Abstract: Disclosed are seed treatment compositions that include: (a) an aqueous polyurethane dispersion; and (b) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: Disclosed are seed treatment compositions that include: (A) an aqueous polyurethane dispersion; and (B) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: Disclosed are methods for treating seeds with a seed treatment composition that includes: (A) an aqueous polyurethane dispersion; and (B) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: Disclosed are seed treatment compositions that include: (A) an aqueous polyurethane dispersion; and (B) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: Disclosed are methods for treating seeds with a seed treatment composition that includes: (A) an aqueous polyurethane dispersion; and (B) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: Disclosed are seed treatment compositions that include: (a) an aqueous polyurethane dispersion; and (b) an insecticide, a fungicide, a nematicide, and/or other pesticides. Also disclosed are seeds treated with such a treatment compositions and methods for treating a seed using such treatment composition.

Abstract: A power generating device for use with a plumbing fixture includes: a volute configured to receive water from a water supply pipe; a stator having a plurality of blades positioned around a circumference thereof positioned within the volute; a rotor positioned within the stator; and a generator coupled to the rotor. The volute directs substantially all of the water received from the water supply pipe in a circumferential direction through the plurality of blades of the stator to the rotor, thereby causing the rotor to rotate.

Abstract: A power generating device for use with a plumbing fixture includes: a volute configured to receive water from a water supply pipe; a stator having a plurality of blades positioned around a circumference thereof positioned within the volute; a rotor positioned within the stator; and a generator coupled to the rotor. The volute directs substantially all of the water received from the water supply pipe in a circumferential direction through the plurality of blades of the stator to the rotor, thereby causing the rotor to rotate.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.

Abstract: The present invention is directed to a composition curable by radiation having a wavelength of 300 nm or more, a method of producing a coated substrate using such composition and the coated product so-produced. More particularly, the composition of the present invention comprises A) from about 1 to about 99% by weight of an unsaturated polymer or oligomer, B) from about 1 to about 99% by weight of an unsaturated epoxy acrylate, C) one or more photoinitiators, and, optionally, D) one or more solvents.

Abstract: Solvent-based, dual cure coatings incorporating thermally curable blocked polyisocyanates, which also contain unsaturated linkages, and a method for preparing these coatings. The unsaturated linkages, such as acrylate groups, can be crosslinked by free-radical mechanisms such as UV curing.

Abstract: The present invention relates to novel aspartates, their method of production and the use of these aspartates as reactive components for polyisocyanates in two-component polyurethane coating compositions and for preparing polyurethane prepolymers. The aspartaes are prepared by first reacting a di- or polyamine with an unsaturated ester and then reacting the resultant product with a ketone.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid The processing space includes at least a first fluid flow region and a second fluid flow region A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region.

Abstract: A reactor for use in electrochemical processing of a microelectronic workpiece is set forth and described herein. The apparatus comprises one or more walls defining a processing space therebetween for containing a processing fluid. The processing space includes at least a first fluid flow region and a second fluid flow region. A first electrode is disposed in the processing fluid of the first fluid flow region while a second electrode, comprising at least a portion of the microelectronic workpiece, is disposed in the processing fluid of the second fluid flow region. Fluid flow within the first fluid flow region is generally directed toward the first electrode and away from the second electrode while fluid flow within the second fluid flow region is generally directed toward the second electrode and away from the first electrode.