Patents by Inventor Scott J. Bis

Scott J. Bis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8716429
    Abstract: In a curable coil coating composition comprising a mixture of: (a) a curable polyester that is a liquid at room temperature, (b) a cross-linking agent; and (c) a solvent; the improvement comprising preparing the polyester from a composition comprising a mixture of 1,3- and 1,4-cyclohexane dimethanol wherein the molar ratio of the 1,3 isomer to the 1,4 isomer is from about 60:40 to about 5:95. Cured coil coatings prepared from these compositions exhibit an excellent combination of flexibility and hardness.
    Type: Grant
    Filed: January 29, 2008
    Date of Patent: May 6, 2014
    Inventors: Gary E. Spilman, Scott J. Bis, Paul J. Popa
  • Publication number: 20100076154
    Abstract: In a curable coil coating composition comprising a mixture of: (a) a curable polyester that is a liquid at room temperature, (b) a cross-linking agent; and (c) a solvent; the improvement comprising preparing the polyester from a composition comprising a mixture of 1,3- and 1,4-cyclohexane dimethanol wherein the molar ratio of the 1, 3 isomer to the 1, 4 isomer is from about 60:40 to about 5:95. Cured coil coatings prepared from these compositions exhibit an excellent combination of flexibility and hardness.
    Type: Application
    Filed: January 29, 2008
    Publication date: March 25, 2010
    Inventors: Gary E. Spilman, Scott J. Bis, Paul J. Popa
  • Patent number: 7198878
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Grant
    Filed: June 7, 2005
    Date of Patent: April 3, 2007
    Assignee: The Dow Chemical Company
    Inventors: Ying Hung So, Scott J. Bis, Keith J. Watson
  • Patent number: 7019093
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Grant
    Filed: October 18, 2002
    Date of Patent: March 28, 2006
    Assignee: Dow Global Technologies Inc.
    Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
  • Publication number: 20040076911
    Abstract: The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.
    Type: Application
    Filed: October 18, 2002
    Publication date: April 22, 2004
    Inventors: Ying Hung So, Keith J. Watson, Scott J. Bis
  • Patent number: 6413992
    Abstract: Compounds of the formula wherein one of X and Y is lower alkyl, haloalkyl, lower alkenyl, lower alkynyl, or alkoxyalkyl; and the other of X and Y is optionally substituted phenyl, pyridyl, thienyl, cyclopropyl, or thiazolyl; and Z is subtituted pyridyl are useful as insecticides and acaricides. New synthetic procedures and intermediates for preparing the compounds, pesticide compositions containing the compounds, and methods of controlling insects and mites using the compounds are also provided.
    Type: Grant
    Filed: October 22, 1999
    Date of Patent: July 2, 2002
    Assignee: Dow AgroSciences LLC
    Inventors: Francis E. Tisdell, Peter L. Johnson, James T. Pechacek, Scott J. Bis, Vidyadhar B. Hegde, Joe R. Schoonover, Jr., Leonard P. Dintenfass, James M. Gifford, Donald H. DeVries, Timothy P. Martin, Perry V. Ripa
  • Patent number: 5968875
    Abstract: The present invention provides novel 2-methoximino-2-(pyridinyloxymethyl)phenyl acetamide compounds with carboxylic acid substituents on the pyridine ring, their use as fungicidal compounds, and their use in fungicidal compositions comprising at least one of the 2-methoximino-2-(pyridinyloxymethyl)phenyl acetamide compounds as the active ingredient.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: October 19, 1999
    Assignee: Dow AgroSciences LLC
    Inventors: Scott J. Bis, Emily J. Canada, David H. Cooper, Christopher S. Galka, Neil Kirby, David G. Ouimette, David E. Podhorez, Mary Pieczko, Rebecca Rezac, Brent J. Rieder, John K. Swayze, Vidyadhar B. Hegde, Gary L. Sampson