Abstract: Substrates are processed, with a high degree of topography, to produce a variety of semiconductors or other devices and are then stretched out, substantially flat, to achieve a significant increase in surface area. Devices made from a contiguous structure of a single, active crystalline material or from non-contiguous structures of multiple materials, such as a combination of dielectrics, thin film metals and active crystalline semiconductors, are fabricated by utilizing anisotropically etched, high aspect ratio configurations of the active material. The structure is then stretched out to achieve a significant increase in surface area, thereby enabling a substantial reduction in the cost of the substrate materials per unit area in the final product.

Abstract: Microelectronic packages may be fabricated by forming a release layer on a process substrate. A thin film decal is formed on the release layer. The thin film decal includes first and second opposing decal faces, first decal input/output pads on the first decal face, second decal input/output pads on the second decal face and at least one internal wiring layer that electrically connects at least one of the first and second decal input/output pads. The first decal input/output pads are adjacent the release layer and the second decal input/output pads are remote from the release layer. A dielectric adhesive layer is then formed on the second decal face. The dielectric adhesive layer includes first and second opposing dielectric layer faces and conductive vias therein that extend between the first and second opposing dielectric adhesive layer faces.

Abstract: Microelectronic packages may be fabricated by forming a release layer on a process substrate. A thin film decal is formed on the release layer. The thin film decal includes first and second opposing decal faces, first decal input/output pads on the first decal face, second decal input/output pads on the second decal face and at least one internal wiring layer that electrically connects at least one of the first and second decal input/output pads. The first decal input/output pads are adjacent the release layer and the second decal input/output pads are remote from the release layer. A dielectric adhesive layer is then formed on the second decal face. The dielectric adhesive layer includes first and second opposing dielectric layer faces and conductive vias therein that extend between the first and second opposing dielectric adhesive layer faces.

Abstract: A high performance integrated circuit chip package includes a support substrate having conductors extending from one face to the opposite face thereof and a multilayer wiring substrate on the opposite face of the support substrate for connecting chips mounted thereon to one another and to the conductors. A heat sink includes microchannels at one face thereof, with thermally conductive cushions connecting the one face of the heat sink with the exposed back sides of the chips, to provide a high density chip package with high heat dissipation. The support substrate and heat sink may be formed of blocks of material having thermal expansion matching silicon. The cushions are a low melting point solder, preferably pure indium, and are sufficiently thick to absorb thermal stresses, but sufficiently thin to efficiently conduct heat from the chips to the heat sink.

Abstract: A low cost, lightweight, fast, dense and reliable extended integration semiconductor structure is provided by forming a thin film multilayer wiring decal on a support substrate and aligning and attaching one or more integrated chips to the decal. A support ring is attached to the decal surrounding the aligned and attached integrated substrate, and the support substrate is removed. Reach-through vias connect the decal wiring to the chips.

Abstract: A low cost, lightweight, fast, dense and reliable extended integration semiconductor structure is provided by forming a thin film multilayer wiring decal on a support substrate and aligning and attaching one or more integrated chips to the decal. A support ring is attached to the decal surrounding the aligned and attached integrated substrate, and the support substrate is removed. Reach-through vias connect the decal wiring to the chips.

Abstract: Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.

Abstract: An integrated circuit chip packaging structure, preferably having a semiconductor base substrate, i.e., silicon or gallium arsenide, alternating insulation and conductive layers on the base structure, at least two conductive layers being patterned into thin film wiring (i.e., thin film copper of approximately 5 microns), semiconductor integrated circuit chips connected to the upper-most patterned conductive layer, and means to connected the packaging structure to the next level of packaging (i.e., board or card).The thin film wiring layers typically each having coplanar ground, power and signal lines, with at least one power or ground line existing between coplanar signal lines to minimize cross talk. To facilitate efficient power distribution, lines of specific power levels of the patterned planes are connected to lines of the same power level on other patterned planes to form three dimensional power planes.

Abstract: A composition for use in a process for the deposition of patterned thin metal films on integrated circuit substrates, the composition comprising an admixture of a thermoplastic polyimide resin and a coumarin dye dissolved in a substituted phenol solvent. Optionally a polar solvent having a boiling point greater than 160.degree. C. and a low boiling organic compound (70.degree.-150.degree. C.) may be incorporated in the composition.

Abstract: A self-contained method and structure for partitioning, testing and diagnosing a multi-chip packaging structure. The method comprises the steps of electronically inhibiting all chips in the multi-chip package except for the chip or chips under test, creating a signature of the chip or chips under test by generating and applying random patterns to the chip or chips under test (referred to as the unit under test) and comparing the signature obtained to a "good machine" simulation signature. The structure comprises means for accomplishing the above method steps. A preferred structure comprises an semiconductor substrate having redundant self test circuitry built in and chips having ECIPT circuitry mounted on the semiconductor substrate. Either all or a portion of the self test circuitry, including the required multiplexers, etc., may be incorporated into the semiconductor substrate. ECIPT circuitry may also be built into the substrate below each chip site.

Abstract: A high speed, high performance integrated circuit packaging structure that may be used for emulating wafer scale integration structures. The preferred embodiment comprises an interposer having a base substrate having alternating insulation and conductive layers thereon, wherein a plurality of the conductive layers are wiring means which are adapted for maintaining an extremely low noise level in the package. The low noise level and low resistance and capacitance of the wiring means allows a plurality of discrete semiconductor segments to be mounted on and interconnected by the integrated circuit package with a significantly reduced number of drivers and receivers than required by Rent's Rule. Each integrated circuit structure of the present invention emulates a large chip or wafer scale integration structure in performance without having to yield the large chip or wafer, and without redundancy schemes.

Abstract: Plasma-resistant polymeric materials are prepared by reacting a polymeric material containing reactive hydrogen functional groups with a multifunctional organometallic material containing at least two functional groups which are reactive with the reactive hydrogen functional groups of the polymeric material, such as hexamethylcyclotrisilazane.