Publication date: December 11, 2003Applicant: ASML US, Inc.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Walter Augustyn
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Publication number: 20030076679Abstract: The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array.Type: ApplicationFiled: October 16, 2002Publication date: April 24, 2003Applicant: ASML US, Inc.Inventors: Mark Oskotsky, Lev Ryzhikov, Scott Coston, James Tsacoyeanes, Peter J. Baumgartner, Walter Augustyn