Abstract: A method of generating continuous underlay for a group of design elements in an embroidery design, including identifying a group of design elements, creating a graph of the group of design elements, determining an order for sewing a continuous underlay for the group of design elements using the graph, and generating a stitch pattern for the group of design elements, the stitch pattern based at least in part on the order for sewing the continuous underlay for the group of design elements.

Abstract: A method for user-defined lock stitches, the method comprising allowing a user to create a user-defined stitch pattern comprising a defined size. The method further includes storing the user-defined stitch pattern as a custom stitch pattern that can be inserted into a design at the defined size. The user-defined stitch pattern may include a tie-in, tie-off stitch pattern. The method may further include generating and sewing stitch coordinates for the custom stitch pattern.

Abstract: A method of generating continuous underlay for a group of design elements in an embroidery design, including identifying a group of design elements, creating a graph of the group of design elements, determining an order for sewing a continuous underlay for the group of design elements using the graph, and generating a stitch pattern for the group of design elements, the stitch pattern based at least in part on the order for sewing the continuous underlay for the group of design elements.

Abstract: A method for creating an altered embroidery design, the method comprising altering an embroidery design to create an altered embroidery design, the altered embroidery design comprising an at least one design element, determining a size of the at least one design element, selecting a stitch type for the at least one design element by comparing the size of the at least one design element to a set of values, wherein the stitch type can be selected from the set of values based on the size of the at least one design element, and generating a stitch pattern for the at least one design element.

Abstract: A method for creating an altered embroidery design, the method comprising altering an embroidery design to create an altered embroidery design, the altered embroidery design comprising an at least one design element, determining a size of the at least one design element, selecting a stitch type for the at least one design element by comparing the size of the at least one design element to a set of values, wherein the stitch type can be selected from the set of values based on the size of the at least one design element, and generating a stitch pattern for the at least one design element.

Abstract: A method and system for compensating for misalignment of a piece of target material to which a design is to be applied is described. One embodiment receives first and second sets of coordinates corresponding to the location, respectively, of first and second reference points on the target piece of material; modifies, based on the received first and second sets of coordinates, design data that specifies a predetermined position and orientation of the design on the target piece of material with respect to the first and second reference points to produce modified design data, the modified design data compensating for at least one of translational and rotational misalignment of the target piece of material with respect to a design-application mechanism; and applies the design to the target piece of material in accordance with the modified design data.