Abstract: An aperture system for a bottom-up stereolithography device including a reservoir having a lower opening, an aperture including a flexible membrane positioned within the reservoir and covering the lower opening, and a boundary seal positioned around a periphery of the flexible membrane, the boundary seal including one or more boundary seal components and immobilizing the periphery of the flexible membrane against the reservoir. The flexible membrane is formed of a material having a low affinity for a liquid resin used in the stereolithography device as well as cured photopolymer resin parts produced by the device. In addition, the flexible membrane is able to deform as the cured resin part is pulled away from the aperture, thus enabling lower energy mixed mode adhesive failure to occur at the interface between the cured resin and the aperture and reducing the chance of cohesive damage to the cured photopolymer part.

Abstract: A sacrificial substrate for use in stereolithography, having a first surface configured to be attached to a build platform, and a second surface of the sacrificial substrate configured to be attached to a photopolymer part. The sacrificial substrate physically separates the build platform and the photopolymer part, and serves as the deposition surface for the photopolymer part in place of the build platform. The sacrificial substrate may be separated from the build platform and then separated from the photopolymer part via pyrolysis, oxidation, or etching to thereby yield the free photopolymer part without subjecting the part to excess physical force or damage.

Abstract: A temperature-following layer may be applied to a surface of components within an internal combustion engine. The temperature-following layer follows the temperature swing of adjacent gases (for example, in a combustion chamber). The temperature-following layer may be applied directly to a substrate, or the temperature-following layer may be an outer layer of a multi-layer thermal barrier coating. The multi-layer thermal barrier coating may include, for example, an insulating layer, a sealing layer bonded to the insulating layer, and a porous temperature-following layer disposed on the sealing layer. The sealing layer is substantially non-permeable and configured to seal against the insulating layer.

Abstract: Some variations provide a process for fabricating a ceramic structure, the process comprising: producing a plurality of preceramic polymer parts; chemically, physically, and/or thermally joining the preceramic polymer parts together, to generate a preceramic polymer structure; thermally treating the preceramic polymer structure, to generate a ceramic structure; and recovering the ceramic structure. The process may employ additive manufacturing, subtractive manufacturing, casting, or a combination thereof. A composite overwrap may be applied to the preceramic polymer structure prior to pyrolysis, and the composite overwrap also pyrolyzes to a ceramic composite and is a part of the final ceramic structure. The ceramic structure may be silicon oxycarbide, silicon carbide, silicon nitride, silicon oxynitride, silicon carbonitride, silicon boronitride, silicon boron carbonitride, or boron nitride, for example.

Abstract: A temperature-following layer may be applied to a surface of components within an internal combustion engine. The temperature-following layer follows the temperature swing of adjacent gases (for example, in a combustion chamber). The temperature-following layer may be applied directly to a substrate, or the temperature-following layer may be an outer layer of a multi-layer thermal barrier coating. The multi-layer thermal barrier coating may include, for example, an insulating layer, a sealing layer bonded to the insulating layer, and a porous temperature-following layer disposed on the sealing layer. The sealing layer is substantially non-permeable and configured to seal against the insulating layer.

Abstract: A sacrificial substrate for use in stereolithography, having a first surface configured to be attached to a build platform, and a second surface of the sacrificial substrate configured to be attached to a photopolymer part. The sacrificial substrate physically separates the build platform and the photopolymer part, and serves as the deposition surface for the photopolymer part in place of the build platform. The sacrificial substrate may be separated from the build platform and then separated from the photopolymer part via pyrolysis, oxidation, or etching to thereby yield the free photopolymer part without subjecting the part to excess physical force or damage.

Abstract: An aperture system for a bottom-up stereolithography device including a reservoir having a lower opening, an aperture including a flexible membrane positioned within the reservoir and covering the lower opening, and a boundary seal positioned around a periphery of the flexible membrane, the boundary seal including one or more boundary seal components and immobilizing the periphery of the flexible membrane against the reservoir. The flexible membrane is formed of a material having a low affinity for a liquid resin used in the stereolithography device as well as cured photopolymer resin parts produced by the device. In addition, the flexible membrane is able to deform as the cured resin part is pulled away from the aperture, thus enabling lower energy mixed mode adhesive failure to occur at the interface between the cured resin and the aperture and reducing the chance of cohesive damage to the cured photopolymer part.