Patents by Inventor Scott DUFFERWIEL

Scott DUFFERWIEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11740189
    Abstract: A method of defining at least one scan parameter for an x-ray scan of a single crystal structure, the method comprising: determining a target orientation of the structure for the scan; and defining different non-zero levels of x-ray exposure for different parts of a scan area based on either or both of the target orientation and characteristics of the structure; and, defining the scan area so that substantially all x-rays of the scan are directed to the structure in the target orientation.
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: August 29, 2023
    Assignee: ROLLS-ROYCE PLC
    Inventors: Jacqueline Griffiths, Scott Dufferwiel, Jonathan Eyre
  • Publication number: 20230254135
    Abstract: A quantum key distribution system comprises: a transmitter (10) arranged to transmit a coded photon stream over a free space quantum channel (14), wherein the transmitter comprises a single photon source (30) arranged to generate a coded photon stream comprising photons representing QKD bit values, and attenuation means (32) arranged to attenuate the coded photon stream, the attenuation means being variable so as to provide a variable attenuation of the coded photon stream; a receiver (12) arranged to receive the coded photon stream from the quantum channel; and control means (34, 46) arranged to control the attenuation means so as to vary the attenuation.
    Type: Application
    Filed: February 7, 2023
    Publication date: August 10, 2023
    Inventors: Thomas Lyons, Scott Dufferwiel, Maksym Sich
  • Patent number: 11099143
    Abstract: A method of detecting an anomaly in a crystallographic structure, the method comprising: illuminating the structure with x-ray radiation in a known direction relative to the crystallographic orientation; positioning the structure such that its crystallographic orientation is known; detecting a pattern of the diffracted x-ray radiation transmitted through the structure; generating the simulated pattern based on the known direction relative to the crystallographic orientation; comparing the detected pattern to a simulated pattern for x-ray radiation illuminating in the known direction; and, detecting the anomaly in the crystallographic structure based on the comparison.
    Type: Grant
    Filed: January 14, 2020
    Date of Patent: August 24, 2021
    Assignee: ROLLS-ROYCE PLC
    Inventors: Jacqueline Griffiths, Scott Dufferwiel, Narcisa C Pinzariu, Carlos Eduardo Mesquita Frias
  • Publication number: 20210025835
    Abstract: A method of defining at least one scan parameter for an x-ray scan of a single crystal structure, the method comprising: determining a target orientation of the structure for the scan; and defining different non-zero levels of x-ray exposure for different parts of a scan area based on either or both of the target orientation and characteristics of the structure; and, defining the scan area so that substantially all x-rays of the scan are directed to the structure in the target orientation.
    Type: Application
    Filed: July 20, 2020
    Publication date: January 28, 2021
    Applicant: ROLLS-ROYCE plc
    Inventors: Jacqueline GRIFFITHS, Scott DUFFERWIEL, Jonathan EYRE
  • Publication number: 20200225171
    Abstract: A method of detecting an anomaly in a crystallographic structure, the method comprising: illuminating the structure with x-ray radiation in a known direction relative to the crystallographic orientation; positioning the structure such that its crystallographic orientation is known; detecting a pattern of the diffracted x-ray radiation transmitted through the structure; generating the simulated pattern based on the known direction relative to the crystallographic orientation; comparing the detected pattern to a simulated pattern for x-ray radiation illuminating in the known direction; and, detecting the anomaly in the crystallographic structure based on the comparison.
    Type: Application
    Filed: January 14, 2020
    Publication date: July 16, 2020
    Inventors: Jacqueline GRIFFITHS, Scott DUFFERWIEL, Narcisa C PINZARIU, Carlos Eduardo MESQUITA FRIAS